Patents by Inventor Chun-Yuan Chuang

Chun-Yuan Chuang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240295823
    Abstract: A method for manufacturing an electronic device is provided. In the method for manufacturing an electronic device, a substrate is provided, a device layer is disposed on the substrate, and a photoresist layer is disposed on the device layer. Next, a photo mask is disposed on the photoresist layer, and a light source is used to firstly illuminate the photo mask to form a first exposure region. After that, a relative movement is made between the substrate and the photo mask, and the light source is used to secondly illuminate the photo mask to form a second exposure region, wherein the first exposure region partially overlaps the second exposure region. Afterwards, a pattern is developed on the substrate, the device layer is etched using a patterned photoresist layer as an etching mask, and then the patterned photoresist layer is removed.
    Type: Application
    Filed: May 13, 2024
    Publication date: September 5, 2024
    Applicant: Innolux Corporation
    Inventors: Chun-Yuan Chuang, Ming-Chih Chen, Jean Huang, Wei-Jen Wang, Tao-Lung Cheng
  • Publication number: 20210063889
    Abstract: A method for manufacturing an electronic device is provided. In the method for manufacturing an electronic device, a substrate is provided, a device layer is disposed on the substrate, and a photoresist layer is disposed on the device layer. Next, a photo mask is disposed on the photoresist layer, and a light source is used to firstly illuminate the photo mask to form a first exposure region. After that, a relative movement is made between the substrate and the photo mask, and the light source is used to secondly illuminate the photo mask to form a second exposure region, wherein the first exposure region partially overlaps the second exposure region. Afterwards, a pattern is developed on the substrate, the device layer is etched using a patterned photoresist layer as an etching mask, and then the patterned photoresist layer is removed.
    Type: Application
    Filed: June 22, 2020
    Publication date: March 4, 2021
    Applicant: Innolux Corporation
    Inventors: Chun-Yuan Chuang, Ming-Chih Chen, Jean Huang, Wei-Jen Wang, Tao-Lung Cheng