Patents by Inventor Chun-Hsu Lin

Chun-Hsu Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210255383
    Abstract: The disclosure provides an optical device including a diffusion layer, a light-emitting device, and a first photoluminescent film. The diffusion layer is disposed opposite to the light-emitting device, and the light-emitting device includes a plurality of light-emitting units. The first photoluminescent film is between the diffusion layer and the light-emitting device. A first distance between the first photoluminescent film and the diffusion layer is greater than a second distance between the first photoluminescent film and one of the plurality of light-emitting units. The optical device of the disclosure may improve brightness efficiency.
    Type: Application
    Filed: January 27, 2021
    Publication date: August 19, 2021
    Applicant: Innolux Corporation
    Inventors: Chieh Ying Chen, Ming Yen Lin, Chun Hsu Lin, Hsin-Yi Huang, Shu Hua Wu
  • Patent number: 10969537
    Abstract: A display device is disclosed, including: a display panel including a first substrate with a first side surface; a backlight module disposed opposite the display panel and including a light guide having a second side surface; and a first adhesive layer attached to the first side surface and the second side surface.
    Type: Grant
    Filed: September 19, 2019
    Date of Patent: April 6, 2021
    Assignee: INNOLUX CORPORATION
    Inventors: Chieh-Ying Chen, Ming-Yen Lin, Chun-Hsu Lin, Ming-Feng Hsieh
  • Publication number: 20200124787
    Abstract: A display device is disclosed, including: a display panel including a first substrate with a first side surface; a backlight module disposed opposite the display panel and including a light guide having a second side surface; and a first adhesive layer attached to the first side surface and the second side surface.
    Type: Application
    Filed: September 19, 2019
    Publication date: April 23, 2020
    Inventors: Chieh-Ying CHEN, Ming-Yen LIN, Chun-Hsu LIN, Ming-Feng HSIEH
  • Publication number: 20190088186
    Abstract: A display device is provided. The display device includes a display panel and a backlight module, the backlight module is corresponding disposed to the display panel. The backlight module emits a backlight having a backlight spectrum. The backlight spectrum includes a first waveband and a second waveband. The first waveband is within a range of 380 nm to 480 nm, and has a first integrated light intensity I(B). The second waveband is within a range of 481 nm to 600 nm, and has a sub-waveband within a range of 550 nm to 600 nm. The sub-waveband has a integrated light intensity I(G?), and a ratio of the integrated light intensity to the first integrated light intensity (I(G?)/I(B)) is within a range of 5% to 35%.
    Type: Application
    Filed: August 14, 2018
    Publication date: March 21, 2019
    Inventors: Hsin-Yi HUANG, Chun-Hsu LIN, Ming-Feng HSIEH
  • Publication number: 20180307092
    Abstract: A display apparatus includes a display cell, a first optical structure and a second optical structure respectively disposed beneath and above the display cell. The first optical structure includes a first polarizer film, an adhesive layer, a prism structure having at least a prism sheet, and a lower diffuser layer. The adhesive layer has a first haze in a range of 60%-99%. The adhesive layer is disposed between the first polarizer film and the prism structure. The lower diffuser layer is disposed at one side of the prism structure which is farther away from the adhesive layer, and the lower diffuser layer has a second haze in a range of 60%-99%.
    Type: Application
    Filed: March 26, 2018
    Publication date: October 25, 2018
    Inventors: Ming-Yen Lin, Ming-Feng Hsieh, Chun-Hsu Lin, Chieh-Ying Chen
  • Publication number: 20180203300
    Abstract: A display device includes a display panel and a backlight module. The backlight module is disposed corresponding to the display panel and includes a light guiding unit and a light-emitting unit. The light guiding unit has a light input surface, and the light-emitting unit is disposed adjacent to the light input surface along a first direction. The light-emitting unit has a plurality of first light-emitting units, a plurality of second light-emitting units and a substrate. The first light-emitting units and the second light-emitting units are disposed on the substrate along the first direction and emit light into the light guiding unit through the light input surface. An FWHM (full width at half maximum) angle of an illumination of at least one of the first light-emitting units is different from an FWHM angle of an illumination of at least one of the second light-emitting units.
    Type: Application
    Filed: December 18, 2017
    Publication date: July 19, 2018
    Inventors: Chun-Hsu LIN, Ming-Feng HSIEH, Ming-Ta YANG
  • Patent number: 9922601
    Abstract: The invention provides a backlight unit used in a display device. The backlight unit includes a light source which is driven by a pulse wave having a predetermined duty cycle. The light source emits light including a first color light and a second color light. The frequency of the pulse wave is at least 360 Hz.
    Type: Grant
    Filed: August 3, 2015
    Date of Patent: March 20, 2018
    Assignee: INNOLUX CORPORATION
    Inventors: Chun-Hsu Lin, Yi-Fen Chuang, Tai-Chieh Huang, Meng-Chang Tsai, Ming-Feng Hsieh
  • Patent number: 9260364
    Abstract: The present invention disclosed a preparation method of parylene AF4, which provides a reactant and a reducing agent with the use of catalyst or exposure to UV light with photo-initiator, to shorten the reaction time as a result of minimized the byproduct(s) formation, and obtain high purity (>99.0%) of parylene AF4 product under high concentrated reaction mixture.
    Type: Grant
    Filed: April 15, 2015
    Date of Patent: February 16, 2016
    Assignee: YUAN-SHIN MATERIALS TECHNOLOGY CORP.
    Inventors: Chun-Hsu Lin, Chien-Yi Sun, Yung-Yu Yin, Chun-Shih Li, Yo-Chun Chou
  • Publication number: 20160037600
    Abstract: The invention provides a backlight unit used in a display device. The backlight unit includes a light source which is driven by a pulse wave having a predetermined duty cycle. The light source emits light including a first color light and a second color light. The frequency of the pulse wave is at least 360 Hz.
    Type: Application
    Filed: August 3, 2015
    Publication date: February 4, 2016
    Inventors: Chun-Hsu LIN, Yi-Fen CHUANG, Tai-Chieh HUANG, Meng-Chang TSAI, Ming-Feng HSIEH
  • Publication number: 20150218067
    Abstract: The present invention disclosed a preparation method of parylene AF4, which provides a reactant and a reducing agent with the use of catalyst or exposure to UV light with photo-initiator, to shorten the reaction time as a result of minimized the byproduct(s) formation, and obtain high purity (>99.0%) of parylene AF4 product under high concentrated reaction mixture.
    Type: Application
    Filed: April 15, 2015
    Publication date: August 6, 2015
    Inventors: Chun-Hsu LIN, Chien-Yi SUN, Yung-Yu YIN, Chun-Shih LI, Yo-Chun CHOU
  • Patent number: 9056810
    Abstract: The present invention disclosed a preparation method of parylene AF4, which provides a reactant and a reducing agent with the use of catalyst or exposure to UV light with photo-initiator, to shorten the reaction time as a result of minimized the byproduct(s) formation, and obtain high purity (>99.0%) of parylene AF4 product under high concentrated reaction mixture.
    Type: Grant
    Filed: April 7, 2014
    Date of Patent: June 16, 2015
    Assignee: YUAN-SHIN MATERIALS TECHNOLOGY CORP.
    Inventors: Chun-Hsu Lin, Chien-Yi Sun, Yung-Yu Yin, Chun-Shih Li, Yo-Chun Chou
  • Patent number: 9056809
    Abstract: The present invention disclosed a preparation method of parylene AF4, which provides a reactant and a reducing agent with the use of catalyst or exposure to UV light with photo-initiator, to shorten the reaction time as a result of minimized the byproduct(s) formation, and obtain high purity (>99.0%) of parylene AF4 product under high concentrated reaction mixture.
    Type: Grant
    Filed: September 21, 2012
    Date of Patent: June 16, 2015
    Assignee: YUAN-SHIN MATERIALS TECHNOLOGY CORP.
    Inventors: Chun-Hsu Lin, Chien-Yi Sun, Yung-Yu Yin, Chun-Shih Li, Yo-Chun Chou
  • Patent number: 8816139
    Abstract: The present invention relates to a facile method of preparing 1,4-bis(chlorodifluoromethyl)benzene, comprising the steps of: (A) providing a reactant liquid of 1,4-bis(difluoromethyl)benzene; optionally (B) providing a light source for UV radiation; and (C) introducing chlorine gas into the reactant liquid at a temperature of 50-90° C. under a pressure above 1 atm to obtain 1,4-Bis(chlorodifluoromethyl)benzene. The invented facile method can be utilized in a batch process or a continuous process for effective production of 1,4-bis(chlorodifluoromethyl)benzene.
    Type: Grant
    Filed: May 22, 2012
    Date of Patent: August 26, 2014
    Assignees: Yuan-Shin Materials Technology Corp., Chung-Shan Institute of Science and Technology, Armaments Bureau, M.N.D.
    Inventors: Chun Hsu Lin, Hung Cheng Yin, Chien Yi Sun, Yung Yu Yin, Chuan Yu Chou
  • Publication number: 20140221632
    Abstract: The present invention disclosed a preparation method of parylene AF4, which provides a reactant and a reducing agent with the use of catalyst or exposure to UV light with photo-initiator, to shorten the reaction time as a result of minimized the byproduct(s) formation, and obtain high purity (>99.0%) of parylene AF4 product under high concentrated reaction mixture.
    Type: Application
    Filed: April 7, 2014
    Publication date: August 7, 2014
    Inventors: Chun-Hsu LIN, Chian-Yi SUN, Yung-Yu YIN, Chun-Shih LI, Yo-Chun CHOU
  • Publication number: 20140011986
    Abstract: The present invention disclosed a preparation method of parylene AF4, which provides a reactant and a reducing agent with the use of catalyst or exposure to UV light with photo-initiator, to shorten the reaction time as a result of minimized the byproduct(s) formation, and obtain high purity (>99.0%) of parylene AF4 product under high concentrated reaction mixture.
    Type: Application
    Filed: September 21, 2012
    Publication date: January 9, 2014
    Inventors: Chun-Hsu LIN, Chien-Yi SUN, Yung-Yu YIN, Chun-Shih LI, Yo-Chun CHOU
  • Patent number: 8504826
    Abstract: A data security protection method generates dynamic encryption keys and dynamic decryption keys for a host and a client during data transmission between the host and the client. The host stores a host initial key K0, and determines a host key Kn using a one-way hash function based on the host initial key K0. The client stores a client initial key K?0, and determines a client key K?n using the one-way hash function based on the client initial key K?0. Original data Rn is encrypted as encrypted data Xn using the host key Kn before being sent to the client. The client decrypts the encrypted data Xn using the client key K?n, to obtain the original data Rn.
    Type: Grant
    Filed: July 21, 2011
    Date of Patent: August 6, 2013
    Assignee: Hon Hai Precision Industry Co., Ltd.
    Inventors: Chun-Hsu Lin, Ching-Wei Ho, Che-Yi Chu
  • Publication number: 20130116482
    Abstract: The present invention relates to a facile method of preparing 1,4-bis(chlorodifluoromethyl)benzene, comprising the steps of: (A) providing a reactant liquid of 1,4-bis(difluoromethyl)benzene; optionally (B) providing a light source for UV radiation; and (C) introducing chlorine gas into the reactant liquid at a temperature of 50-90° C. under a pressure above 1 atm to obtain 1,4-Bis(chlorodifluoromethyl)benzene. The invented facile method can be utilized in a batch process or a continuous process for effective production of 1,4-bis(chlorodifluoromethyl)benzene.
    Type: Application
    Filed: May 22, 2012
    Publication date: May 9, 2013
    Applicants: Chung-shan Institute of Science and Technology. Armaments Bureau. M.N.D., Yuan-Shin Materials Technology Corp.
    Inventors: Chun-Hsu LIN, Hung-Cheng Yin, Chien-Yi Sun, Yung-Yu Yin, Chuan-Yu Chou
  • Patent number: 8421986
    Abstract: A substrate with a multi-domain vertical alignment pixel structure is provided. The substrate is opposite to a counter substrate with a common electrode, and a liquid crystal layer is disposed between the substrate and the counter substrate. The substrate includes a scan line and a data line, an active device, first and second patterned pixel electrodes and a voltage drop layer. Wherein, the first patterned pixel electrode provides a first electrical field to the liquid crystal layer, and the second patterned pixel electrode provides a second electrical field to the liquid crystal layer. The voltage drop layer makes the first electrical field smaller than the second electrical field.
    Type: Grant
    Filed: December 29, 2010
    Date of Patent: April 16, 2013
    Assignee: Chimei Innolux Corporation
    Inventors: Jian-Cheng Chen, Chien-Hong Chen, Chih-Yung Hsieh, Wei Lo, Chun-Hsu Lin, Ching-Che Yang, Jia-Lun Chen
  • Publication number: 20120102323
    Abstract: A data security protection method generates dynamic encryption keys and dynamic decryption keys for a host and a client during data transmission between the host and the client. The host stores a host initial key K0, and determines a host key Kn using a one-way hash function based on the host initial key K0. The client stores a client initial key K?0, and determines a client key K?n using the one-way hash function based on the client initial key K?0. Original data Rn is encrypted as encrypted data Xn using the host key Kn before being sent to the client. The client decrypts the encrypted data Xn using the client key K?n, to obtain the original data Rn.
    Type: Application
    Filed: July 21, 2011
    Publication date: April 26, 2012
    Applicant: HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: CHUN-HSU LIN, CHING-WEI HO, CHE-YI CHU
  • Publication number: 20120003442
    Abstract: A decoration film including a substrate, a releasing layer, at least an alignment mark and a pattern layer is provided. A substrate has a surface. The releasing layer is disposed on the surface of the substrate. The alignment mark is disposed on the surface of the substrate or a side of the releasing layer far from the substrate. The pattern layer is disposed on the releasing layer at a side far from the substrate in the correspondence with the alignment mark.
    Type: Application
    Filed: July 1, 2010
    Publication date: January 5, 2012
    Applicant: SIPIX CHEMICAL INC.
    Inventor: Chun-Hsu Lin