Patents by Inventor Chun-Lin Cheng
Chun-Lin Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11973302Abstract: The present disclosure provides a method for aligning a master oscillator power amplifier (MOPA) system. The method includes ramping up a pumping power input into a laser amplifier chain of the MOPA system until the pumping power input reaches an operational pumping power input level; adjusting a seed laser power output of a seed laser of the MOPA system until the seed laser power output is at a first level below an operational seed laser power output level; and performing a first optical alignment process to the MOPA system while the pumping power input is at the operational pumping power input level, the seed laser power output is at the first level, and the MOPA system reaches a steady operational thermal state.Type: GrantFiled: February 20, 2023Date of Patent: April 30, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Chun-Lin Louis Chang, Henry Tong Yee Shian, Alan Tu, Han-Lung Chang, Tzung-Chi Fu, Bo-Tsun Liu, Li-Jui Chen, Po-Chung Cheng
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Publication number: 20240130088Abstract: A fluid cooling system for computer cabinets includes a frame, a fluid circulation device, a chassis distributor, at least one mainboard end module, a cold fluid channel and a hot fluid channel. The frame is installed in the accommodation space in a movable pulling manner; the chassis distributor is installed on an outer side of the frame and connected to the fluid circulation device; the cold fluid channel and the hot fluid channel are provided for connecting the chassis distributor to the mainboard end module; and the chassis distributor includes a chassis cold exhaust pipe and a chassis heat pipe, such that a working fluid flowing through the mainboard end module can have a hot and cold separation, and finally return to the fluid circulation device to form a circulating flow.Type: ApplicationFiled: October 13, 2022Publication date: April 18, 2024Inventor: CHUN-LIN CHENG
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Patent number: 11934585Abstract: A method for performing interactive operation upon a stereoscopic image and a stereoscopic image display system are provided. The stereoscopic image display system includes a stereoscopic display and a gesture sensor. In the method, the stereoscopic display displays the stereoscopic image, and the gesture sensor senses a gesture. A current gesture state is obtained. A previous state of the stereoscopic image and a previous gesture state are obtained. Stereo coordinate variations corresponding to the gesture can be calculated according to the current gesture state and the previous gesture state. New stereoscopic image data can be obtained according to the previous state of the stereoscopic image and the stereo coordinate variations corresponding to the gesture. The stereoscopic display is used to display a new stereoscopic image that is rendered from the new stereoscopic image data.Type: GrantFiled: February 21, 2022Date of Patent: March 19, 2024Assignee: LIXEL INC.Inventors: Arvin Lin, Yung-Cheng Cheng, Chun-Hsiang Yang
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Publication number: 20240088227Abstract: The structure of a semiconductor device with different gate structures configured to provide ultra-low threshold voltages and a method of fabricating the semiconductor device are disclosed. The method includes forming first and second nanostructured channel regions in first and second nanostructured layers, respectively, and forming first and second gate-all-around (GAA) structures surrounding the first and second nanostructured channel regions, respectively. The forming the first and second GAA structures includes selectively forming an Al-based n-type work function metal layer and a Si-based capping layer on the first nanostructured channel regions, depositing a bi-layer of Al-free p-type work function metal layers on the first and second nanostructured channel regions, depositing a fluorine blocking layer on the bi-layer of Al-free p-type work function layers, and depositing a gate metal fill layer on the fluorine blocking layer.Type: ApplicationFiled: November 21, 2023Publication date: March 14, 2024Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chung-Liang CHENG, Chun-I WU, Huang-Lin CHAO
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Patent number: 11058025Abstract: A two-stage modular server chassis structure includes a first chassis and a second chassis. A first assembling portion and a second assembling portion are disposed at the front of the first chassis, a first relative assembling portion and a second relative assembling portion of the second assembling portion corresponding to the two first assembling portions are disposed at the rear of the second chassis for connecting and fixing the two first assembling portions and the two first relative assembling portions, and the second assembling portion and the second relative assembling portion, so that the first chassis and the second chassis are integrally formed as a whole.Type: GrantFiled: June 19, 2020Date of Patent: July 6, 2021Assignee: POLINKE INTERNATIONAL CO., LTD.Inventor: Chun-Lin Cheng
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Publication number: 20210190752Abstract: A multi-function water quality monitoring device is provided, which includes a multi-function water quality monitoring probe and a control module. The multi-function water quality monitoring probe includes a first signal electrode, a first sensing electrode, a second signal electrode and a second sensing electrode. The control module is connected to the probe. When the control module outputs a first time-variant signal to drive the first signal electrode, the first sensing electrode outputs a first water quality signal. When the control module outputs a second time-variant signal to drive the second signal electrode, the first sensing electrode and the second sensing electrode output the first sensing signal and a second sensing signal respectively. When the control module outputs the first time-variant signal and the second time-variant signal to simultaneously drive the first signal electrode and the second signal electrode, the first sensing electrode outputs the first water quality signal.Type: ApplicationFiled: December 18, 2020Publication date: June 24, 2021Inventors: SZU-JU LI, LI-DUAN TSAI, JUNG-HAO WANG, ZHI-SHENG HUANG, CHUN-LIN CHENG
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Patent number: 8850175Abstract: A computer apparatus and a resetting method for a real time clock (RTC) of the computer apparatus are provided. The resetting method for the RTC includes: generating a judging result by determining whether the computer apparatus is in an S5 state and determining whether a plurality of pre-determined keys are simultaneously pressed; pulling down a resume reset signal according to the judging result and correspondingly pulling down an operating voltage; pulling down an S5 enabling signal after pulling down the operating voltage for a pre-determined delay time; generating an RTC reset signal for resetting the RTC after pulling down the S5 enabling signal is pulled down.Type: GrantFiled: December 15, 2011Date of Patent: September 30, 2014Assignee: Wistron CorporationInventors: Chun-Lin Cheng, Yun-Chieh Sung, Kai-Chieh Hsu, Yu-Wei Tsao
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Publication number: 20130097452Abstract: A computer apparatus and a resetting method for a real time clock (RTC) of the computer apparatus are provided. The resetting method for the RTC includes: generating a judging result by determining whether the computer apparatus is in an S5 state and determining whether a plurality of pre-determined keys are simultaneously pressed; pulling down a resume reset signal according to the judging result and correspondingly pulling down an operating voltage; pulling down an S5 enabling signal after pulling down the operating voltage for a pre-determined delay time; generating an RTC reset signal for resetting the RTC after pulling down the S5 enabling signal is pulled down.Type: ApplicationFiled: December 15, 2011Publication date: April 18, 2013Applicant: WISTRON CORPORATIONInventors: Chun-Lin Cheng, Yun-Chieh Sung, Kai-Chieh Hsu, Yu-Wei Tsao
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Publication number: 20090090214Abstract: A method for forming nano-scale metal particles by a novel reducing agent is described. The method can be carried out at room temperature and under an atmospheric environment by relatively simple processes to prepare nano-scale metal particles with a diameter less than 20 nm. This method comprises the following steps. At first, a first blending process is performed to blend a metal salt and a first solvent together to form a first solution. Then, a second blending process is performed to blend a reducing agent and a second solvent together to form a second solution. The reducing agent comprises one compound selected from the group consisting of the following or combination thereof: boron-containing hydride and boron-containing hydrocarbon. Following that, a third blending process is performed to blend the first solution and the second solution together to form a third solution. Finally, the reducing agent is used to reduce the metal salt in the third solution to form the nano-scale metal particles.Type: ApplicationFiled: October 3, 2008Publication date: April 9, 2009Applicant: CHUNG YUAN CHRISTIAN UNIVERSITYInventor: Chun-Lin Cheng
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Patent number: 6858123Abstract: The invention relates to a novel galvanizing solution for the galvanic deposition of copper. Hydroxylamine sulfate or hydroxylamine hydrochloride are utilized as addition reagents and added to the galvanizing solution during the galvanic deposition of copper which is used in the manufacture of semiconductors.Type: GrantFiled: August 25, 2000Date of Patent: February 22, 2005Assignee: Merck Patent Gesellschaft MIT Beschrankter HaftungInventors: Jung-Chih Hu, Wu-Chun Gau, Ting-Chang Chang, Ming-Shiann Feng, Chun-Lin Cheng, You-Shin Lin, Ying-Hao Li, Lih-Juann Chen
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Patent number: 5834815Abstract: A layout structure for improving a polysilicon load resistor which has a uniform high resistance is disclosed. A polysilicon film is used as the high resistance load element so that the film has a relatively high resistance. However, the resistance of these resistors often varies. This variation can be up to two orders of magnitude. The non-uniform resistance is caused by hydrogen penetration into the polysilicon resistor. The solution of the present is to layout the SRAM cell so that the polysilicon resistor is completely covered by one of these subsequent layers. In the present invention, the polysilicon resistor is partially covered by different layers, such as a subsequent metal layer or polysilicon layer.Type: GrantFiled: July 23, 1996Date of Patent: November 10, 1998Assignee: Vanguard International Semiconductor CorporationInventors: Shen-Wen Cheng, Chun-Lin Cheng
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Patent number: 5728615Abstract: A method of manufacturing a polysilicon resistor which has a uniform high resistance includes a thermal process to increase the hydrogen concentration uniformity in the polysilicon resistor. The thermal step increases the diffusion of the hydrogen into and out of the third polysilicon, thereby helping to equalize the hydrogen concentration within the polysilicon resistor. The more uniform hydrogen concentration causes the resistance of the polysilicon resistor to be more uniform.Type: GrantFiled: July 18, 1996Date of Patent: March 17, 1998Assignee: Vanguard International Semiconductor CorporationInventors: Shen-Wen Cheng, Chun-Lin Cheng