Patents by Inventor Chung Chang Chen

Chung Chang Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240160826
    Abstract: The routing of conductors in the conductor layers in an integrated circuit are routed using mixed-Manhattan-diagonal routing. Various techniques are disclosed for selecting a conductor scheme for the integrated circuit prior to fabrication of the integrated circuit. Techniques are also disclosed for determining the supply and/or the demand for the edges in the mixed-Manhattan-diagonal routing.
    Type: Application
    Filed: November 17, 2023
    Publication date: May 16, 2024
    Inventors: Sheng-Hsiung Chen, Huang-Yu Chen, Chung-Hsing Wang, Jerry Chang Jui Kao
  • Publication number: 20240111139
    Abstract: An imaging lens assembly module includes a lens barrel, a catadioptric lens assembly, an imaging lens assembly, a first fixing element and a second fixing element. The lens barrel has a first relying surface and a second relying surface, which face towards an object side of the imaging lens assembly module. The catadioptric lens assembly relies on the first relying surface. The imaging lens assembly is disposed on an image side of the catadioptric lens assembly, and relies on the second relying surface. The first fixing element is for fixing the catadioptric lens assembly to the lens barrel. The second fixing element is for fixing the imaging lens assembly to the lens barrel. The catadioptric lens assembly is for processing at least twice internal reflections of an image light in the imaging lens assembly module, and for providing optical refractive power.
    Type: Application
    Filed: September 26, 2023
    Publication date: April 4, 2024
    Inventors: Lin-An CHANG, Chung Hao CHEN, Wen-Yu TSAI, Ming-Ta CHOU
  • Publication number: 20240113112
    Abstract: Methods of cutting gate structures and fins, and structures formed thereby, are described. In an embodiment, a substrate includes first and second fins and an isolation region. The first and second fins extend longitudinally parallel, with the isolation region disposed therebetween. A gate structure includes a conformal gate dielectric over the first fin and a gate electrode over the conformal gate dielectric. A first insulating fill structure abuts the gate structure and extends vertically from a level of an upper surface of the gate structure to at least a surface of the isolation region. No portion of the conformal gate dielectric extends vertically between the first insulating fill structure and the gate electrode. A second insulating fill structure abuts the first insulating fill structure and an end sidewall of the second fin. The first insulating fill structure is disposed laterally between the gate structure and the second insulating fill structure.
    Type: Application
    Filed: December 1, 2023
    Publication date: April 4, 2024
    Inventors: Ryan Chia-Jen Chen, Cheng-Chung Chang, Shao-Hua Hsu, Yu-Hsien Lin, Ming-Ching Chang, Li-Wei Yin, Tzu-Wen Pan, Yi-Chun Chen
  • Patent number: 11946569
    Abstract: An actuating and sensing module is disclosed and includes a bottom plate, a gas pressure sensor, a thin gas transportation device and a cover plate. The bottom plate includes a pressure relief orifice, a discharging orifice and a communication orifice. The gas pressure sensor is disposed on the bottom plate and seals the communication orifice. The thin gas transportation device is disposed on the bottom plate and seals the pressure relief orifice and the discharging orifice. The cover plate is disposed on the bottom plate and covers the gas pressure sensor and the thin gas-transportation device. The cover plate includes an intake orifice. The thin gas transportation device is driven to inhale gas through the intake orifice, the gas is then discharged through the discharging orifice by the thin gas transportation device, and a pressure change of the gas is sensed by the gas pressure sensor.
    Type: Grant
    Filed: April 19, 2021
    Date of Patent: April 2, 2024
    Assignee: MICROJET TECHNOLOGY CO., LTD.
    Inventors: Hao-Jan Mou, Shih-Chang Chen, Jia-Yu Liao, Hung-Hsin Liao, Chung-Wei Kao, Chi-Feng Huang, Yung-Lung Han, Chang-Yen Tsai, Wei-Ming Lee
  • Patent number: 11935894
    Abstract: An integrated circuit device includes a device layer having devices spaced in accordance with a predetermined device pitch, a first metal interconnection layer disposed above the device layer and coupled to the device layer, and a second metal interconnection layer disposed above the first metal interconnection layer and coupled to the first metal interconnection layer through a first via layer. The second metal interconnection layer has metal lines spaced in accordance with a predetermined metal line pitch, and a ratio of the predetermined metal line pitch to predetermined device pitch is less than 1.
    Type: Grant
    Filed: November 4, 2022
    Date of Patent: March 19, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Fong-yuan Chang, Chun-Chen Chen, Po-Hsiang Huang, Lee-Chung Lu, Chung-Te Lin, Jerry Chang Jui Kao, Sheng-Hsiung Chen, Chin-Chou Liu
  • Publication number: 20240070364
    Abstract: An integrated circuit includes a first power rail and a second power rail extending in a first direction, and a first power grid stub connected to the first power rail through a first via-connector. The integrated circuit also includes a first vertical conducting line extending in a second direction in a circuit cell between a first vertical cell boundary and a second vertical cell boundary. The first vertical conducting line and the first power grid stub are in a same metal layer and aligned with each other along the second direction.
    Type: Application
    Filed: August 23, 2022
    Publication date: February 29, 2024
    Inventors: Johnny Chiahao LI, Sheng-Hsiung CHEN, Hui-Zhong ZHUANG, Jerry Chang Jui KAO, Xiangdong CHEN, Chung-Hsing WANG
  • Patent number: 7128821
    Abstract: An electropolishing method for removing potential device-contaminating particles from a wafer, is disclosed. The method includes immersing the wafer in an electropolishing electrolyte solution and removing defects and particles from the wafer by rotational friction between the wafer and the electrolyte solution in combination with electrolysis. The method is effective in removing particles from via openings of all sizes, including via openings having a width smaller than about 0.2 ?m.
    Type: Grant
    Filed: January 20, 2004
    Date of Patent: October 31, 2006
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Shih-Ho Lin, Chung-Chang Chen, Kei-Wei Chen, Shih-Tzung Chang, Chao-Lung Chen, Po-Jen Shih, Yu-Ku Lin, Ying-Lang Wang
  • Publication number: 20050155869
    Abstract: An electropolishing method for removing potential device-contaminating particles from a wafer, is disclosed. The method includes immersing the wafer in an electropolishing electrolyte solution and removing defects and particles from the wafer by rotational friction between the wafer and the electrolyte solution in combination with electrolysis. The method is effective in removing particles from via openings of all sizes, including via openings having a width smaller than about 0.2 ?m.
    Type: Application
    Filed: January 20, 2004
    Publication date: July 21, 2005
    Inventors: Shih-Ho Lin, Chung-Chang Chen, Kei-Wei Chen, Shih-Tzung Chang, Chao-Lung Chen, Po-Jen Shih, Yu-Ku Lin, Ying-Lang Wang
  • Patent number: 6181916
    Abstract: A communication system includes a primary unit transmitting a first signal at a first instance, receiving a second signal at a second instance and energized by a power source having a voltage level, a secondary unit transmitting a third signal at a first instance, receiving a fourth signal at a second instance, and having a first communication mode and a second communication-shut mode, and a mode-changing device enabling the primary unit to generate a mode-changing signal to be received by the secondary unit for changing the secondary unit from the first communication mode into the second communication-shut mode when the voltage level falls below a specific value. A mode-changing method for such communication system is also provided.
    Type: Grant
    Filed: August 27, 1998
    Date of Patent: January 30, 2001
    Assignee: DBTEL Incorporated
    Inventors: Michael Mou, Chung Chang Chen