Abstract: An antenna apparatus, a communication apparatus, and a steering adjustment method thereof are provided. The antenna apparatus includes an antenna structure. The antenna structure includes an antenna unit. The antenna unit includes i feeding ports, where i is a positive integer larger than 2. A vector of each of the feeding ports is controlled independently. In the steering adjustment method, a designated direction is determined, where the designated direction corresponds to beam directionality of the antenna structure. In addition, the vectors of the feeding ports of the antenna unit are configured according to the designated direction. Accordingly, the antenna size can be reduced, and beam steering in multiple directions would be achieved.

Abstract: A semiconductor device includes a substrate having a first device and a second device, where at least one of the first device and the second device includes a photo-sensitive element. The semiconductor device includes a first isolation feature surrounding the first device, where the first isolation feature has a first depth. The semiconductor device includes a second isolation feature surrounding the second device, where the second isolation feature has a second depth and where the first depth is greater than the second depth.

Abstract: A semiconductor device includes a substrate having an array region defined thereon, a ring of magnetic tunneling junction (MTJ) region surrounding the array region, a gap between the array region and the ring of MTJ region, and metal interconnect patterns overlapping part of the ring of MTJ region. Preferably, the array region includes a magnetic random access memory (MRAM) region and a logic region and the ring of MTJ region further includes a first MTJ region and a second MTJ region extending along a first direction and a third MTJ region and a fourth MTJ region extending along a second direction.

Abstract: Some implementations described herein include systems and techniques for fabricating a wafer-on-wafer product using a filled lateral gap between beveled regions of wafers included in a stacked-wafer assembly and along a perimeter region of the stacked-wafer assembly. The systems and techniques include a deposition tool having an electrode with a protrusion that enhances an electromagnetic field along the perimeter region of the stacked-wafer assembly during a deposition operation performed by the deposition tool. Relative to an electromagnetic field generated by a deposition tool not including the electrode with the protrusion, the enhanced electromagnetic field improves the deposition operation so that a supporting fill material may be sufficiently deposited.

Abstract: In some embodiments, the present disclosure relates to an integrated chip that includes a first and second transistors arranged over a substrate. The first transistor includes first channel structures extending between first and second source/drain regions. A first gate electrode is arranged between the first channel structures, and a first protection layer is arranged over a topmost one of the first channel structures. The second transistor includes second channel structures extending between the second source/drain region and a third source/drain region. A second gate electrode is arranged between the second channel structures, and a second protection layer is arranged over a topmost one of the second channel structures. The integrated chip further includes a first interconnect structure arranged between the substrate and the first and second channel structures, and a contact plug structure coupled to the second source/drain region and arranged above the first and second gate electrodes.

Abstract: A method for forming a semiconductor device includes providing a semiconductor substrate, implanting n-type impurities into a device region in the semiconductor substrate to form an implanted region and an un-implanted region. The method also includes forming an epitaxial layer on the semiconductor substrate and forming a trench surrounding the device region in direct contact with the implanted region. The method further includes performing a selective lateral etch through the trench to remove the implanted region to form a cavity under the epitaxial layer. The un-implanted region is retained to form a pillar under the epitaxial layer. Next, an insulating material is disposed in the cavity and the trench. The method forms a single crystalline region that is separated from the semiconductor substrate by the insulating material except at the pillar.

Abstract: Various embodiments of the present disclosure are directed towards a semiconductor processing system including an overlay (OVL) shift measurement device. The OVL shift measurement device is configured to determine an OVL shift between a first wafer and a second wafer, where the second wafer overlies the first wafer. A photolithography device is configured to perform one or more photolithography processes on the second wafer. A controller is configured to perform an alignment process on the photolithography device according to the determined OVL shift. The photolithography device performs the one or more photolithography processes based on the OVL shift.

Abstract: A field-of-view transformation structure of a head-mounted magnifying-glass comprises: a wearing-piece, a supporting-assembly, a first pivoting-portion, a magnifying-glass main-body, a first prism main-body, and a second prism main-body; wherein the supporting-assembly is set with the wearing-piece, the first pivoting-portion is defined on the supporting-assembly, the magnifying-glass main-body and the first pivoting-portion are pivotally set mutually, a first facing-eye-surface is defined on the first prism main-body corresponding to the magnifying-glass main-body, and a second facing-eye-surface is defined on a offset position of the magnifying-glass main-body; thus, the user can wear the wearing-piece, when wanting using the first prism main-body to watch, the magnifying-glass main-body can be flipped upwards; or, the user can directly view the second facing-eye-surface to simultaneously watch other parts of the patient when watching the magnifying-glass main-body.

Abstract: A debug system is provided. The debug system includes a debug card and an electronic device. The debug card displays a debug result corresponding to a debug code. The debug card includes a first port. The first port has a first pin and a second pin. An identification signal having a first logic level is applied to the first pin. The electronic device includes a processor and a second port. The processor performs a debug operation to provide the debug code. The second port has a third pin and a fourth pin. When the second port is electrically connected to the first port, the third pin receives the identification signal and provides the debug code to the first port through the fourth pin according to the identification signal. The second pin receives the debug code.

Abstract: A field-of-view transformation structure of a head-mounted magnifying-glass comprises: a wearing-piece, a supporting-assembly, a first pivoting-portion, a magnifying-glass main-body, a first prism main-body, and a second prism main-body; wherein the supporting-assembly is set with the wearing-piece, the first pivoting-portion is defined on the supporting-assembly, the magnifying-glass main-body and the first pivoting-portion are pivotally set mutually, a first facing-eye-surface is defined on the first prism main-body corresponding to the magnifying-glass main-body, and a second facing-eye-surface is defined on a offset position of the magnifying-glass main-body; thus, the user can wear the wearing-piece, when wanting using the first prism main-body to watch, the magnifying-glass main-body can be flipped upwards; or, the user can directly view the second facing-eye-surface to simultaneously watch other parts of the patient when watching the magnifying-glass main-body.

Abstract: A computerized chart recorder is revealed, comprises a signal conversion unit, an operation control unit, a printing control unit, and a database. A signal conversion unit receives measurement signals of a measurement instrument, and converts the measurement signals to signal conversion data. A operation control unit receives the signal conversion data required for printing, produces corresponding chart data, and prints the curve of signal variations, which can be also displayed on a human-machine interface unit. Whether to store the data or to print can be determined. Besides, the data can be also transmitted to a printing control unit. When the printing control unit is activated, it can receive the chart data and the quality assurance data, and control a printing unit to emulate the chart recorder for executing chart recording. In addition, the quality assurance data can be printed as well for complying with the requirements of the quality-assurance operations.

Abstract: A computerized chart recorder is revealed, comprises a signal conversion unit, an operation control unit, a printing control unit, and a database. A signal conversion unit receives measurement signals of a measurement instrument, and converts the measurement signals to signal conversion data. A operation control unit receives the signal conversion data required for printing, produces corresponding chart data, and prints the curve of signal variations, which can be also displayed on a human-machine interface unit. Whether to store the data or to print can be determined. Besides, the data can be also transmitted to a printing control unit. When the printing control unit is activated, it can receive the chart data and the quality assurance data, and control a printing unit to emulate the chart recorder for executing chart recording. In addition, the quality assurance data can be printed as well for complying with the requirements of the quality-assurance operations.