Abstract: A water quality detection device including a detection tank, a sensor, the cleaner and a processor is provided. The sensor is disposed on the detection tank and is configured to sense a to-be-detected liquid within the detection tank. The cleaner is configured to clean the sensor. The processor is electrically connected to the sensor and the cleaner and is configured to: execute an initialization procedure, which includes driving the sensor to sense the to-be-detected liquid to obtain a number of initial sensing values and calculating a threshold value according to the initial sensing values; drive the sensor to sense the to-be-detected liquid to obtain a sensing value of the to-be-detected liquid, and determine whether the sensing value of the to-be-detected liquid reaches the threshold value; drive the cleaner to operate when the sensing value of the to-be-detected liquid reaches the threshold value.

Abstract: A method includes placing a polisher head on platen, the polisher head including a set of first magnets, and controlling a set of second magnets to rotate the polisher head on the platen, wherein controlling the set of second magnets includes reversing the polarity of at least one second magnet of the set of second magnets to produce a magnetic force on at least one first magnet of the set of first magnets, wherein the set of second magnets are external to the polisher head.

Abstract: A bokeh filter membrane, which is disposed on a surface of a substrate, includes a gradient thickness absorbing membrane and an anti-reflection membrane. The anti-reflection membrane includes a high-and-low refraction membrane and a gradient refraction membrane. A transmittance of the substrate at a center thereof is greater than a transmittance of the substrate at a peripheral region thereof. The high-and-low refraction membrane includes a first high-and-low refraction membrane and a second high-and-low refraction membrane, the gradient thickness absorbing membrane is farther away from the substrate than the first high-and-low refraction membrane, the second high-and-low refraction membrane is farther away from the substrate than the gradient thickness absorbing membrane, and the gradient refraction membrane is farther away from the substrate than the second high-and-low refraction membrane. The gradient refraction membrane includes a plurality of pores.

Abstract: A method of forming a semiconductor device includes forming a first conductive feature on a bottom surface of an opening through a dielectric layer. The forming the first conductive feature leaves seeds on sidewalls of the opening. A treatment process is performed on the seeds to form treated seeds. The treated seeds are removed with a cleaning process. The cleaning process may include a rinse with deionized water. A second conductive feature is formed to fill the opening.

Abstract: A catadioptric optical membrane, which is disposed on a surface of a substrate, includes a reflection membrane and a matting membrane. The reflection membrane is disposed on an effective optical path area of the substrate and includes a reflection metal membrane and a reflection oxidation membrane. The reflection oxidation membrane includes a first reflection oxidation membrane and a second reflection oxidation membrane. The reflection metal membrane is farther away from the substrate than the first reflection oxidation membrane. The second reflection oxidation membrane is farther away from the substrate than the reflection metal membrane. The matting membrane is disposed on a non-effective optical path area of the substrate. The matting membrane includes a deep-color membrane and a first anti-reflection membrane. The deep-color membrane includes a deep-color metal membrane and a deep-color oxidation membrane. The deep-color membrane is farther away from the substrate than the first anti-reflection membrane.

Abstract: Provided are semiconductor devices that include a first gate structure having a first end cap portion, a second gate structure having a second end cap portion coaxial with the first gate structure, a first dielectric region separating the first end cap portion and the second end cap portion, a first conductive element extending over the first gate structure, a second conductive element extending over the second gate structure, and a gate via electrically connecting the second gate structure and the second conductive element, with the first dielectric region having a first width and being positioned at least partially under the first conductive element and defines a spacing between the gate via and an end of the second end cap portion that exceeds a predetermined distance.

Abstract: In some implementations, one or more semiconductor processing tools may form a metal cap on a metal gate. The one or more semiconductor processing tools may form one or more dielectric layers on the metal cap. The one or more semiconductor processing tools may form a recess to the metal cap within the one or more dielectric layers. The one or more semiconductor processing tools may perform a bottom-up deposition of metal material on the metal cap to form a metal plug within the recess and directly on the metal cap.

Abstract: The present disclosure relates to an integrated chip. The integrated chip includes an image sensing element disposed within a substrate. A gate structure is disposed along a front-side of the substrate. A back-side of the substrate includes one or more first angled surfaces defining a central diffuser disposed over the image sensing element. The back-side of the substrate further includes second angled surfaces defining a plurality of peripheral diffusers laterally surrounding the central diffuser. The plurality of peripheral diffusers are a smaller size than the central diffuser.

Abstract: An electrical device and an operation control method are provided. The electronic device includes a touch module and a processor. The touch module includes a touchable region. The touchable region is divided into at least a first touchable region and a second touchable region. The first touchable region is configured to implement a first function. The second touchable region is configured to implement the first function and a second function. The processor is electrically connected to the touch module. When at least one first touch point is detected in the first touchable region, at least one second touch point is detected in the second touchable region, and the processor determines that a distance between the first touch point and the second touch point is within a predetermined distance, the second touchable region is switched to implementing the first function.

Abstract: A calibration method for machine tools comprises: providing a workpiece on a machine tool; rotating the workpiece around a first rotation axis parallel to a main shaft of the machine tool and processing the workpiece by a first machining mode; measuring a first dimensional error of a shape of the workpiece along directions of first and second linear axes perpendicular to the first rotation axis; calculating a positional error of the first rotation axis according to the first dimensional error; rotating the workpiece around a second rotation axis perpendicular to the main shaft and processing the workpiece by a different second machining mode; measuring a second dimensional error of the shape of the workpiece along a direction of a third linear axis perpendicular to the second rotation axis; calculating a positional error of the second rotation axis according to the second dimensional error.

Abstract: A thermal compensation system for machine tools includes a thermal compensation-monitoring device and a cloud processing device. The thermal compensation-monitoring device receives a plurality of temperature signals of a workpiece and corresponding processing tolerance data to build or update a thermal compensation database. The cloud processing device provides a thermal compensation model, and applies the model with the characterized temperature signals and the tolerance data to generate a compensation value so as to decide whether or not to modify the model or to run a compensation is necessary.

Abstract: A monitoring method and a monitoring system for a machine tool to machine a workpiece are provided. The monitoring method includes the following steps. First, a vibration signal of a spindle of the machine tool is detected. Next, a vibration feature value of the vibration signal is obtained. Whether the vibration feature value exceeds a threshold condition is determined, wherein the threshold condition is determined by a training model based on a predetermined surface quality of the workpiece. When the vibration feature value exceeds the threshold condition, a machining parameter of the machine tool is adjusted.

Abstract: Systems, methods, and non-transitory computer-readable media can identify a set of videos. One or more overlapping portions in the set of videos are automatically identified. A stitched media content item is automatically generated based on the one or more overlapping portions and at least a subset of the set of videos.

Abstract: Systems, methods, and non-transitory computer-readable media can identify a set of videos. One or more overlapping portions in the set of videos are automatically identified. A stitched media content item is automatically generated based on the one or more overlapping portions and at least a subset of the set of videos.

Abstract: A laser device for additive manufacturing and an operation method thereof are provided. The laser device has a laser generation unit, a spectroscopic unit, a control unit, and a lens assembly unit. A laser beam is split into two or more beams by disposing the spectroscopic unit and the lens assembly unit. Thus, a roughness of a process surface and a process time can be reduced.

Abstract: A laser device for additive manufacturing and an operation method thereof are provided. The laser device has a laser generation unit, a spectroscopic unit, a control unit, and a lens assembly unit. A laser beam is split into two or more beams by disposing the spectroscopic unit and the lens assembly unit. Thus, a roughness of a process surface and a process time can be reduced.

Abstract: Systems, methods, and non-transitory computer-readable media can identify a set of videos. One or more overlapping portions in the set of videos are automatically identified. A stitched media content item is automatically generated based on the one or more overlapping portions and at least a subset of the set of videos.

Abstract: A filtering plate and a method for making the same and a filtering device having the same are provided. The filtering plate includes: a plate body, integrally formed of metal as one piece; a plurality of holed units, each holed unit penetrating the plate body and including a big hole and a plurality of small holes communicated with the big hole, the small hole being formed by laser processing and having a first end communicated with the big hole and a second end, the first end being greater than the second end in cross-sectional area.

Abstract: The present invention provides a panoramic viewing system, which includes a panoramic reflection mirror, formed in an elliptical conical status, and the conical surface thereof is defined as a curved surface used for reflecting an ambient light source; and an image sensor, disposed at one side of the panoramic reflection mirror and used for receiving a light source from the panoramic reflection mirror so as to generate an image data; wherein the panoramic reflection mirror allows a panoramic image to be formed in a rectangular area when the panoramic image is projected by the panoramic reflection mirror to the image sensor. In addition, the present invention also discloses a method of panoramic viewing, a panoramic projecting system, a method of panoramic projecting and a panoramic image sensor.

Abstract: A dry-type cleaning machine includes a negative pressure unit, a first dust gathering unit having a first dust sucking passage communicated with the negative pressure unit, and a barrel body. The barrel body has a receiving space communicated with the first dust sucking passage, a feeding inlet for a material to be sieved, a discharging portion, a rotary assembly in the receiving space, and a sieve layer. The material to be sieved includes crushed aggregates and dirt. The sieve layer is between the rotary assembly and the first dust sucking passage. The rotary assembly is for stirring the material to be sieved. The feeding inlet, the first dust sucking passage and the receiving space form a negative pressure passage. The sieve layer allows the dirt to pass through and enter the first dust sucking passage. The crushed aggregates are discharged out of the receiving space.