Patents by Inventor Chung Jun LEE

Chung Jun LEE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11963410
    Abstract: A display device includes a substrate including a pixel region and a peripheral region. A plurality of pixels is disposed in the pixel region of the substrate. Each of the plurality of pixels includes a light emitting element. Data lines and scan lines are connected to each of the plurality of pixels. A power line is configured to supply power to the plurality of pixels. The power line includes a plurality of first conductive lines and a plurality of second conductive lines intersecting the plurality of first conductive lines. The plurality of second conductive lines is arranged in a region between adjacent light emitting elements of the plurality of pixels. At least some of the plurality of second conductive lines extend in a direction oblique to a direction of extension of the data lines or the scan lines.
    Type: Grant
    Filed: June 13, 2022
    Date of Patent: April 16, 2024
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Yang Wan Kim, Byung Sun Kim, Jae Yong Lee, Chung Yi, Hyung Jun Park, Su Jin Lee
  • Patent number: 10968410
    Abstract: A methane (CH4) gas is synthesized from carbon dioxide (CO2) and hydrogen (H2) using catalyst-dielectric barrier discharge (DBD) plasma at room temperature and atmospheric pressure. In the method and apparatus for synthesizing methane gas of the invention, methane (CH4) gas, which is synthetic natural gas, can be effectively synthesized only from carbon dioxide (CO2) and hydrogen (H2) using DBD plasma at room temperature and atmospheric pressure, and also, additional heating and pressurization devices are not used during the methane gas synthesis process, thus reducing production costs and realizing high-value-added processing due to the absence of risks during the processing.
    Type: Grant
    Filed: November 16, 2016
    Date of Patent: April 6, 2021
    Assignee: INDUSTRY-ACADEMIC COOPERATION FOUNDATION CHOSUN UNIVERSITY
    Inventors: Tae Gyu Kim, Chung Jun Lee
  • Publication number: 20170355919
    Abstract: A methane (CH4) gas is synthesized from carbon dioxide (CO2) and hydrogen (H2) using catalyst-dielectric barrier discharge (DBD) plasma at room temperature and atmospheric pressure. In the method and apparatus for synthesizing methane gas of the invention, methane (CH4) gas, which is synthetic natural gas, can be effectively synthesized only from carbon dioxide (CO2) and hydrogen (H2) using DBD plasma at room temperature and atmospheric pressure, and also, additional heating and pressurization devices are not used during the methane gas synthesis process, thus reducing production costs and realizing high-value-added processing due to the absence of risks during the processing.
    Type: Application
    Filed: November 16, 2016
    Publication date: December 14, 2017
    Applicant: Industry-Academic Cooperation Foundation Chosun University
    Inventors: Tae Gyu KIM, Chung Jun LEE