Abstract: A thermal processing system is disclosed. The thermal processing system includes a transfer stage, one or more thermal processing chambers and an interface to a deposition equipment. The transfer stage is provided to receive workpieces for thermal processing. Further the transfer stage is provided as a mechanism to move workpieces from one chamber to another chamber. The thermal processing chamber includes a heat manipulation system to heat up or cool down the workpieces. The thermal processing chamber is designed to accommodate a platform that positions each of the workpieces vertically. As a result, all workpieces are moved together with the platform to be transferred, for example, from one chamber to another chamber. Depending on implementation, the platform may be implemented to include a fixture or a plurality of fixtures, where all of the workpieces may be removably held up by the fixture or each of the workpieces is removably held up by one of the fixtures.

Abstract: Configurations for processing substrates are disclosed, where the substrates or workpieces may be used for manufacturing solar panels. According to one aspect of the present invention, a configuration includes a plurality of slender electrodes, and an injection panel including a plurality of holes. Each of the holes is provided to correspond to one of the slender electrodes with an opening. As a result, a type of chemical is injected through the opening when the electrode and a base are applied with a RF source.

Abstract: Techniques for transferring workpieces from one chamber to another chamber are disclosed. According to one aspect of the techniques, a treatment system includes a load lock chamber, a transfer chamber and one or more process chambers. The load lock chamber is provided to receive workpieces for treatment or process in one or more process chambers. The transfer chamber is provided as a mechanism to move workpieces from one chamber to another chamber. The process chamber includes a set of electrodes used to treat the workpieces with other materials. To facilitate the transfer of the workpieces, the process chamber is designed to position each of the workpieces vertically between a pair of electrodes, where each of the workpieces is removably held up by a fixture. Depending on implementation, the workpieces may be mounted on one fixture or multiple fixtures respectively. The fixture(s) is then mounted to a moving mechanism that facilitates the fixture(s) to move from one chamber to another chamber.

Abstract: A thermal processing system is disclosed. The thermal processing system includes a transfer stage, one or more thermal processing chambers and an interface to a deposition equipment. The transfer stage is provided to receive workpieces for thermal processing. Further the transfer stage is provided as a mechanism to move workpieces from one chamber to another chamber. The thermal processing chamber includes a heat manipulation system to heat up or cool down the workpieces. The thermal processing chamber is designed to accommodate a platform that positions each of the workpieces vertically. As a result, all workpieces are moved together with the platform to be transferred, for example, from one chamber to another chamber. Depending on implementation, the platform may be implemented to include a fixture or a plurality of fixtures, where all of the workpieces may be removably held up by the fixture or each of the workpieces is removably held up by one of the fixtures.

Abstract: Mechanisms for processing substrates, such as those for solar panels, are described. According to one aspect of to one embodiment, a processing chamber includes an opening to receive at least one type of chemical, a platform with a plurality of fixtures to hold a plurality of workpieces vertically, a plurality of heaters, each positioned between two of the workpieces, and a plurality of deposition assemblies, each positioned between two of the workpieces. As a result, each of the two of the workpieces positioned between one of the heaters and one of the deposition assemblies, wherein each of the deposition assemblies includes at least two injection panels with holes, the chemical is injected onto the workpieces through the two injection panels.

Abstract: A slicer circuit is disclosed. The slicer circuit has the feature that a counting-circuit is employed to count the number of continuous times of signals in a same level continuous outputted from the comparator thereof, and when the number of continuous times reaches a preset value, a control signal is output to make a resistance circuit consisting of dynamic devices open, so as to largely delay the up-shift or down-shift speed of an input DC reference level and enable the slicer circuit to continue to judge the input signal correctly according to the input DC reference level.

Abstract: A super-regenerative receiver with a damping resistor receives an input signal to produce an output signal. The super-regenerative receiver includes a sawtooth generator, a bias source, an oscillator circuit, and a quench control circuit. The oscillator circuit includes a resonant circuit, a damping resistor, an amplifier and a quench switch. The damping resistor damps the ringing signal when turning off the quench switch.