Abstract: The present invention continuously generates a signal at an acceptable frequency without utilizing the PLL to modify the operation of the VCO. When the VCO is initialized properly to output a signal at a specific frequency, the VCO operates on its own to continuously output signals, and the VCO state is modified at regular intervals. Thus, when the interval is short enough and when the VCO is modified to the initial state every time, the VCO state will not deviate significantly from the initial state during these intervals. Thus, the VCO continuously generate signals with frequencies acceptably closed to the specific frequency. That is to say, the invention utilizes the injection lock to modify the operation of the VCO. To compare with the convention skills utilizing the PLL which has to feed back the signal generated by the VCO to the PLL for modifying the VCO state dynamically, the utilization of the injection lock simplifies the hardware and streamlines the process.

Abstract: A semiconductor package has a substrate, a chip and an encapsulation. The substrate has a dielectric layer, a copper wiring layer and a solder resist layer formed thereon. The copper wiring layer is formed on the dielectric layer and is covered by the solder resist layer. The solder resist layer has a chip area defined thereon and an annular opening formed thereon. The annular opening surrounds the chip area and exposes part of the copper wiring layer. The chip is mounted on the chip area and is encapsulated by the encapsulation. Therefore, the semiconductor package with the annular opening makes the solder resist layer discontinuous, and the concentration stress is decreased to avoid a crack formed on the solder resist layer or the copper wiring layer when doing thermal-cycle test.

Abstract: The semiconductor package has a metal layer, a first dielectric layer formed on a metal layer, and an opening formed through the first dielectric layer to expose a part of the metal layer. The bump structure has an under bump metallurgy (hereinafter UBM), a first buffer layer and a metal bump. The UBM is formed on the first part of the metal layer, a sidewall of the opening and a top surface of the first dielectric layer. The first buffer layer is formed between a part of the UBM corresponding to the top surface of the first dielectric layer and the top surface of the first dielectric layer. The metal bump is formed on the UBM. Therefore, the first buffer layer effectively absorbs a thermal stress to avoid cracks generated in the bump structure after the bonding step.

Abstract: A semiconductor package has a substrate, a chip and an encapsulation. The substrate has a dielectric layer, a copper wiring layer and a solder resist layer formed thereon. The copper wiring layer is formed on the dielectric layer and is covered by the solder resist layer. The solder resist layer has a chip area defined thereon and an annular opening formed thereon. The annular opening surrounds the chip area and exposes part of the copper wiring layer. The chip is mounted on the chip area and is encapsulated by the encapsulation. Therefore, the semiconductor package with the annular opening makes the solder resist layer discontinuous, and the concentration stress is decreased to avoid a crack formed on the solder resist layer or the copper wiring layer when doing thermal-cycle test.

Abstract: A method for packaging a semiconductor device includes the steps of: disposing a wafer on a first carrier plate; attaching a second carrier plate to a side of the first carrier plate opposite to the wafer; disposing a chip unit on a side of the wafer opposite to the first carrier plate; and covering the wafer and the chip unit with an encapsulation layer. A semiconductor packaging structure is also disclosed.

Abstract: The semiconductor package has a metal layer, a first dielectric layer formed on a metal layer, and an opening formed through the first dielectric layer to expose a part of the metal layer. The bump structure has an under bump metallurgy (hereinafter UBM), a first buffer layer and a metal bump. The UBM is formed on the first part of the metal layer, a sidewall of the opening and a top surface of the first dielectric layer. The first buffer layer is formed between a part of the UBM corresponding to the top surface of the first dielectric layer and the top surface of the first dielectric layer. The metal bump is formed on the UBM. Therefore, the first buffer layer effectively absorbs a thermal stress to avoid cracks generated in the bump structure after the bonding step.

Abstract: A method for packaging a semiconductor device includes the steps of: disposing a wafer on a first carrier plate; attaching a second carrier plate to a side of the first carrier plate opposite to the wafer; disposing a chip unit on a side of the wafer opposite to the first carrier plate; and covering the wafer and the chip unit with an encapsulation layer. A semiconductor packaging structure is also disclosed.

Abstract: A chip package structure including a circuit board, a first die, a spacer, and a second die. The first die is disposed on the circuit board, and the spacer is disposed on the circuit board, in which the spacer includes a spacer part and at least one via structure penetrating through the spacer part. The second die is disposed on the first die and the spacer, and the second die is electrically connected to the circuit board through the spacer.

Abstract: A chip package structure including a circuit board, a first die, a spacer, and a second die. The first die is disposed on the circuit board, and the spacer is disposed on the circuit board, in which the spacer includes a spacer part and at least one via structure penetrating through the spacer part. The second die is disposed on the first die and the spacer, and the second die is electrically connected to the circuit board through the spacer.