Patents by Inventor Chung-Beum HONG

Chung-Beum HONG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive photosensitive resin composition, and photosensitive resin film and display device prepared by using the same
    Patent number: 9482943
    Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a first dissolution-controlling agent including at least one of compounds represented by the following Chemical Formula 1 or Chemical Formula 2; (D) a second dissolution-controlling agent including a compound represented by the following Chemical Formula 3; and (E) a solvent, and a photosensitive resin film and a display device using the same.
    Type: Grant
    Filed: May 21, 2014
    Date of Patent: November 1, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Jin-Hee Kang, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Soo Kim, Yong-Tae Kim, Kun-Bae Noh, Eun-Bi Park, Jae-Yeol Baek, Jae-Hwan Song, Eun-Kyoung Youn, Bum-Jin Lee, Jong-Hwa Lee, Jin-Young Lee, Chung-Beum Hong, Eun-Ha Hwang, In-Chul Hwang
  • Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Display Device
    Publication number: 20150118622
    Abstract: Disclosed are a positive photosensitive resin composition including (A) a polybenzoxazole precursor having a polydispersity of about 1 to about 1.6; (B) a photosensitive diazoquinone compound; (C) a thermal acid generator; and (D) a solvent, a photosensitive resin film using the same, and a display device.
    Type: Application
    Filed: May 22, 2014
    Publication date: April 30, 2015
    Applicant: Cheil Industries Inc.
    Inventors: Jin-Hee KANG, Ji-Yun KWON, Dae-Yun KIM, Sang-Kyeon KIM, Sang-Soo KIM, Yong-Tae KIM, Kun-Bae NOH, Eun-Bi PARK, Jae-Yeol BAEK, Jae-Hwan SONG, Bum-Jin LEE, Jong-Hwa LEE, Jin-Young LEE, Chung-Beum HONG, Eun-Ha HWANG, In-Chul HWANG
  • Photosensitive resin composition for insulating film of display device, insulating film using the same, and display device using the same
    Patent number: 8987342
    Abstract: A photosensitive resin composition for an insulating film of a display device includes (A) an alkali soluble resin including a polybenzoxazole precursor, polyamic acid, polyimide, or a combination thereof; (B) a photosensitive diazoquinone compound; (C) an ultraviolet (UV) absorber having a maximum absorption wavelength of about 300 to about 400 nm; and (D) a solvent. An insulating film and a display device can include the photosensitive resin composition.
    Type: Grant
    Filed: August 8, 2013
    Date of Patent: March 24, 2015
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Jin-Hee Kang, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Soo Kim, Yong-Tae Kim, Kun-Bae Noh, Eun-Bi Park, Jae-Hwan Song, Eun-Kyoung Youn, Jong-Hwa Lee, Jin-Young Lee, Chung-Beum Hong, Eun-Ha Hwang, In-Chul Hwang
  • Positive Photosensitive Resin Composition, and Photosensitive Resin Film and Display Device Prepared by Using the Same
    Publication number: 20150050594
    Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a first dissolution-controlling agent including at least one of compounds represented by the following Chemical Formula 1 or Chemical Formula 2; (D) a second dissolution-controlling agent including a compound represented by the following Chemical Formula 3; and (E) a solvent, and a photosensitive resin film and a display device using the same.
    Type: Application
    Filed: May 21, 2014
    Publication date: February 19, 2015
    Applicant: Cheil Industries Inc.
    Inventors: Ji-Yun KWON, Jin-Hee KANG, Dae-Yun KIM, Sang-Kyeon KIM, Sang-Soo KIM, Yong-Tae KIM, Kun-Bae NOH, Eun-Bi PARK, Jae-Yeol BAEK, Jae-Hwan SONG, Eun-Kyoung YOUN, Bum-Jin LEE, Jong-Hwa LEE, Jin-Young LEE, Chung-Beum HONG, Eun-Ha HWANG, In-Chul HWANG
  • Photosensitive Resin Composition for Insulating Film of Display Device, Insulating Film Using the Same, and Display Device Using the Same
    Publication number: 20140186768
    Abstract: A photosensitive resin composition for an insulating film of a display device includes (A) an alkali soluble resin including a polybenzoxazole precursor, polyamic acid, polyimide, or a combination thereof; (B) a photosensitive diazoquinone compound; (C) an ultraviolet (UV) absorber having a maximum absorption wavelength of about 300 to about 400 nm; and (D) a solvent. An insulating film and a display device can include the photosensitive resin composition.
    Type: Application
    Filed: August 8, 2013
    Publication date: July 3, 2014
    Applicant: Cheil Industries Inc.
    Inventors: Ji-Yun KWON, Jin-Hee KANG, Dae-Yun KIM, Sang-Kyeon KIM, Sang-Soo KIM, Yong-Tae KIM, Kun-Bae NOH, Eun-Bi PARK, Jae-Hwan SONG, Eun-Kyoung YOUN, Jong-Hwa LEE, Jin-Young LEE, Chung-Beum HONG, Eun-Ha HWANG, In-Chul HWANG