Patents by Inventor Chung-Kwei Lin

Chung-Kwei Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140348941
    Abstract: A method for manufacturing bioactive glass includes the steps below. A precursor and a polar solvent are mixed to form a mixed solution, in which the precursor includes a silicon precursor, a calcium precursor and a phosphorus precursor. The mixed solution is atomized to form a mixture droplet. The mixture droplet is oxidized in an environment of 500° C. to 900° C. to form the bioactive glass.
    Type: Application
    Filed: November 7, 2013
    Publication date: November 27, 2014
    Applicants: Taipei Medical University (TMU), National Taiwan University of Science and Technology
    Inventors: Shao-Ju SHIH, Yu-Jen CHOU, Chung-Kwei LIN
  • Publication number: 20100112349
    Abstract: A nanomaterial with a core-shell structure is provided. The nanomaterial comprises a shell and a core, wherein the shell is located on at least a portion of the surface of the core. The shell is substantially composed of a first metal oxide. The core is substantially composed of a second metal oxide, while the second metal oxide is a non-stoichiometric compound. The inventive nanomaterial exhibits excellent properties, such as good gas sensitivity and better field emission property, and has a high applicability.
    Type: Application
    Filed: July 28, 2009
    Publication date: May 6, 2010
    Applicant: National Taipei University of Technology
    Inventors: Cherng-Yuh SU, Hsuan-Ching Lin, Chung-Kwei Lin
  • Publication number: 20050121327
    Abstract: Process for thin-film electroless-plated deposition onto the substrate, which is either hydrophilic or hydrophobic silicon based dielectric material (e.g., silicon dioxide, silicate glass, or polysiloxanes), is a substitute for the conventional sensitization/activation route by pre-treating the surface of the dielectric substrate by plasma (H2/N2, N2, H2, or O2), immersing the substrate in a basic aqueous solution for removing hydrogen, immersing the substrate in a basic aqueous solution of metal ions for adsorbing the metal ions thereon, reducing the metal ions on the surface of the substrate, and immersing the substrate in an electroless-plating solution to deposit an electroless-plated metal film. The substrate formed of hydrophobic polysiloxanes which is properly pretreated by gaseous plasma can be immersed in a basic solution with strong oxidizing capability and/or performing a selective pattern by plasma treatment.
    Type: Application
    Filed: November 8, 2004
    Publication date: June 9, 2005
    Inventors: Giin-Shan Chen, Sung-Te Chen, Tsong-Jen Yang, Chung-Kwei Lin, Rong-Fuh Louh