Patents by Inventor Chung-jwa Kim

Chung-jwa Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180079989
    Abstract: Lubrication and friction reduction improves fuel efficiency and reduces energy consumption. Effective and controllable material removal results in superior surface finishing and planarization. Nanosheets are developed with specific functionalization that can be used to reduce friction and wear, improve the fluidic property, and rheological performance The nanosheets can be from the graphite family, transition metal dichalcogenides, transition metal trichalcogenides, semiconducting chalcogenides, metal oxides, layered hydroxides, clays, ternary transition metal carbides and nitrides, and zirconium phosphates and phosphonates, and their corresponding dopants. Tribological, rheological, and polishing applications include lubricants, viscosity modification, and chemical-mechanical planarization. The nanosheets are useful in improving efficiency and lifetime of machinery, saving energy for mechanical operations, and optimizing manufacturing processes in surface engineering.
    Type: Application
    Filed: December 23, 2014
    Publication date: March 22, 2018
    Applicant: The Texas A&M University System
    Inventors: Hong Liang, Huaping Xiao, Xingliang He, Chung-jwa Kim, Yunyun Chen