Patents by Inventor Chun-Shan Wang

Chun-Shan Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050004339
    Abstract: The present invention discloses an active-hydrogen-containing phosphorus compound for cross-linking a resin and for imparting flame-retardancy to the cured resin, and in particular to a cured frame-retardant epoxy resin prepared by reacting the hardener with a di- or poly-functional epoxy resin via an addition reaction between the active hydrogen and the epoxide group. The present invention also discloses an epoxy resin made from the active-hydrogen-containing phosphorus compound and epihalohydrin.
    Type: Application
    Filed: July 22, 2004
    Publication date: January 6, 2005
    Inventors: Chun-Shan Wang, Jeng-Yueh Shieh, Ching Lin
  • Patent number: 6797821
    Abstract: The present invention discloses an active-hydrogen-containing phosphorus compound for cross-linking a resin and for imparting flame-retardancy to the cured resin, and in particular to a cured frame-retardant epoxy resin prepared by reacting the hardener with a di- or poly-functional epoxy resin via an addition reaction between the active hydrogen and the epoxide group. The present invention also discloses an epoxy resin made from the active-hydrogen-containing phosphorus compound and epihalohydrin.
    Type: Grant
    Filed: January 30, 2002
    Date of Patent: September 28, 2004
    Inventors: Chun-Shan Wang, Jeng-Yueh Shieh, Ching Hsuan Lin
  • Publication number: 20040024255
    Abstract: The present invention discloses an active-hydrogen-containing curing agent having a phosphorus group, and a flame retardant cured epoxy resin which can be prepared via an addition reaction between the active hydrogen and the epoxide group of an epoxy resin. The cured flame retardant epoxy resin is environmentally friendly and is suitable for printed circuit board and semiconductor encapsulation applications.
    Type: Application
    Filed: July 14, 2003
    Publication date: February 5, 2004
    Applicant: National Science Council
    Inventors: Chun-Shan Wang, Jeng-Yueh Shieh
  • Patent number: 6646064
    Abstract: A method for imparting flame retardance to an epoxy resin comprises reacting an epoxy resin with a phosphorus-containing dihydric phenol or naphthol derived from the reaction of 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide (i.e., DOPO) with a benzoquinone or naphthoquinone.
    Type: Grant
    Filed: September 10, 2001
    Date of Patent: November 11, 2003
    Assignee: National Science Council
    Inventors: Chun-Shan Wang, Jeng-Yueh Shieh
  • Patent number: 6613848
    Abstract: A hardener for an epoxy resin comprises a phenolic, thiophenolic, aminophenyl, tris-phenolic, tris-thiophenolic, tris-aminophenyl, tetrakis-phenolic, tetrakis-thiophenolic, or tetrakis-aminophenyl compounds; or phenol-formaldehyde or phenol-formaldehyde/melamine-formaldehyde resins wherein the phenyl rings are substituted with at least one of the structures wherein R1 and R2 independently are H, C1-C18 alkyl, C6-C18 aryl, C6-C18 substituted aryl, C6-C18 aryl methylene, or C6-C18 substituted aryl methylene; X is O, S or NH and Ar is wherein R is C1-C4 alkyl and n=0-5.
    Type: Grant
    Filed: May 16, 2000
    Date of Patent: September 2, 2003
    Assignee: National Science Council
    Inventors: Chun-Shan Wang, Jeng-Yueh Shieh
  • Publication number: 20030120021
    Abstract: The present invention discloses an active-hydrogen-containing phosphorus compound for cross-linking a resin and for imparting flame-retardancy to the cured resin, and in particular to a cured frame-retardant epoxy resin prepared by reacting the hardener with a di- or poly-functional epoxy resin via an addition reaction between the active hydrogen and the epoxide group. The present invention also discloses an epoxy resin made from the active-hydrogen-containing phosphorus compound and epihalohydrin.
    Type: Application
    Filed: January 30, 2002
    Publication date: June 26, 2003
    Applicant: Chun-Shan WANG
    Inventors: Chun-Shan Wang, Jeng-Yueh Shieh, Ching Hsuan Lin
  • Publication number: 20020035233
    Abstract: Flame-retardant advanced epoxy resins and cured epoxy resins which contain a rigid phosphorus group and thus provide better thermal and flame-retardant properties than the conventional epoxy resins prepared from tetrabromobisphenol A. The advanced epoxy resins are suitable for making a fiber-reinforced epoxy resin composite which is useful in the fabrication of printed circuit boards. The cured epoxy resins can be used in semiconductor encapsulation applications.
    Type: Application
    Filed: September 10, 2001
    Publication date: March 21, 2002
    Applicant: National Science Council
    Inventors: Chun-Shan Wang, Jeng-Yueh Shieh
  • Patent number: 6291627
    Abstract: A flame-retardant epoxy resin was prepared by reacting an active-hydrogen-containing phosphorus compound with a di- or poly-functional epoxy resin via an addition reaction between the active hydrogen and the epoxide group, is suitable for printed circuit board and semiconductor encapsulation applications.
    Type: Grant
    Filed: November 10, 1999
    Date of Patent: September 18, 2001
    Assignee: National Science Council
    Inventors: Chun-Shan Wang, Ching Hsuan Lin
  • Patent number: 6291626
    Abstract: Flame-retardant advanced epoxy resins and cured epoxy resins contain a rigid phosphorus group emanating from a dihydric phenol or naphthol which provides thermal and flame retardant properties. The advanced epoxy resins are suitable for making a fiber-reinforced epoxy resin composite which is useful in the fabrication of printed circuit boards. The cured epoxy resins can be used in semiconductor encapsulation applications.
    Type: Grant
    Filed: March 3, 1999
    Date of Patent: September 18, 2001
    Assignee: National Science Council
    Inventors: Chun-Shan Wang, Jeng-Yueh Shieh
  • Publication number: 20010003771
    Abstract: A flame-Retardant advanced epoxy resin was prepared by reacting an active-hydrogen-containing phosphorus compound with a di- or poly-functional epoxy resin via an addition reaction between the active hydrogen and the epoxide group, which has a high glass transition temperature (Tg), high decomposition temperature and high elastic modulus and thus is suitable for printed circuit board and semiconductor encapsulation applications by curing with a curing agent.
    Type: Application
    Filed: January 10, 2001
    Publication date: June 14, 2001
    Inventors: Chun-Shan Wang, Ching Hsuan Lin, Hong Chen Chiu
  • Patent number: 5900474
    Abstract: The invention relates to a process of producing polybutylene terephthalate by direct esterification and then melt polycondensation, characterized in that a specific catalyst composition is used, said catalyst composition comprising an organotitanium compound as primary catalyst in an amount of 0.01 to 1.0% by weight of terephthalic acid; and an alkaline metal salt of borate, pyroborate or metaborate as secondary catalyst in an amount of 0.001 to 1.0% by weight of terephthalic acid. By using said catalyt composition, amount of THF by-product generated can be reduced more than 30%, and the reaction rate of esterification can be increased over 20%.(FIG.
    Type: Grant
    Filed: August 20, 1997
    Date of Patent: May 4, 1999
    Assignee: National Science Council of Republic of China
    Inventors: Chun-Shan Wang, Ching-Shian Lin
  • Patent number: 5886134
    Abstract: The invention relates to a Bismaleimide-Triazine resin (BT resin ) and production method thereof and in particular, a series of novel BT resin prepared by reacting a novel bismaleimide with various aromatic cyanate esters. By combining said novel bismaleimide monomer with various proportions of cyanate esters having different structures, BT resins having various processing temperature conditions can be formulated, which, after polymerizing and crosslinking, can provide materials with various thermal stability, dielectric constants, and mechanical properties for various applications.
    Type: Grant
    Filed: October 6, 1997
    Date of Patent: March 23, 1999
    Assignee: National Science Council of Republic of China
    Inventors: Chun-Shan Wang, Haan-Jang Hwang
  • Patent number: 5854374
    Abstract: A process for producing a polycarbonate including melt polycondensing an aromatic dihydroxy compound and a carbonic acid diester in the presence of a phosphonium borohydride catalyst(I), ##STR1## wherein R is a straight-chain or branched alkyl group, or ##STR2## wherein each of R.sub.1, R.sub.2, and R.sub.3, independently is a C.sub.1 .about.C.sub.4 alkyl group. A colorless, transparent polycarbonate having a high molecular weight is obtained by using the phosphonium borohydride compound (I) as a transesterification catalyst, which may be used alone or incorporated with boric acid or a hindered phenol antioxidant.
    Type: Grant
    Filed: June 25, 1997
    Date of Patent: December 29, 1998
    Assignee: National Science Council
    Inventors: Chun-Shan Wang, Jen-Tau Gu
  • Patent number: 5686541
    Abstract: A modified epoxy resin is prepared by mixing an isocyanate terminated urethane prepolymer with an epoxy resin in reactive conditions. The modified epoxy resin has a low internal stress when it is cured due to the flexible backbone of the urethane prepolymer incorporated therein, and has a high glass transition temperature due to a rigid oxazolidone structure formed via the epoxy ring opening with the isocyanate groups, and thus is useful as an electronic encapsulant.
    Type: Grant
    Filed: November 14, 1995
    Date of Patent: November 11, 1997
    Assignee: National Science Council
    Inventors: Chun-Shan Wang, Tsung-Han Ho
  • Patent number: 5663238
    Abstract: The present invention relates to a random copolyester containing naphthalene ring structure, in particular to a random copolyester containing a first repeating unit which is the same as that of polyalkylene naphthalate, such as polyethylene naphthalate (PEN) and polybutylene naphthalate (PBN), and a second repeating unit which is similar to the first repeating unit except that an aryl ether linkage is incorporated thereto. The present copolyester can be prepared from a dihydroxyethoxy compound and bis(hydroxyalkyl)naphthalate via a direct melt polycondensation in the presence of a metallic catalyst.
    Type: Grant
    Filed: July 11, 1995
    Date of Patent: September 2, 1997
    Assignee: National Science Council
    Inventors: Chun-Shan Wang, Yih-Min Sun