Abstract: A semiconductor device and method of manufacture are provided. In some embodiments isolation regions are formed by modifying a dielectric material of a dielectric layer such that a first portion of the dielectric layer is more readily removed by an etching process than a second portion of the dielectric layer. The modifying of the dielectric material facilitates subsequent processing steps that allow for the tuning of a profile of the isolation regions to a desired geometry based on the different material properties of the modified dielectric material.

Abstract: A dynamic panoramic image parameter adjustment system and a method thereof are provided. The dynamic panoramic image parameter adjustment system includes a plurality of image capture elements and a parameter processing module. Firstly, a plurality of first images is captured by the image capture elements at a first time point. A plurality of first parameter setting values corresponding to the image capture elements are extracted by the parameter processing module. The parameter processing module calculates element compensation values based on the first parameter setting values and the target setting values, and compensates the first parameter setting values by using the element compensation values to form the second parameter setting values. Finally, the first parameter setting values are adjusted as the second parameter setting values at a second time point and a plurality of second images for forming a dynamic panoramic image together with the first images are captured.

Abstract: A dynamic panoramic image parameter adjustment system and a method thereof are provided. The dynamic panoramic image parameter adjustment system includes a plurality of image capture elements and a parameter processing module. Firstly, a plurality of first images is captured by the image capture elements at a first time point. A plurality of first parameter setting values corresponding to the image capture elements are extracted by the parameter processing module. The parameter processing module calculates element compensation values based on the first parameter setting values and the target setting values, and compensates the first parameter setting values by using the element compensation values to form the second parameter setting values. Finally, the first parameter setting values are adjusted as the second parameter setting values at a second time point and a plurality of second images for forming a dynamic panoramic image together with the first images are captured.