Abstract: A deposition apparatus including a vaporizer; a chemical supplier; a pipe line coupled between the vaporizer and the chemical supplier; and a solvent supplier coupled to the pipe line. A method of cleaning a deposition apparatus including putting a solvent into a vaporizer; cleaning the vaporizer by impregnating the vaporizer with the solvent; and removing contaminated liquid which remains after cleaning the vaporizer.

Abstract: Embodiments disclosed herein are generally directed to a chemical supplying apparatus, a semiconductor manufacturing equipment having the same and a method for supplying chemicals. The apparatus includes a tank, a first sensor, and a second sensor. The tank is filled with a liquid chemical and includes an outlet for the liquid chemical. The first sensor transmits a signal to a surface of the liquid chemical to detect a level of the liquid chemical within the tank. The probe includes a gap within which the liquid chemical can flow and the second sensor detects whether the liquid chemical are present inside the gap.