Patents by Inventor Chun-Hao Ly

Chun-Hao Ly has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100155222
    Abstract: The invention concerns a system for treating gases such as PFC or HFC with plasma, comprising: (6) pumping means (6) whereof the outlet is at a pressure substantially equal to atmospheric pressure, plasma generator (8), at the pump output, to produce a plasma at atmospheric pressure.
    Type: Application
    Filed: March 8, 2010
    Publication date: June 24, 2010
    Applicant: L'Air Liquide, Société Anonyme pour I'Exploitation des Procédés Georges Claude
    Inventors: Jean-Christophe ROSTAING, Daniel Guerin, Christian Larquet, Chun-Hao Ly, Michel Moisan, Hervé Dulphy
  • Publication number: 20040195088
    Abstract: The invention concerns a system for treating gases such as PFC or HFC with plasma, comprising: (6) pumping means (6) thereof the outlet is at a pressure substantially equal to atmospheric pressure, means (8), at the pump output, to produce a plasmas at atmospheric pressure.
    Type: Application
    Filed: May 17, 2004
    Publication date: October 7, 2004
    Inventors: Jean-Christophe E Rostaing, Daniel Guerin, Christian Larquet, Chun-Hao Ly, Michel Moisan, Herve Dulphy
  • Publication number: 20030221708
    Abstract: Provided is a novel method of cleaning a semiconductor process chamber having deposits on an inner surface thereof. The method involves: (a) introducing a cleaning gas comprising hydrogen chloride into the process chamber, wherein the cleaning gas is effective to react with and remove the deposits from the inner surface of the process chamber; (b) removing gas from the process chamber; and (c) monitoring at least a portion of the removed gas for a species indicative of an endpoint of the chamber cleaning. The invention allows for the cleaning of semiconductor process chambers in an efficient manner so as to reduce process down time and improve process throughput. The method can be applied to in-line analysis.
    Type: Application
    Filed: June 4, 2002
    Publication date: December 4, 2003
    Inventors: Chun-Hao Ly, Yves Campidelli