Abstract: A micro-electro mechanical system (MEMS) device includes a MEMS substrate, at least one movable element laterally confined within a matrix layer that overlies the MEMS substrate, and a cap substrate bonded to the matrix layer through bonding material portions. A first movable element selected from the at least one movable element is located inside a first chamber that is laterally bounded by the matrix layer and vertically bounded by a first capping surface that overlies the first movable element. The first capping surface includes an array of downward-protruding bumps including respective portions of a dielectric material layer. Each of the downward-protruding bumps has a vertical cross-sectional profile of an inverted hillock. The MEMS device can include, for example, an accelerometer.

Abstract: A display device including a substrate, a cholesteric liquid crystal layer, and a transparent electrode layer that are sequentially stacked is provided. The cholesteric liquid crystal layer includes cholesteric liquid crystal molecules and a plurality of transparent photoresist structures. Each of the transparent photoresist structures is a closed structure, and the cholesteric liquid crystal molecules are respectively accommodated in a plurality of patterned areas respectively surrounded by the transparent photoresist structures, so as to form a plurality of cholesteric liquid crystal patterns. The transparent electrode layer includes a plurality of sub-electrodes. The cholesteric liquid crystal patterns are respectively driven by the sub-electrodes. An orthogonal projection of each of the transparent photoresist structures on the substrate falls in an orthogonal projection of a corresponding sub-electrode of the sub-electrodes on the substrate.

Abstract: A vacuum processing apparatus (110) for deposition of a material on a substrate is provided. The vacuum processing apparatus (110) includes a vacuum chamber comprising a processing area (111); a deposition apparatus (112) within the processing area (111) of the vacuum chamber; a cooling surface (113) inside the vacuum chamber; and one or more movable shields (220) between the cooling surface (113) and the processing area (111).

Abstract: A device includes: a stack of semiconductor nanostructures; a gate structure wrapping around the semiconductor nanostructures, the gate structure extending in a first direction; a source/drain region abutting the gate structure and the stack in a second direction transverse the first direction; a contact structure on the source/drain region; a backside conductive trace under the stack, the backside conductive trace extending in the second direction; a first through via that extends vertically from the contact structure to a top surface of the backside dielectric layer; and a gate isolation structure that abuts the first through via in the second direction.

Abstract: A behavior of a computer security threat is described in a root-cause chain, which is represented by a detection rule. The detection rule includes the objects of the root-cause chain and computer operations that represent links of the root-cause chain. An endpoint computer establishes a link between objects described in the detection rule when a corresponding computer operation between the objects is detected. Detected computer operations are accumulated to establish the links between objects. The threat is identified to be in the computer when the links of the detection rule have been established.

Abstract: A behavior of a computer security threat is described in a root-cause chain, which is represented by a detection rule. The detection rule includes the objects of the root-cause chain and computer operations that represent links of the root-cause chain. An endpoint computer establishes a link between objects described in the detection rule when a corresponding computer operation between the objects is detected. Detected computer operations are accumulated to establish the links between objects. The threat is identified to be in the computer when the links of the detection rule have been established.

Abstract: An edge parameter computing method for an image, wherein the image includes a plurality of pixels forming a Bayer pattern. The edge parameter computing method comprises: (a) computing an average grey level of at least one specific type pixels in a specific region of the image; (b) computing each grey level difference value between the average grey level and the specific type pixels in the specific region to generate a plurality of grey level difference values; (c) finding a specific pixel with a maximum grey level difference value according to the grey level difference values; and (d) computing a ratio value between the average grey level and the maximum grey level difference value as the edge parameter.

Abstract: A camera with defective pixel compensation is provided. The camera comprises a register and a compensating unit. The compensating unit receives an image datum and a plurality of adjacent image data relating to the image datum and, according to the value installed in the register, the compensator selects a reference datum from the plurality of adjacent image data. When the image datum is greater than the reference datum by a threshold value, the compensating unit modifies the image datum according to the reference datum.

Abstract: An edge parameter computing method for an image, wherein the image includes a plurality of pixels forming a Bayer pattern. The edge parameter computing method comprises: (a) computing an average grey level of at least one specific type pixels in a specific region of the image; (b) computing each grey level difference value between the average grey level and the specific type pixels in the specific region to generate a plurality of grey level difference values; (c) finding a specific pixel with a maximum grey level difference value according to the grey level difference values; and (d) computing a ratio value between the average grey level and the maximum grey level difference value as the edge parameter.

Abstract: A camera with defective pixel compensation is provided. The camera comprises a register and a compensating unit. The compensating unit receives an image datum and a plurality of adjacent image data relating to the image datum and, according to the value installed in the register, the compensator selects a reference datum from the plurality of adjacent image data. When the image datum is greater than the reference datum by a threshold value, the compensating unit modifies the image datum according to the reference datum.