Abstract: The present invention provides a flexible display cover substrate, which comprises a transparent polyimide film; and a device protection layer formed by curing a hard coating composition and disposed on at least one surface of the transparent polyimide film. The hard coating composition includes a hydrophobic UV-curable resin, an antistatic agent, a compound with three or more reactive functional groups, an elastic oligomer, an initiator and a modified inorganic nanoparticle. According to the present invention, a flexible display cover substrate with low haze and good bending resistance can be obtained.

Abstract: The present disclosure is related to a filter, which includes a near infrared light filtering substrate, having a near infrared light absorbing dye; an absorbing layer, having a near infrared light absorbing dye and an ultraviolet light absorbing dye, and formed on one surface of the near infrared light filtering substrate; a first multi-layer film, formed on the absorbing layer; and a second multi-layer film, formed on the other surface of the near infrared light filtering substrate.

Abstract: The disclosure provides a functionalized soybean compound, and a coating composition employing the same. The functionalized soybean compound has the chemical structure represented below: wherein, each n is independent and an integer from 1 to 10; each m is independent and an integer from 1 to 10; each x is independent and can be 1 or 2; and each R1 is independent and can be hydroxyl group, wherein i can be 1, or 2, j can be an integer from 4 to 60, R2 can be hydrogen, C1-3 alkyl group, or acrylic group, R3 and R4 are hydrogen, or R3 and R4 are linked together with the carbon atoms to which R3 and R4 are attached to form a saturated and unsaturated six-membered ring, and R6, R7, and R8 are independent and can be hydrogen, or C1-6 alkyl group.

Abstract: The disclosure provides a functionalized soybean compound, and a coating composition employing the same. The functionalized soybean compound has the chemical structure represented below: wherein, each n is independent and an integer from 1 to 10; each m is independent and an integer from 1 to 10; each x is independent and can be 1 or 2; and each R1 is independent and can be hydroxyl group, wherein i can be 1, or 2, j can be an integer from 4 to 60, R2 can be hydrogen, C1-3 alkyl group, or acrylic group, R3 and R4 are hydrogen, or R3 and R4 are linked together with the carbon atoms to which R3 and R4 are attached to form a saturated and unsaturated six-membered ring, and R6, R7, and R8 are independent and can be hydrogen, or C1-6 alkyl group.

Abstract: A method of fabricating an active layer thin film by a metal-chalcogenide precursor solution is provided, including the steps of: synthesizing a metal-chalcogenide precursor containing benzyl or benzyl derivative; dissolving the precursor in a solvent to produce a precursor solution, wherein a chalcogen element or compound can be added to the precursor solution to adjust the molar ratio of metal ion to chalcogen; and then applying the precursor solution onto a substrate in a specific coating manner, to form a film of the metal-chalcogenide after a curing process. Thereby, the existing method wherein an amorphous silicon active layer film is fabricated by plasma enhanced chemical vapor deposition (PECVD) is replaced.

Abstract: A method of fabricating an active layer thin film by a metal-chalcogenide precursor solution is provided, including the steps of: synthesizing a metal-chalcogenide precursor containing benzyl or benzyl derivative; dissolving the precursor in a solvent to produce a precursor solution, wherein a chalcogen element or compound can be added to the precursor solution to adjust the molar ratio of metal ion to chalcogen; and then applying the precursor solution onto a substrate in a specific coating manner, to form a film of the metal-chalcogenide after a curing process.