Abstract: Various embodiments of the present disclosure are directed towards a semiconductor processing system including an overlay (OVL) shift measurement device. The OVL shift measurement device is configured to determine an OVL shift between a first wafer and a second wafer, where the second wafer overlies the first wafer. A photolithography device is configured to perform one or more photolithography processes on the second wafer. A controller is configured to perform an alignment process on the photolithography device according to the determined OVL shift. The photolithography device performs the one or more photolithography processes based on the OVL shift.

Abstract: A touch display device includes a touch display panel, a gate driver, a touch sensing processor and a common compensation voltage processing circuit. The touch display panel includes gate lines, pixels, common detection electrodes and common compensation electrodes. The pixels, arranged in an array, couples to the gate lines and the data lines. The common detection electrodes, arranged in an array, individually overlap with a part of the pixels. The common compensation electrodes respectively dispose between every two adjacent rows of the common detection electrodes. The gate driver couples to the gate lines to provide sequentially enabled gate signals thereto during a display period. The touch sensing processor couples to the common detection electrodes, and sets voltage levels of the common detection electrodes to a common voltage during the display period, and scans the common detection electrodes to determine whether the touch display panel is touched during a touch period.