Patents by Inventor Chung-Hsien Chou

Chung-Hsien Chou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • INSPECTING METHOD AND INSPECTING EQUIPMENT
    Publication number: 20140011306
    Abstract: An inspecting method and an inspecting equipment including a dividing unit, a determining unit, a transferring unit and an inspecting unit for inspecting a disk are provided. The inspecting method includes the following steps. First, a plane is divided into several zones with equal area. Next, several measuring locations are determined within these zones. Next, these measuring locations are transferred into several sets of measuring locations corresponding to the disk through a coordinate transfer. Then, the disk is inspected according to these sets of measuring locations.
    Type: Application
    Filed: September 16, 2013
    Publication date: January 9, 2014
    Applicant: MACRONIX INTERNATIONAL CO., LTD.
    Inventors: Kai-Wen TU, Jen-Hung WANG, Chung-Hsien CHOU, Wen-Sen PAN
  • INSPECTING METHOD AND INSPECTING EQUIPMENT
    Publication number: 20100014745
    Abstract: An inspecting method and an inspecting equipment including a dividing unit, a determining unit, a transferring unit and an inspecting unit for inspecting a disk are provided. The inspecting method includes the following steps. First, a plane is divided into several zones with equal area. Next, several measuring locations are determined within these zones. Next, these measuring locations are transferred into several sets of measuring locations corresponding to the disk through a coordinate transfer. Then, the disk is inspected according to these sets of measuring locations.
    Type: Application
    Filed: July 16, 2008
    Publication date: January 21, 2010
    Applicant: MACRONIX INTERNATIONAL CO., LTD.
    Inventors: Kai-Wen Tu, Jen-Hung Wang, Chung-Hsien Chou, Wen-Sen Pan
  • Method for certifying a newly-made photomask
    Publication number: 20030073008
    Abstract: A method for certifying a newly-made photomask is disclosed. A wafer is provided first. Then, a pattern of a newly-made photomask is transferred onto the wafer in order to form a first pattern thereon, followed by transferring a pattern of an original photomask onto the wafer to form a second pattern. Subsequently, a comparison between the first pattern and the second pattern is made by using an optical inspector for examining the correctness of the newly-made photomask.
    Type: Application
    Filed: October 30, 2001
    Publication date: April 17, 2003
    Inventors: Ming-Yu Lin, Wei Ming Chen, Chung-Hsien Chou, Man-Tang Wu