Patents by Inventor Chun-Kung Chen

Chun-Kung Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for mental index prediction
    Patent number: 11955245
    Abstract: A method and a system for mental index prediction are provided. The method includes the following steps. A plurality of images of a subject person are obtained. A plurality of emotion tags of the subject person in the images are analyzed. A plurality of integrated emotion tags in a plurality of predetermined time periods are calculated according to the emotion tags respectively corresponding to the images. A plurality of preferred features are determined according to the integrated emotion tags. A mental index prediction model is established according to the preferred features to predict a mental index according to the emotional index prediction model.
    Type: Grant
    Filed: July 2, 2021
    Date of Patent: April 9, 2024
    Assignees: Acer Incorporated, National Yang Ming Chiao Tung University
    Inventors: Chun-Hsien Li, Szu-Chieh Wang, Andy Ho, Liang-Kung Chen, Jun-Hong Chen, Li-Ning Peng, Tsung-Han Yang, Yun-Hsuan Chan, Tsung-Hsien Tsai
  • System and method for photolithography in semiconductor manufacturing
    Patent number: 7723014
    Abstract: A method for photolithography in semiconductor manufacturing includes providing a substrate for a wafer and providing a mask for exposing the wafer. The wafer is exposed by utilizing a combination of high angle illumination and focus drift exposure methods.
    Type: Grant
    Filed: October 26, 2005
    Date of Patent: May 25, 2010
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Kuei Shun Chen, Chin-Hsiang Lin, Tsai-Cheng Gau, Chun-Kung Chen, Hsiao-Tzu Lu, Fu-Jye Liang
  • Immersion lithography system with wafer sealing mechanisms
    Patent number: 7501226
    Abstract: An immersion lithography system is disclosed to comprise a fluid containing feature for providing an immersion fluid for performing immersion lithography on a wafer, and a seal ring covering a predetermined portion of a wafer edge for preventing the immersion fluid from leaking through the covered portion of the wafer edge while the fluid is used for the immersion lithography.
    Type: Grant
    Filed: June 23, 2004
    Date of Patent: March 10, 2009
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Burn Jeng Lin, Tsai-Sheng Gau, Chun-Kung Chen, Ru-Gun Liu, Shing Shen Yu, Jen Chieh Shih
  • Immersion lithography system with wafer sealing mechanisms
    Publication number: 20050286033
    Abstract: An immersion lithography system is disclosed to comprise a fluid containing feature for providing an immersion fluid for performing immersion lithography on a wafer, and a seal ring covering a predetermined portion of a wafer edge for preventing the immersion fluid from leaking through the covered portion of the wafer edge while the fluid is used for the immersion lithography.
    Type: Application
    Filed: June 23, 2004
    Publication date: December 29, 2005
    Inventors: Burn Lin, Tsai-Sheng Gau, Chun-Kung Chen, Ru-Gun Liu, Shing Yu, Jen Shih