Patents by Inventor Chun LENG

Chun LENG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230385252
    Abstract: An approach is provided that retrieves fingerprint configuration sets corresponding to a received data source and uses the configuration sets to generate fingerprints that correspond to the data source. These fingerprints are compared to a number of fingerprints that are stored in a repository. If a match is found, then the data quality configuration set is retrieved from the repository and used to perform a data quality analysis. On the other hand, if a match is not found, then one of the configuration sets is selected to perform the data quality analysis on the received data source and the repository is updated so that the selected fingerprint configuration set corresponds to the received data source.
    Type: Application
    Filed: May 25, 2022
    Publication date: November 30, 2023
    Inventors: Xu Bin Cai, Wei Wang, Chun Hua Sun, Chun Leng, Pin Lv, Yi Yang Ren, Jian Ling Shi, YI WANG, Tao Zhuang
  • Patent number: 11573983
    Abstract: Provided is a method, computer program product, and system for classifying a set of data items based on format organizations. A processor may determine at least one format organization of a set of data items. The format organization of a data item indicates a symbol type of at least one continuous symbol in the data item and a number of the at least one continuous symbol. The processor may determine at least one candidate data class for the set of data items from a plurality of predetermined data classes based on the at least one format organization. The processor may classify the set of data items into at least one target data class selected from the at least one candidate data class. In this way, the set of data items can be efficiently classified.
    Type: Grant
    Filed: July 2, 2020
    Date of Patent: February 7, 2023
    Assignee: International Business Machines Corporation
    Inventors: Liang Lu, Yue Wang, Sun Chun Hua, Jian Ling Shi, Yi Yang Ren, Chun Leng
  • Patent number: 11514013
    Abstract: A computer-implemented method includes: reading a vector of a first table in a database, the vector including counts of a plurality of keywords in the first table, the plurality of keywords including a first keyword and a second keyword; determining a first custom attribute describing the first table, the first custom attribute having a vector including counts of at least a first portion of the plurality of keywords in the first table; determining a multiplier of the first custom attribute, the multiplier being a number of other tables that reference the first custom attribute; and revising the vector of the first table based on the first custom attribute.
    Type: Grant
    Filed: January 8, 2020
    Date of Patent: November 29, 2022
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Liang Lu, Sun Chun Hua, Jian Ling Shi, Yi Yang Ren, Chun Leng
  • Publication number: 20220004566
    Abstract: Provided is a method, computer program product, and system for classifying a set of data items based on format organizations. A processor may determine at least one format organization of a set of data items. The format organization of a data item indicates a symbol type of at least one continuous symbol in the data item and a number of the at least one continuous symbol. The processor may determine at least one candidate data class for the set of data items from a plurality of predetermined data classes based on the at least one format organization. The processor may classify the set of data items into at least one target data class selected from the at least one candidate data class. In this way, the set of data items can be efficiently classified.
    Type: Application
    Filed: July 2, 2020
    Publication date: January 6, 2022
    Inventors: Liang Lu, Yue Wang, Sun Chun Hua, Jian Ling Shi, Yi Yang Ren, Chun Leng
  • Publication number: 20210209083
    Abstract: A computer-implemented method includes: reading a vector of a first table in a database, the vector including counts of a plurality of keywords in the first table, the plurality of keywords including a first keyword and a second keyword; determining a first custom attribute describing the first table, the first custom attribute having a vector including counts of at least a first portion of the plurality of keywords in the first table; determining a multiplier of the first custom attribute, the multiplier being a number of other tables that reference the first custom attribute; and revising the vector of the first table based on the first custom attribute.
    Type: Application
    Filed: January 8, 2020
    Publication date: July 8, 2021
    Inventors: Liang LU, Sun Chun HUA, Jian Ling SHI, Yi Yang REN, Chun LENG
  • Publication number: 20120203124
    Abstract: A mobile phone, a method of assembling a mobile phone, and a method of recording an ECG using the mobile phone. The mobile phone comprises a casing; a wireless communication module disposed inside the casing for communicating with a mobile network; one or more sensor elements integrated on the casing for measuring an electrophysiological signal of a person; and an ECG generator module disposed inside the casing and coupled to the sensor elements and the communication module for generating an ECG from the measured electrophysiological signal and for transmitting data representing said ECG via the communication module.
    Type: Application
    Filed: September 29, 2009
    Publication date: August 9, 2012
    Applicant: EPHONE INTERNATIONAL PTE LTD
    Inventor: Chun Leng Michael Lim
  • Patent number: 7208378
    Abstract: A method of manufacturing a semiconductor device includes defining a first voltage region, a second voltage region, and a third voltage region on a substrate. The first, second, and third voltage regions are configured to handle first, second, and third voltage levels, respectively, that are different from each other. A nitride layer overlying the first, second, and third voltage regions are formed. An oxide layer overlying the nitride layer is formed. The oxide layer is patterned to expose a portion of the nitride layer overlying the first voltage region. The exposed portion of the nitride layer is removed using a wet etch process. A first gate oxide layer overlying the first voltage region is formed. Portions of the oxide layer and the nitride layer overlying the second and third voltage regions are removed. Impurities are selectively implanted into the third voltage region while preventing the impurities from being provided in the second voltage region.
    Type: Grant
    Filed: May 10, 2005
    Date of Patent: April 24, 2007
    Assignee: Silterra
    Inventors: Inki Kim, Sang Yeon Kim, Min Paek, Ong Boon Teong, Oh Choong Young, Ng Chun Leng, Joung Joon Ho
  • Patent number: 6890822
    Abstract: A method of manufacturing a semiconductor device includes defining a first voltage region, a second voltage region, and a third voltage region on a substrate. The first, second, and third voltage regions are configured to handle first, second, and third voltage levels, respectively, that are different from each other. A nitride layer overlying the first, second, and third voltage regions are formed. An oxide layer overlying the nitride layer is formed. The oxide layer is patterned to expose a portion of the nitride layer overlying the first voltage region. The exposed portion of the nitride layer is removed using a wet etch process. A first gate oxide layer overlying the first voltage region is formed. Portions of the oxide layer and the nitride layer overlying the second and third voltage regions are removed. Impurities are selectively implanted into the third voltage region while preventing the impurities from being provided in the second voltage region.
    Type: Grant
    Filed: February 13, 2003
    Date of Patent: May 10, 2005
    Assignee: SilTerra Malaysia Sdn. Bhd.
    Inventors: Inki Kim, Sang Yeon Kim, Min Paek, Ong Boon Teong, Oh Choong Young, Ng Chun Leng, Joung Joon Ho
  • Publication number: 20040161897
    Abstract: A method of manufacturing a semiconductor device includes defining a first voltage region, a second voltage region, and a third voltage region on a substrate. The first, second, and third voltage regions are configured to handle first, second, and third voltage levels, respectively, that are different from each other. A nitride layer overlying the first, second, and third voltage regions are formed. An oxide layer overlying the nitride layer is formed. The oxide layer is patterned to expose a portion of the nitride layer overlying the first voltage region. The exposed portion of the nitride layer is removed using a wet etch process. A first gate oxide layer overlying the first voltage region is formed. Portions of the oxide layer and the nitride layer overlying the second and third voltage regions are removed. Impurities are selectively implanted into the third voltage region while preventing the impurities from being provided in the second voltage region.
    Type: Application
    Filed: February 13, 2003
    Publication date: August 19, 2004
    Applicant: SilTerra Malaysia Sdn. Bhd.
    Inventors: Inki Kim, Sang Yeon Kim, Min Paek, Ong Boon Teong, Oh Choong Young, Ng Chun Leng, Joung Joon Ho