Patents by Inventor Chun-Hsiung Chiu

Chun-Hsiung Chiu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240126177
    Abstract: An exposure device and method for semiconductor manufacturing, focusing on the creation of exposure patterns with High Dynamic Range (HDR) capabilities, is disclosed. The exposure device includes a laser source, a first spatial light modulator (SLM), specifically a Liquid Crystal on Silicon (LCOS) device, and a second SLM, specifically a Digital Micromirror Device (DMD). The LCOS is positioned upstream in the optical path and is optimized for modulating the phase of the laser. It also directs the laser light towards specific areas on the DMD, crucial for enhancing detail and contrast in exposure patterns. The DMD, placed downstream, is composed of micromirrors that modulate the amplitude of the reflected laser, essential for achieving HDR in exposure patterns. This cooperative interaction between the LCOS and DMD allows for the creation of exposure patterns with a wide range of light intensities, from very bright to very dark, thereby achieving high dynamic range.
    Type: Application
    Filed: December 26, 2023
    Publication date: April 18, 2024
    Inventors: Chun-Jung Chiu, Chun-Hsiung Chen, Wan-Chen Chuang
  • Publication number: 20240118608
    Abstract: The present disclosure pertains to a photomask cleaning device suitable for cleaning a photomask. The interior of the photomask cleaning device is equipped with a cleaning area and a photomask flipping area. The photomask has a first surface and a second surface, with a pattern and a photomask protective film set on the first surface. The photomask protective film covers the pattern. The photomask cleaning device includes a photomask flipping mechanism, a transport mechanism, and at least one cleaning mechanism. The photomask flipping mechanism is located within the photomask flipping area and is configured to flip the photomask. Additionally, the transport mechanism is used to transport the photomask, enabling the photomask to move between the photomask flipping area and the cleaning area. The cleaning mechanism is located within the cleaning area and is used to clean the photomask.
    Type: Application
    Filed: October 2, 2023
    Publication date: April 11, 2024
    Inventors: Chun-Jung Chiu, Chun-Hsiung Chen, Wan-Chen Chuang
  • Patent number: 7229000
    Abstract: An adjustable frame fixture aims to hold a printed-circuit board (PCB) to pass over a tin oven to process wave soldering. The fixture includes at least two side frames and at least two fasteners. The two side frames are coupled to form a holding dock. The positions of the two neighboring side frames are adjustable to form an area of different sizes to hold the PCB of different sizes. After the positions of the side frames have been adjusted, the fasteners are used to anchor and couple the side frames.
    Type: Grant
    Filed: August 25, 2004
    Date of Patent: June 12, 2007
    Assignee: ASUSTeK Computer Inc.
    Inventors: Peng-Wei Wang, Chun-Hsiung Chiu
  • Publication number: 20050067464
    Abstract: A fixture for supporting a printed-circuit board (PCB) has an outer frame, an inner frame and at least two inner connection members. A production line has at least two conveyor belts. The outer frame has two outer side supports for laying on the conveyor and being movable therewith, the inner frame is used for holding the PCB, and the inner connection members couple the inner frame with the outer frame for adjusting the installation angle of inner frame with the outer frame.
    Type: Application
    Filed: August 30, 2004
    Publication date: March 31, 2005
    Inventors: Peng-Wei Wang, Chun-Hsiung Chiu
  • Publication number: 20050067463
    Abstract: An adjustable frame fixture aims to hold a printed-circuit board (PCB) to pass over a tin oven to process wave soldering. The fixture includes at least two side frames and at least two fasteners. The two side frames are coupled to form a holding dock. The positions of the two neighboring side frames are adjustable to form an area of different sizes to hold the PCB of different sizes. After the positions of the side frames have been adjusted, the fasteners are used to anchor and couple the side frames.
    Type: Application
    Filed: August 25, 2004
    Publication date: March 31, 2005
    Inventors: Peng-Wei Wang, Chun-Hsiung Chiu
  • Patent number: 6742693
    Abstract: A new solder bath apparatus applied to the soldering furnace is disclosed herein. The solder bath is used for containing molten solder. And a nozzle base is located in the solder bath to flow molten solder upwards. An enclosing frame with axial horizontal pillars mounted on the two terminal sidewalls thereof is put around the nozzle base. Besides, a nozzle manufactured with two bearing pedestals on two terminal sidewalls responsive to the pillars is put around the enclosing frame. Thus, the nozzle can rotate about the axial pillars for adjusting the outlet direction thereof.
    Type: Grant
    Filed: August 27, 2002
    Date of Patent: June 1, 2004
    Assignee: Asustek Computer, Inc.
    Inventors: Po-Hung Wang, Chun-Hsiung Chiu, Peng-Wei Wang, Jung-I Ku, Chia-Hao Wu
  • Publication number: 20040090747
    Abstract: An adjustable frame structure for carrying a circuit board of different sizes, includes a frame and at least one movable bar, wherein a plurality of first fasteners and at least a pair of parallel tracks are mounted on the frame, and at least one second fastener and at least two rolling pieces are formed on the at least one movable bar. The rolling pieces roll within the tracks such that the at least one movable bar can smoothly move on the frame to adjust the location of the bar on the frame according to the size of the circuit board.
    Type: Application
    Filed: October 24, 2003
    Publication date: May 13, 2004
    Inventors: Po-Hung Wang, Peng-Wei Wang, Chun-Hsiung Chiu
  • Patent number: 6732903
    Abstract: An adjustable nozzle of a stannic furnace comprises a nozzle tank which is mounted at the upper portion of a stannic tank of the stannic furnace, a front backflow stopper and a rear backflow stopper which are respectively mounted at the forward area and the backward area inside the nozzle tank to form an opening of the nozzle such that a liquid tin within the stannic tank passes through the nozzle tank and produces a tin wave at the opening of the nozzle. The feature of the adjustable nozzle lies in that the rear backflow stopper is mounted at the backward area inside the nozzle tank by means of a rear combining means which adjusts the altitude of the rear backflow stopper with an altitudinal opening and fixes the rear backflow stopper by a fixing means so as to control the waveform of the tin wave produced by the nozzle of the stannic furnace.
    Type: Grant
    Filed: October 1, 2002
    Date of Patent: May 11, 2004
    Assignee: Asustek Computer, Inc.
    Inventors: Po-Hung Wang, Chun-Hsiung Chiu, Peng-Wei Wang, Jung-I Ku, Chia-Hao Wu
  • Publication number: 20030116607
    Abstract: An adjustable nozzle of a stannic furnace comprises a nozzle tank which is mounted at the upper portion of a stannic tank of the stannic furnace, a front backflow stopper and a rear backflow stopper which are respectively mounted at the forward area and the backward area inside the nozzle tank to form an opening of the nozzle such that a liquid tin within the stannic tank passes through the nozzle tank and produces a tin wave at the opening of the nozzle. The feature of the adjustable nozzle lies in that the rear backflow stopper is mounted at the backward area inside the nozzle tank by means of a rear combining means which adjusts the altitude of the rear backflow stopper with an altitudinal opening and fixes the rear backflow stopper by a fixing means so as to control the waveform of the tin wave produced by the nozzle of the stannic furnace.
    Type: Application
    Filed: October 1, 2002
    Publication date: June 26, 2003
    Inventors: Po-Hung Wang, Chun-Hsiung Chiu, Peng-Wei Wang, Jung-I Ku, Chia-Hao Wu
  • Publication number: 20030116606
    Abstract: A new solder bath apparatus applied to the soldering furnace is disclosed herein. The solder bath is used for containing molten solder. And a nozzle base is located in the solder bath to flow molten solder upwards. An enclosing frame with axial horizontal pillars mounted on the two terminal sidewalls thereof is put around the nozzle base. Besides, a nozzle manufactured with two bearing pedestals on two terminal sidewalls responsive to the pillars is put around the enclosing frame. Thus, the nozzle can rotate about the axial pillars for adjusting the outlet direction thereof.
    Type: Application
    Filed: August 27, 2002
    Publication date: June 26, 2003
    Inventors: Po-Hung Wang, Chun-Hsiung Chiu, Peng-Wei Wang, Jung-I Ku, Chia-Hao Wu