Patents by Inventor Chung-hei Yeung

Chung-hei Yeung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100243046
    Abstract: Chalcogenide based photovoltaic devices cells with good resistance to environmental elements can be formed by direct low temperature deposition of inorganic barrier layers onto the film. A unique multilayer barrier can be formed in a single step when reactive sputtering of the silicon nitride onto an inorganic oxide top layer of the PV device.
    Type: Application
    Filed: March 23, 2010
    Publication date: September 30, 2010
    Inventors: Marty W. Degroot, Rebekah K. Feist, Mark T. Bernius, William F. Banholzer, Chung-Hei Yeung, Attiganal N. Sreeram, Robert P. Haley, JR.
  • Patent number: 7708446
    Abstract: Disclosed herein is a display film stack for a backlight display system. In one embodiment, the display system comprises: a light source, a first film comprising a first surface texture layer that is formed of a first material of a first refractive index, and a second film comprising a second surface texture layer that is formed of a second material of a second refractive index. The second film is disposed between the light source and the first film. The second refractive index is greater than the first refractive index. The light source is disposed in optical communication with the first film and the second film. The first surface texture layer and the second surface texture layer comprise unit structures independently selected from the group consisting of hemispherical structures, partial hemispherical structures, ellipsoidal structures, immersed spherical beads, ellipsoidal beads, “bell-shape” bump and complex lens shape structures.
    Type: Grant
    Filed: February 26, 2008
    Date of Patent: May 4, 2010
    Assignee: Sabic Innovative Plastic IP B.V.
    Inventors: Jian Zhou, Kevin Patrick Capaldo, Chung-hei Yeung, Mahari Tjahjadi, Andrei Sharygin
  • Publication number: 20090219461
    Abstract: Disclosed herein is a display film stack for a backlight display system. In one embodiment, the display system comprises: a light source, a first film comprising a first surface texture layer that is formed of a first material of a first refractive index, and a second film comprising a second surface texture layer that is formed of a second material of a second refractive index. The second film is disposed between the light source and the first film. The second refractive index is greater than the first refractive index. The light source is disposed in optical communication with the first film and the second film. The first surface texture layer and the second surface texture layer comprise unit structures independently selected from the group consisting of hemispherical structures, partial hemispherical structures, ellipsoidal structures, immersed spherical beads, ellipsoidal beads, “bell-shape” bump and complex lens shape structures.
    Type: Application
    Filed: February 26, 2008
    Publication date: September 3, 2009
    Inventors: Jian Zhou, Kevin Patrick Capaldo, Chung-hei Yeung, Mahari Tjahjadi, Andrei Sharygin
  • Patent number: 7371590
    Abstract: A system for the inspection of and a process for the correction of defects in a microreplicated optical display film manufacturing process. The process steps of manufacturing a master, a plurality of shims from the master, and a multiplicity of display films from each shim are integrated with a systemic defect identification and correction process. Each primary manufacturing step has its own inspection system and correction process where defect information for that step of the process is fed back and analyzed; and from that analysis the subprocess is adjusted to eliminate or reduce the detected defect. The systemic defect is identified as to its source and then fed back and analyzed in the correction step of the respective subprocess in order to cure the root of the defect.
    Type: Grant
    Filed: November 21, 2005
    Date of Patent: May 13, 2008
    Assignee: General Electric Company
    Inventors: Kevin Patrick Capaldo, Mark Allen Cheverton, Dennis Joseph Coyle, Michael John Davis, Sameer Kirti Talsania, Masako Yamada, Chung-hei Yeung
  • Publication number: 20070117225
    Abstract: A system for the inspection of and a process for the correction of defects in a microreplicated optical display film manufacturing process. The process steps of manufacturing a master, a plurality of shims from the master, and a multiplicity of display films from each shim are integrated with a systemic defect identification and correction process. Each primary manufacturing step has its own inspection system and correction process where defect information for that step of the process is fed back and analyzed; and from that analysis the subprocess is adjusted to eliminate or reduce the detected defect. The systemic defect is identified as to its source and then fed back and analyzed in the correction step of the respective subprocess in order to cure the root of the defect.
    Type: Application
    Filed: November 21, 2005
    Publication date: May 24, 2007
    Inventors: Kevin Capaldo, Mark Cheverton, Dennis Coyle, Michael Davis, Sameer Talsania, Masako Yamada, Chung-hei Yeung
  • Publication number: 20040043234
    Abstract: A light management film having internal refraction or reflection properties comprising an arylate polyester polymer having reheological properties suitable for micro replications of surface structures during the application of heat and pressure, and a suitable refractive index of from about 1.4 to about 2.0.
    Type: Application
    Filed: May 9, 2003
    Publication date: March 4, 2004
    Inventors: Grant Hay, Chung-hei Yeung
  • Patent number: 6574584
    Abstract: A method is provided for evaluating stall/surge margin of a machine of interest. The method includes identifying a vital factor where each the vital factors corresponds to operation of the machine of interest. Raw data relating to the vital factor is provided. A contribution of the vital factor to the stall/surge margin is determined from at least the provided raw data. The contribution of the vital factor to the stall/surge margin is statistically analyzed. A stall/surge margin is allocated based on the statistical analysis of the contribution of the vital factor. An operating limit line is defined based on the allocation of the stall/surge margin.
    Type: Grant
    Filed: December 11, 2000
    Date of Patent: June 3, 2003
    Assignee: General Electric Company
    Inventors: Chung-Hei Yeung, Joseph Anthony Cotroneo, John David Stampfli
  • Publication number: 20020072876
    Abstract: A method is provided for evaluating stall/surge margin of a machine of interest. The method includes identifying a vital factor where each the vital factors corresponds to operation of the machine of interest. Raw data relating to the vital factor is provided. A contribution of the vital factor to the stall/surge margin is determined from at least the provided raw data. The contribution of the vital factor to the stall/surge margin is statistically analyzed. A stall/surge margin is allocated based on the statistical analysis of the contribution of the vital factor. An operating limit line is defined based on the allocation of the stall/surge margin.
    Type: Application
    Filed: December 11, 2000
    Publication date: June 13, 2002
    Inventors: Chung-Hei Yeung, Joseph Anthony Cotroneo, John David Stampfli
  • Patent number: 6364602
    Abstract: A transfer function between the inlet air-flow consumed by a Gas Turbine engine, and the engine parameters of speed, pressure ratio, and Inlet Guide Vane (IGV) angle is described. An active compressor Operating Limit Line (OLL) management strategy that leverages this improved flow measurement transfer function is also described. The improved flow measurement capability afforded by the transfer function permits a deterioration in flow rate caused by compressor fouling to be detected. Using the deterioration in flow rate as a proxy for compressor fouling, a degraded surge boundary associated with fouling can be predicted, using a transfer function between degradation of air-flow along operating line and degradation of surge line. In combination, the inventive improvements in flow measurement and operating line management afford added compressor surge protection across the operating range, while permitting the attainment of elevated pressure ratios associated with high thermodynamic efficiency and output.
    Type: Grant
    Filed: January 6, 2000
    Date of Patent: April 2, 2002
    Assignee: General Electric Company
    Inventors: Philip L. Andrew, Chung-hei Yeung, Joseph A. Cotroneo, John David Stampfli