Patents by Inventor Chun-Hua Chang
Chun-Hua Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9666660Abstract: A metal insulator metal (MIM) capacitor includes a base layer and a copper bulk layer in the base layer. The MIM capacitor further includes an etch stop layer over the base layer and the copper bulk layer and an oxide-based dielectric layer over the etch stop layer. The MIM capacitor further includes a capacitor bottom layer over the oxide-based dielectric layer, an insulator layer over the capacitor bottom layer, and a capacitor top layer over the insulator layer.Type: GrantFiled: August 16, 2013Date of Patent: May 30, 2017Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Fang-Ting Kuo, Ren-Wei Xiao, Sheng Yu Lin, Chia-Wei Liu, Chun Hua Chang, Chien-Ying Wu
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Patent number: 9660016Abstract: A method of forming a device comprises forming a through via extending from a surface of a substrate into the substrate. The method also comprises forming a first insulating layer over the surface of the substrate. The method further comprises forming a first metallization layer in the first insulating layer, the first metallization layer electrically connecting the through via. The method additionally comprises forming a capacitor over the first metallization layer. The capacitor comprises a first capacitor dielectric layer over the first metallization layer and a second capacitor dielectric layer over the first capacitor dielectric layer. The method also comprises forming a second metallization layer over and electrically connecting the capacitor.Type: GrantFiled: October 15, 2014Date of Patent: May 23, 2017Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chun Hua Chang, Der-Chyang Yeh, Kuang-Wei Cheng, Yuan-Hung Liu, Shang-Yun Hou, Wen-Chih Chiou, Shin-Puu Jeng
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Publication number: 20170098607Abstract: Various structures having a fuse and methods for forming those structures are described. An embodiment is a method. The method comprises attaching a first die to a first side of a component using first electrical connectors. After the attaching, at least one of (i) the first die comprises a first fuse, (ii) the first side of the component comprises a second fuse, (iii) a second side of the component comprises a third fuse, the second side being opposite the first side, or (iv) a combination thereof. The method further comprises after the attaching the first die to the first side of the component, blowing the first fuse, the second fuse, the third fuse, or a combination thereof.Type: ApplicationFiled: December 14, 2016Publication date: April 6, 2017Inventors: Chung-Yu Lu, Hsien-Pin Hu, Shin-Puu Jeng, Shang-Yun Hou, Tzuan-Horng Liu, Shih-Wen Huang, Chun Hua Chang
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Patent number: 9530730Abstract: Various structures having a fuse and methods for forming those structures are described. An embodiment is a method. The method comprises attaching a first die to a first side of a component using first electrical connectors. After the attaching, at least one of (i) the first die comprises a first fuse, (ii) the first side of the component comprises a second fuse, (iii) a second side of the component comprises a third fuse, the second side being opposite the first side, or (iv) a combination thereof. The method further comprises after the attaching the first die to the first side of the component, blowing the first fuse, the second fuse, the third fuse, or a combination thereof.Type: GrantFiled: November 8, 2013Date of Patent: December 27, 2016Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chung-Yu Lu, Hsien-Pin Hu, Shin-Puu Jeng, Shang-Yun Hou, Tzuan-Horng Liu, Shih-Wen Huang, Chun Hua Chang
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Publication number: 20160329245Abstract: A semiconductor component includes a semiconductor substrate having an opening A first dielectric liner having a first compressive stress is disposed in the opening. A second dielectric liner having a tensile stress is disposed on the first dielectric liner. A third dielectric liner having a second compressive stress disposed on the second dielectric liner.Type: ApplicationFiled: July 20, 2016Publication date: November 10, 2016Inventors: Chen-Hua YU, Cheng-Hung CHANG, Ebin LIAO, Chia-Lin YU, Hsiang-Yi WANG, Chun Hua CHANG, Li-Hsien HUANG, Darryl KUO, Tsang-Jiuh WU, Wen-Chih CHIOU
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Patent number: 9418923Abstract: A semiconductor component includes a semiconductor substrate having an opening A first dielectric liner having a first compressive stress is disposed in the opening. A second dielectric liner having a tensile stress is disposed on the first dielectric liner. A third dielectric liner having a second compressive stress disposed on the second dielectric liner.Type: GrantFiled: September 23, 2013Date of Patent: August 16, 2016Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chen-Hua Yu, Cheng-Hung Chang, Ebin Liao, Chia-Lin Yu, Hsiang-Yi Wang, Chun Hua Chang, Li-Hsien Huang, Darryl Kuo, Tsang-Jiuh Wu, Wen-Chih Chiou
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Publication number: 20160070397Abstract: A touch panel module includes a display screen, a touch sensing member, and a cover lens. The display screen has a color filter layer provided on an outermost side thereof. The touch sensing member has a substrate and a touch sensing circuit, wherein the substrate is made of a transparent material. The touch sensing circuit is provided on the substrate to accept touching and generate corresponding electric signals. In addition, the substrate of the touch sensing member is adhered on the color filter layer of the display screen with an adhesive, which is made of a transparent adhesive material. The cover lens is made of a transparent hard material, and is installed on the touch sensing circuit.Type: ApplicationFiled: May 11, 2015Publication date: March 10, 2016Inventors: KAO-HUI SU, CHI-KUANG LAI, Yih-Jer LIN, CHUN-HUA CHANG
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Publication number: 20150130082Abstract: Various structures having a fuse and methods for forming those structures are described. An embodiment is a method. The method comprises attaching a first die to a first side of a component using first electrical connectors. After the attaching, at least one of (i) the first die comprises a first fuse, (ii) the first side of the component comprises a second fuse, (iii) a second side of the component comprises a third fuse, the second side being opposite the first side, or (iv) a combination thereof. The method further comprises after the attaching the first die to the first side of the component, blowing the first fuse, the second fuse, the third fuse, or a combination thereof.Type: ApplicationFiled: November 8, 2013Publication date: May 14, 2015Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chung-Yu Lu, Hsien-Pin Hu, Shin-Puu Jeng, Shang-Yun Hou, Tzuan-Horng Liu, Shih-Wen Huang, Chun Hua Chang
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Publication number: 20150048483Abstract: A metal insulator metal (MIM) capacitor includes a base layer and a copper bulk layer in the base layer. The MIM capacitor further includes an etch stop layer over the base layer and the copper bulk layer and an oxide-based dielectric layer over the etch stop layer. The MIM capacitor further includes a capacitor bottom layer over the oxide-based dielectric layer, an insulator layer over the capacitor bottom layer, and a capacitor top layer over the insulator layer.Type: ApplicationFiled: August 16, 2013Publication date: February 19, 2015Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Fang-Ting KUO, Ren-Wei XIAO, Sheng Yu LIN, Chia-Wei LIU, Chun Hua CHANG, Chien-Ying WU
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Publication number: 20150037960Abstract: A method of forming a device comprises forming a through via extending from a surface of a substrate into the substrate. The method also comprises forming a first insulating layer over the surface of the substrate. The method further comprises forming a first metallization layer in the first insulating layer, the first metallization layer electrically connecting the through via. The method additionally comprises forming a capacitor over the first metallization layer. The capacitor comprises a first capacitor dielectric layer over the first metallization layer and a second capacitor dielectric layer over the first capacitor dielectric layer. The method also comprises forming a second metallization layer over and electrically connecting the capacitor.Type: ApplicationFiled: October 15, 2014Publication date: February 5, 2015Inventors: Chun Hua CHANG, Der-Chyang YEH, Kuang-Wei CHENG, Yuan-Hung LIU, Shang-Yun HOU, Wen-Chih CHIOU, Shin-Puu JENG
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Patent number: 8895385Abstract: A method of forming a semiconductor structure includes forming a through-substrate-via (TSV) structure in a substrate. The method includes forming a first etch stop layer over the TSV structure. The method further includes forming a first dielectric layer in contact with the first etch stop layer. The method still further includes forming a second etch stop layer in contact with the first dielectric layer. The method also includes forming a metal-insulator-metal (MIM) capacitor structure in contact with the second etch stop layer. The method further includes forming a first conductive structure through the first etch stop layer and the first dielectric layer, wherein the first conductive structure is electrically coupled with the TSV structure and the TSV structure is substantially wider than the first conductive structure.Type: GrantFiled: September 17, 2013Date of Patent: November 25, 2014Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chun Hua Chang, Sung-Hui Huang, Der-Chyang Yeh
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Patent number: 8890224Abstract: A semiconductor structure includes a through-substrate-via (TSV) structure disposed in a substrate. A metal-insulator-metal (MIM) capacitor structure is disposed over the substrate. A dual damascene structure disposed over and electrically coupled with the TSV structure, wherein the dual damascene structure includes a via portion and a trench portion A first dielectric layer is disposed around the via portion of the dual damascene structure. A second dielectric layer disposed around the trench portion of the dual damascene, wherein the second dielectric layer is disposed over the MIM capacitor structure.Type: GrantFiled: September 17, 2013Date of Patent: November 18, 2014Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chun Hua Chang, Sung-Hui Huang, Der-Chyang Yeh
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Patent number: 8878338Abstract: Capacitor designs for substrates, such as interposers, and methods of manufacture thereof are disclosed. A through via is formed in the interposer, and a capacitor is formed between a lower level metallization layer and a higher level metallization layer. The capacitor may be, for example, a planar capacitor with dual capacitor dielectric layers.Type: GrantFiled: May 31, 2012Date of Patent: November 4, 2014Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chun Hua Chang, Der-Chyang Yeh, Kuang-Wei Cheng, Yuan-Hung Liu, Shang-Yun Hou, Wen-Chih Chiou, Shin-Puu Jeng
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Patent number: 8765549Abstract: Capacitor designs for substrates, such as interposers, and methods of manufacture thereof are disclosed. In an embodiment, a capacitor is formed between a through via and a lower level metallization layer. The capacitor may be, for example, a planar capacitor formed on the substrate or on a dielectric layer formed over the substrate.Type: GrantFiled: April 27, 2012Date of Patent: July 1, 2014Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chun Hua Chang, Shin-Puu Jeng, Der-Chyang Yeh, Shang-Yun Hou, Wen-Chih Chiou
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Publication number: 20140017873Abstract: A method of forming a semiconductor structure includes forming a through-substrate-via (TSV) structure in a substrate. The method includes forming a first etch stop layer over the TSV structure. The method further includes forming a first dielectric layer in contact with the first etch stop layer. The method still further includes forming a second etch stop layer in contact with the first dielectric layer. The method also includes forming a metal-insulator-metal (MIM) capacitor structure in contact with the second etch stop layer. The method further includes forming a first conductive structure through the first etch stop layer and the first dielectric layer, wherein the first conductive structure is electrically coupled with the TSV structure and the TSV structure is substantially wider than the first conductive structure.Type: ApplicationFiled: September 17, 2013Publication date: January 16, 2014Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chun Hua CHANG, Sung-Hui HUANG, Der-Chyang YEH
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Publication number: 20140015146Abstract: A semiconductor component includes a semiconductor substrate having an opening A first dielectric liner having a first compressive stress is disposed in the opening. A second dielectric liner having a tensile stress is disposed on the first dielectric liner. A third dielectric liner having a second compressive stress disposed on the second dielectric liner.Type: ApplicationFiled: September 23, 2013Publication date: January 16, 2014Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chen-Hua YU, Cheng-Hung CHANG, Ebin LIAO, Chia-Lin YU, Hsiang-Yi WANG, Chun Hua CHANG, Li-Hsien HUANG, Darryl KUO, Tsang-Jiuh WU, Wen-Chih CHIOU
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Publication number: 20140015101Abstract: A semiconductor structure includes a through-substrate-via (TSV) structure disposed in a substrate. A metal-insulator-metal (MIM) capacitor structure is disposed over the substrate. A dual damascene structure disposed over and electrically coupled with the TSV structure, wherein the dual damascene structure includes a via portion and a trench portion A first dielectric layer is disposed around the via portion of the dual damascene structure. A second dielectric layer disposed around the trench portion of the dual damascene, wherein the second dielectric layer is disposed over the MIM capacitor structure.Type: ApplicationFiled: September 17, 2013Publication date: January 16, 2014Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chun Hua CHANG, Sung-Hui HUANG, Der-Chyang YEH
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Publication number: 20130320493Abstract: Capacitor designs for substrates, such as interposers, and methods of manufacture thereof are disclosed. A through via is formed in the interposer, and a capacitor is formed between a lower level metallization layer and a higher level metallization layer. The capacitor may be, for example, a planar capacitor with dual capacitor dielectric layers.Type: ApplicationFiled: May 31, 2012Publication date: December 5, 2013Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chun Hua CHANG, Der-Chyang YEH, Kuang-Wei CHENG, Yuan-Hung LIU, Shang-Yun HOU, Wen-Chih CHIOU, Shin-Puu JENG
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Patent number: 8575725Abstract: A semiconductor component includes a semiconductor substrate having a top surface. An opening extends from the top surface into the semiconductor substrate. The opening includes an interior surface. A first dielectric liner having a first compressive stress is disposed on the interior surface of the opening. A second dielectric liner having a tensile stress is disposed on the first dielectric liner. A third dielectric liner having a second compressive stress disposed on the second dielectric liner. A metal barrier layer is disposed on the third dielectric liner. A conductive material is disposed on the metal barrier layer and fills the opening.Type: GrantFiled: March 13, 2013Date of Patent: November 5, 2013Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chen-Hua Yu, Cheng-Hung Chang, Ebin Liao, Chia-Lin Yu, Hsiang-Yi Wang, Chun Hua Chang, Li-Hsien Huang, Darryl Kuo, Tsang-Jiuh Wu, Wen-Chih Chiou
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Publication number: 20130285200Abstract: Capacitor designs for substrates, such as interposers, and methods of manufacture thereof are disclosed. In an embodiment, a capacitor is formed between a through via and a lower level metallization layer. The capacitor may be, for example, a planar capacitor formed on the substrate or on a dielectric layer formed over the substrate.Type: ApplicationFiled: April 27, 2012Publication date: October 31, 2013Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chun Hua Chang, Shin-Puu Jeng, Der-Chyang Yeh, Shang-Yun Hou, Wen-Chih Chiou