Patents by Inventor Chun-Lun Chiu

Chun-Lun Chiu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240363396
    Abstract: Semiconductor devices and methods of forming the same are provided. An exemplary semiconductor device according to the present disclosure includes a first gate structure disposed over a first backside dielectric feature, a second gate structure disposed over a second backside dielectric feature, and a gate cut feature extending continuously from laterally between the first gate structure and the second gate structure to laterally between the first backside dielectric feature and the second backside dielectric feature. The gate cut feature includes an air gap laterally between the first gate structure and the second gate structure.
    Type: Application
    Filed: July 10, 2024
    Publication date: October 31, 2024
    Inventors: Chun-Yuan Chen, Pei-Yu Wang, Huan-Chieh Su, Yi-Hsun Chiu, Cheng-Chi Chuang, Ching-Wei Tsai, Kuan-Lun Cheng, Chih-Hao Wang
  • Patent number: 12057341
    Abstract: Semiconductor devices and methods of forming the same are provided. A method according to the present disclosure includes providing a workpiece including a frontside and a backside. The workpiece includes a substrate, a first plurality of channel members over a first portion of the substrate, a second plurality of channel members over a second portion of the substrate, an isolation feature sandwiched between the first and second portions of the substrate. The method also includes forming a joint gate structure to wrap around each of the first and second pluralities of channel members, forming a pilot opening in the isolation feature, extending the pilot opening through the join gate structure to form a gate cut opening that separates the joint gate structure into a first gate structure and a second gate structure, and depositing a dielectric material into the gate cut opening to form a gate cut feature.
    Type: Grant
    Filed: September 1, 2021
    Date of Patent: August 6, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chun-Yuan Chen, Pei-Yu Wang, Huan-Chieh Su, Yi-Hsun Chiu, Cheng-Chi Chuang, Ching-Wei Tsai, Kuan-Lun Cheng, Chih-Hao Wang
  • Publication number: 20240049763
    Abstract: Provided is a method for producing a biomimetic nutrient mixture via biomimicry, comprising: Step (1) providing a mineral nutrient element precursor solution, and Step (2) reacting the mineral nutrient element precursor solution with a natural bio-reactor to obtain the biomimetic nutrient mixture, wherein the biomimetic nutrient mixture comprises a mineral nutrient element and a nutrient solution. The method can produce high biologically active mineral nutrient by an auto-synthesizing natural antioxidant through photosynthesis in the natural bio-reactor containing chlorophyll, which can provide mineral nutrient element without additional extraction procedure or extra component for manufacturing a nutritional supplement.
    Type: Application
    Filed: November 9, 2022
    Publication date: February 15, 2024
    Inventors: Lin LU, Chun-Lun CHIU, Ching-Cheng CHEN, Tai-Jung LAI, Tsu-Jun LU, Chung-Jung HUNG
  • Patent number: 11439979
    Abstract: Provided is a method of making colloidal selenium nanoparticles. The method includes the steps as follows: Step (A): providing a reducing agent and an aqueous solution containing a selenium precursor; Step (B): mixing the aqueous solution containing the selenium precursor and the reducing agent to form a mixture solution in a reaction vessel and heating the mixture solution to undergo a reduction reaction and produce a composition containing selenium nanoparticles, residues and a gas, and guiding the gas out of the reaction vessel, wherein an amount of the residues is less than 20% by volume of the mixture solution; and Step (C): dispersing the selenium nanoparticles with a medium to obtain the colloidal selenium nanoparticles. The method has advantages of simplicity, safety, time-effectiveness, cost-effectiveness, high yield and eco-friendliness.
    Type: Grant
    Filed: July 23, 2020
    Date of Patent: September 13, 2022
    Assignee: TRIPOD NANO TECHNOLOGY CORPORATION
    Inventors: Chung-Jung Hung, Chun-Lun Chiu, Chia-Chi Chang, Hsin-Chang Huang, Teng-Chieh Hsu, Meng-Hsiu Chih, Jim-Min Fang
  • Publication number: 20210394157
    Abstract: Provided is a method of making colloidal selenium nanoparticles. The method includes the steps as follows: Step (A): providing a reducing agent and an aqueous solution containing a selenium precursor; Step (B): mixing the aqueous solution containing the selenium precursor and the reducing agent to form a mixture solution in a reaction vessel and heating the mixture solution to undergo a reduction reaction and produce a composition containing selenium nanoparticles, residues and a gas, and guiding the gas out of the reaction vessel, wherein an amount of the residues is less than 20% by volume of the mixture solution; and Step (C): dispersing the selenium nanoparticles with a medium to obtain the colloidal selenium nanoparticles. The method has advantages of simplicity, safety, time-effectiveness, cost-effectiveness, high yield and eco-friendliness.
    Type: Application
    Filed: July 23, 2020
    Publication date: December 23, 2021
    Inventors: Chung-Jung HUNG, Chun-Lun CHIU, Chia-Chi CHANG, Hsin-Chang HUANG, Teng-Chieh HSU, Meng-Hsiu CHIH, Jim-Min FANG
  • Patent number: 11179781
    Abstract: Provided is a method of making colloidal platinum nanoparticles. The method includes three consecutive steps: dissolving platinum powders by a halogen-containing oxidizing agent in HCl to obtain an inorganic platinum solution containing an inorganic platinum compound; adding a reducing agent into the same reaction vessel to form a mixture solution and heating the mixture solution to undergo a reduction reaction and produce a composition containing platinum nanoparticles, residues and a gas, and guiding the gas out of the reaction vessel, wherein the amount of the residues is less than 15% by volume of the mixture solution; and adding a medium into the same reaction vessel to disperse the platinum nanoparticles to obtain colloidal platinum nanoparticles. The method is simple, safe, time-effective, cost-effective, and has the advantage of high yield.
    Type: Grant
    Filed: April 23, 2019
    Date of Patent: November 23, 2021
    Assignee: TRIPOD NANO TECHNOLOGY CORPORATION
    Inventors: Lin Lu, Kuei-Sheng Fan, Chun-Lun Chiu Chiu, Han-Wu Yen, Hao-Chan Hsu, Chia-Yi Lin, Chi-Jiun Peng, Cheng-Ding Wang, Jim-Min Fang
  • Publication number: 20210238797
    Abstract: Provided is a method of making a fiber comprising metal nanoparticles. The method includes steps of: Step (A): providing a fiber and a metal salt aqueous solution comprising first metal ions; Step (B): making the metal salt aqueous solution contact the fiber to form a fiber containing the first metal ions; and Step (C): contacting the fiber containing the first metal ions with a second metal, and performing a reduction reaction of the first metal ions to obtain the fiber comprising metal nanoparticles, wherein the fiber comprising metal nanoparticles comprises first metal nanoparticles from a reduction of the first metal ions; wherein a standard reduction potential of the first metal ions is greater than a standard reduction potential of an ionic state of the second metal, and a difference therebetween ranges from 0.4 V to 4.0 V.
    Type: Application
    Filed: April 14, 2020
    Publication date: August 5, 2021
    Inventors: LIN LU, CHUN-LUN CHIU, Chung-Jung HUNG, HSIN-CHANG HUANG, Meng-Hsiu CHIH, Cheng-Ding Wang, MENG-YI BAI
  • Patent number: 10865121
    Abstract: Provided is a method of making an inorganic platinum compound. The method includes the steps of: Step (A): providing a platinum material and a halogen-containing oxidizing agent; and Step (B): treating the platinum material with the halogen-containing oxidizing agent in a hydrochloric acid aqueous solution to obtain the inorganic platinum compound, including chloroplatinic acid or chloroplatinate salt; wherein the halogen-containing oxidizing agent excludes chlorine gas. The method of making an inorganic platinum compound is simple, safe, time-effective, cost-effective, and environment-friendly, and has the advantage of high yield.
    Type: Grant
    Filed: February 19, 2019
    Date of Patent: December 15, 2020
    Assignee: TRIPOD NANO TECHNOLOGY CORPORATION
    Inventors: Lin Lu, Kuei-Sheng Fan, Chun-Lun Chiu, Han-Wu Yen, Chi-Jiun Peng, Cheng-Ding Wang, Jim-Min Fang
  • Publication number: 20200180976
    Abstract: Provided is a method of making an inorganic platinum compound. The method includes the steps of: Step (A): providing a platinum material and a halogen-containing oxidizing agent; and Step (B): treating the platinum material with the halogen-containing oxidizing agent in a hydrochloric acid aqueous solution to obtain the inorganic platinum compound, including chloroplatinic acid or chloroplatinate salt; wherein the halogen-containing oxidizing agent excludes chlorine gas. The method of making an inorganic platinum compound is simple, safe, time-effective, cost-effective, and environment-friendly, and has the advantage of high yield.
    Type: Application
    Filed: February 19, 2019
    Publication date: June 11, 2020
    Inventors: Lin LU, Kuei-Sheng FAN, Chun-Lun CHIU, Han-Wu YEN, Chi-Jiun PENG, Cheng-Ding WANG, Jim-Min FANG
  • Publication number: 20200114429
    Abstract: Provided is a method of making colloidal platinum nanoparticles. The method includes three consecutive steps: dissolving platinum powders by a halogen-containing oxidizing agent in HCl to obtain an inorganic platinum solution containing an inorganic platinum compound; adding a reducing agent into the same reaction vessel to form a mixture solution and heating the mixture solution to undergo a reduction reaction and produce a composition containing platinum nanoparticles, residues and a gas, and guiding the gas out of the reaction vessel, wherein the amount of the residues is less than 15% by volume of the mixture solution; and adding a medium into the same reaction vessel to disperse the platinum nanoparticles to obtain colloidal platinum nanoparticles. The method is simple, safe, time-effective, cost-effective, and has the advantage of high yield.
    Type: Application
    Filed: April 23, 2019
    Publication date: April 16, 2020
    Inventors: Lin LU, Kuei-Sheng FAN, Chun-Lun CHIU CHIU, Han-Wu YEN, Hao-Chan HSU, Chia-Yi LIN, Chi-Jiun PENG, Cheng-Ding WANG, Jim-Min FANG
  • Patent number: 10099191
    Abstract: Provided is a method of making colloidal metal nanoparticles. The method includes the steps of: mixing a metal aqueous solution and a reducing agent to form a mixture solution in a reaction tank; heating the mixture solution and undergoing a reduction reaction to produce a composition containing metal nanoparticles, residues and gas, wherein the amount of the residues is less than 20% by volume of the mixture solution, and guiding the gas out of the reaction tank; dispersing the metal nanoparticles with a medium to obtain colloidal metal nanoparticles. By separating the reduction reaction step and the dispersion step, the method of making colloidal metal nanoparticles is simple, safe, time-effective, cost-effective, and has the advantage of high yield.
    Type: Grant
    Filed: June 22, 2017
    Date of Patent: October 16, 2018
    Assignee: TRIPOD TECHNOLOGY CORPORATION
    Inventors: Lin Lu, Kuei-Sheng Fan, Chen-Hsiang Wang, Chun-Lun Chiu, Ta-Wei Chang, Cheng-Ding Wang, Jim-Min Fang