Patents by Inventor Chun Pong CHAN

Chun Pong CHAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8762411
    Abstract: Parental dependency information for various data fields may be analyzed to create a data field hierarchy. Each of the data fields may be presented in a selectable list through an interface. Once a data field is selected, any immediate parent(s) and/or child(ren) field(s) of the active data element may be demarcated in the list according to the hierarchy. Additional data entry fields relating to the selected data field and its familial fields may also be displayed. Data in each of data fields may also be analyzed to identify fields with incomplete data. Systems and methods are provided.
    Type: Grant
    Filed: December 1, 2010
    Date of Patent: June 24, 2014
    Assignee: SAP AG
    Inventors: Madison Poon, Ryan Hanna, Ashley Gadd, Chun Pong Chan, Julian Gosper, Sylvie Denis
  • Publication number: 20120089631
    Abstract: Parental dependency information for various data fields may be analyzed to create a data field hierarchy. Each of the data fields may be presented in a selectable list through an interface. Once a data field is selected, any immediate parent(s) and/or child(ren) field(s) of the active data element may be demarcated in the list according to the hierarchy. Additional data entry fields relating to the selected data field and its familial fields may also be displayed. Data in each of data fields may also be analyzed to identify fields with incomplete data. Systems and methods are provided.
    Type: Application
    Filed: December 1, 2010
    Publication date: April 12, 2012
    Applicant: SAP AG
    Inventors: Madison POON, Ryan HANNA, Ashley GADD, Chun Pong CHAN, Julian GOSPER, Sylvie DENIS
  • Patent number: 6810821
    Abstract: An apparatus and method for treating the off-gas byproduct of a waste treatment system using a plasma torch. The off-gas of a graphite electrode plasma arc furnace includes carbon black or soot which must be removed. The plasma torch employs a carbon dioxide and oxygen mixture as a working gas to avoid the creation of nitrogen oxides and other toxic by-products. The plasma torch ionizes the working gas, resulting in the creation of carbon monoxide and reactive oxygen, which assists in eliminating carbon black/soot from the off-gas. Oxygen and steam are atomized and injected into the chamber housing the plasma torch system. A process control feedback system monitors the content of the output gas and controls the operation of the injectors and the plasma torch.
    Type: Grant
    Filed: May 8, 2003
    Date of Patent: November 2, 2004
    Assignees: Edmund Kin On Lau
    Inventor: Benjamin Chun Pong Chan
  • Publication number: 20030209174
    Abstract: An apparatus and method for treating the off-gas byproduct of a waste treatment system using a plasma torch. The off-gas of a graphite electrode plasma arc furnace includes carbon black or soot which must be removed. The plasma torch employs a carbon dioxide and oxygen mixture as a working gas to avoid the creation of nitrogen oxides and other toxic by-products. The plasma torch ionizes the working gas, resulting in the creation of carbon monoxide and reactive oxygen, which assists in eliminating carbon black/soot from the off-gas. Oxygen and steam are atomized and injected into the chamber housing the plasma torch system. A process control feedback system monitors the content of the output gas and controls the operation of the injectors and the plasma torch.
    Type: Application
    Filed: May 8, 2003
    Publication date: November 13, 2003
    Inventor: Benjamin Chun Pong Chan