Patents by Inventor Chung-Liang Lin
Chung-Liang Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240110968Abstract: An inspection system includes an excitation light source, a voltage-sensing film, an illumination light source, an image capture device. The excitation light source provides an excitation beam to light-emitting diodes to generate open-circuit voltages. The voltage-sensing film is at a top side of the light-emitting diodes and includes a voltage-sensing medium layer and a first electrode layer. The first electrode layer is in the voltage-sensing medium layer to provide a gain effect of the open-circuit voltages, so that the voltage-sensing medium layer senses the open-circuit voltages, and a display of the voltage-sensing medium layer is changed with a portion or all of the open-circuit voltages. The illumination light source provides an illumination beam to the voltage-sensing film to generate a sensing image according to a display change. The image capture device is on a transmission path of the sensing image and receives the sensing image to generate an inspection result.Type: ApplicationFiled: June 14, 2023Publication date: April 4, 2024Applicant: Industrial Technology Research InstituteInventors: Yan-Rung Lin, Chung-Lun Kuo, Chia-Liang Yeh
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Patent number: 11948954Abstract: An electrode controls transmittance of a blocking layer over a photodiode of a pixel sensor (e.g., a photodiode of a small pixel detector) by changing oxidation of a metal material included in the blocking layer. By using the electrode to adjust transmittance of the blocking layer, pixel sensors for different uses and/or products may be produced using a single manufacturing process. As a result, power and processing resources are conserved that otherwise would have been expended in switching manufacturing processes. Additionally, production time is decreased (e.g., by eliminating downtime that would otherwise have been used to reconfigure fabrication machines.Type: GrantFiled: January 10, 2023Date of Patent: April 2, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Li-Wen Huang, Chung-Liang Cheng, Ping-Hao Lin, Kuo-Cheng Lee
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Patent number: 11946284Abstract: A door lock includes a latch driving device having a thumb turn that can be switched between a locking position not permitting movement of a latch to an unlatching position when an outer handle is pivoted and an unlocking position permitting movement of the latch to unlatching position when the outer handle is pivoted. The thumb turn includes an actuator controlling a switch to a conductive state or a non-conductive state. When the thumb turn is in the locking position, the switch is in the conductive state, and a lighting element controlled by the switch generates light transmitting through the first lid. When the thumb turn is in the unlocking position, the switch is in the non-conductive state, and the lighting element does not generate light. Thus, the locking or unlocking state of the door lock can be identified by sight.Type: GrantFiled: April 15, 2019Date of Patent: April 2, 2024Assignee: Oak Security Group, LLCInventors: Chung-Liang A Lin, Roger K. Russell, Mark A. Shumaker
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Publication number: 20240105751Abstract: A semiconductor device includes a substrate having a first device and a second device, where at least one of the first device and the second device includes a photo-sensitive element. The semiconductor device includes a first isolation feature surrounding the first device, where the first isolation feature has a first depth. The semiconductor device includes a second isolation feature surrounding the second device, where the second isolation feature has a second depth and where the first depth is greater than the second depth.Type: ApplicationFiled: February 24, 2023Publication date: March 28, 2024Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chung-Lei Chen, Anhao Cheng, Yen-Liang Lin
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Patent number: 11935804Abstract: In an embodiment, a device includes: an integrated circuit die; an encapsulant at least partially surrounding the integrated circuit die, the encapsulant including fillers having an average diameter; a through via extending through the encapsulant, the through via having a lower portion of a constant width and an upper portion of a continuously decreasing width, a thickness of the upper portion being greater than the average diameter of the fillers; and a redistribution structure including: a dielectric layer on the through via, the encapsulant, and the integrated circuit die; and a metallization pattern having a via portion extending through the dielectric layer and a line portion extending along the dielectric layer, the metallization pattern being electrically coupled to the through via and the integrated circuit die.Type: GrantFiled: April 10, 2023Date of Patent: March 19, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Tzu-Sung Huang, Ming Hung Tseng, Yen-Liang Lin, Hao-Yi Tsai, Chi-Ming Tsai, Chung-Shi Liu, Chih-Wei Lin, Ming-Che Ho
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Patent number: 11923433Abstract: A method for manufacturing a semiconductor device includes forming a first dielectric layer over a semiconductor fin. The method includes forming a second dielectric layer over the first dielectric layer. The method includes exposing a portion of the first dielectric layer. The method includes oxidizing a surface of the second dielectric layer while limiting oxidation on the exposed portion of the first dielectric layer.Type: GrantFiled: March 9, 2021Date of Patent: March 5, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Sheng-Liang Pan, Yungtzu Chen, Chung-Chieh Lee, Yung-Chang Hsu, Chia-Yang Hung, Po-Chuan Wang, Guan-Xuan Chen, Huan-Just Lin
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Patent number: 11925033Abstract: In some embodiments, the present disclosure relates to an integrated chip that includes a first and second transistors arranged over a substrate. The first transistor includes first channel structures extending between first and second source/drain regions. A first gate electrode is arranged between the first channel structures, and a first protection layer is arranged over a topmost one of the first channel structures. The second transistor includes second channel structures extending between the second source/drain region and a third source/drain region. A second gate electrode is arranged between the second channel structures, and a second protection layer is arranged over a topmost one of the second channel structures. The integrated chip further includes a first interconnect structure arranged between the substrate and the first and second channel structures, and a contact plug structure coupled to the second source/drain region and arranged above the first and second gate electrodes.Type: GrantFiled: March 30, 2021Date of Patent: March 5, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Kuan-Liang Liu, Sheng-Chau Chen, Chung-Liang Cheng, Chia-Shiung Tsai, Yeong-Jyh Lin, Pinyen Lin, Huang-Lin Chao
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Publication number: 20240071812Abstract: A method for forming a semiconductor device includes providing a semiconductor substrate, implanting n-type impurities into a device region in the semiconductor substrate to form an implanted region and an un-implanted region. The method also includes forming an epitaxial layer on the semiconductor substrate and forming a trench surrounding the device region in direct contact with the implanted region. The method further includes performing a selective lateral etch through the trench to remove the implanted region to form a cavity under the epitaxial layer. The un-implanted region is retained to form a pillar under the epitaxial layer. Next, an insulating material is disposed in the cavity and the trench. The method forms a single crystalline region that is separated from the semiconductor substrate by the insulating material except at the pillar.Type: ApplicationFiled: August 30, 2022Publication date: February 29, 2024Inventors: Chung-Lei Chen, Anhao Cheng, Meng-I Kang, Yen-Liang Lin
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Patent number: 11916022Abstract: Various embodiments of the present disclosure are directed towards a semiconductor processing system including an overlay (OVL) shift measurement device. The OVL shift measurement device is configured to determine an OVL shift between a first wafer and a second wafer, where the second wafer overlies the first wafer. A photolithography device is configured to perform one or more photolithography processes on the second wafer. A controller is configured to perform an alignment process on the photolithography device according to the determined OVL shift. The photolithography device performs the one or more photolithography processes based on the OVL shift.Type: GrantFiled: June 7, 2022Date of Patent: February 27, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yeong-Jyh Lin, Ching I Li, De-Yang Chiou, Sz-Fan Chen, Han-Jui Hu, Ching-Hung Wang, Ru-Liang Lee, Chung-Yi Yu
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Publication number: 20230335102Abstract: An active noise cancelling cord contains: a plug including a ground-wire conductor, a live-wire conductor, and a neutral-wire conductor; a socket including a protrusion in which a first receiving orifice, a second receiving orifice and a third receiving orifice are defined; and a noise reduction mode. The body is connected with a plug and a socket, and a shell is located between the plug and the socket. The conductive set includes a ground wire electrically connected with a ground-wire conductor and a first receiving orifice, a live wire electrically connected with a live-wire conductor and a second receiving orifice, a neutral wire electrically connected with a neutral-wire conductor and a third receiving orifice, a plug anti-noise wire electrically connected with a live-wire conductor, and the noise reduction mode, and a socket anti-noise wire electrically connected with the second receiving orifice and the noise reduction mode.Type: ApplicationFiled: April 19, 2022Publication date: October 19, 2023Inventor: Chung-Liang Lin
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Patent number: 11624208Abstract: A locking mechanism is provided for a portal closure that includes a first side, and a second side The portal closure including a latch movable into and out of engagement with a latch receiver and a latch driving device coupled to the latch for moving the latch into and out of engagement with the latch receiver The latch driving device includes a controllable lock member movable between a locked position where the latch is fixedly positioned in the latch receiver and an unlocked position where the latch is capable of being disengaged from the latch receiver and a second side latch driving device mover disposed on the second side of the portal closure. The locking mechanism includes a first side latch driving device mover disposed on the first side of the portal closures, and coupled to the latch driving device for moving the latch driving device to cause the latch to move into and out of engagement with the latch receiver. A signal generator is provided for generating a human detectable signal.Type: GrantFiled: June 24, 2020Date of Patent: April 11, 2023Assignee: Oak Security Group LLCInventors: Mark A. Shumaker, Roger K. Russell, Chung-Liang Lin
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Publication number: 20230039114Abstract: An embodiment of the present disclosure provides a power noise suppression circuit for machine equipment, which dynamically obtains a noise component in an input voltage provided by the power supply, generates a noise voltage accordingly, and compares the noise voltage with a feedback voltage to obtain a stable and low-noise power voltage, wherein the feedback voltage is generated by the power noise suppression circuit according to the power voltage. Therefore, the power noise suppression circuit of the embodiment of the present disclosure is particularly suitable for use in the machine equipment which is needed to be monitored and/or controlled precisely, such as a precision machining equipment or a semiconductor manufacturing equipment.Type: ApplicationFiled: August 3, 2022Publication date: February 9, 2023Inventor: CHUNG-LIANG LIN
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Publication number: 20210079688Abstract: A locking mechanism is provided for a portal closure that includes a first side, and a second side The portal closure including a latch movable into and out of engagement with a latch receiver and a latch driving device coupled to the latch for moving the latch into and out of engagement with the latch receiver The latch driving device includes a controllable lock member movable between a locked position where the latch is fixedly positioned in the latch receiver and an unlocked position where the latch is capable of being disengaged from the latch receiver and a second side latch driving device mover disposed on the second side of the portal closure. The locking mechanism includes a first side latch driving device mover disposed on the first side of the portal closures, and coupled to the latch driving device for moving the latch driving device to cause the latch to move into and out of engagement with the latch receiver. A signal generator is provided for generating a human detectable signal.Type: ApplicationFiled: June 24, 2020Publication date: March 18, 2021Applicant: Oak Security Group LLCInventors: Mark A. Shumaker, Roger K. Russell, Chung-Liang Lin
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Publication number: 20210040770Abstract: An anti-torsion door lock includes a lock body having an outer chassis. An outer locking plate includes a threaded hole in threading connection with the outer chassis. The outer locking plate further includes two installation holes and at least one coupling hole which are disposed around the threaded hole. Two installation pegs are coupled with the two installation holes and are coupled to a door, preventing rotation of the outer locking plate relative to the door. An anti-torsion member is mounted around the outer chassis and includes at least one lug engaged with the at least one coupling hole of the outer locking plate, such that the anti-torsion member is not pivotable relative to the outer locking plate. The anti-torsion member is non-rotatably mounted to the outer chassis, preventing the lock body from pivoting relative to the door.Type: ApplicationFiled: September 11, 2019Publication date: February 11, 2021Inventor: Chung-Liang Lin
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Publication number: 20200270900Abstract: A door lock includes a latch driving device having a thumb turn that can be switched between a locking position not permitting movement of a latch to an unlatching position when an outer handle is pivoted and an unlocking position permitting movement of the latch to unlatching position when the outer handle is pivoted. The thumb turn includes an actuator controlling a switch to a conductive state or a non-conductive state. When the thumb turn is in the locking position, the switch is in the conductive state, and a lighting element controlled by the switch generates light transmitting through the first lid. When the thumb turn is in the unlocking position, the switch is in the non-conductive state, and the lighting element does not generate light. Thus, the locking or unlocking state of the door lock can be identified by sight.Type: ApplicationFiled: April 15, 2019Publication date: August 27, 2020Inventor: Chung-Liang Lin
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Publication number: 20170346390Abstract: An electrical noise elimination structure contains: a casing in which a plurality of terminals, multiple wave filtration modules, a control unit, an AC-DC power processing circuit, a microprocessor, an ADC sampling circuit, and a potential generation circuit are arranged. The plurality of terminals connect the multiple wave filtration modules to the control unit, and the control unit couples with the AC-DC power processing circuit, the AC-DC power processing circuit joins the microprocessor to the control unit, the potential generation circuit connects the ADC sampling circuit to the microprocessor, thus avoiding distortion of signal transmission and eliminating the electrical noises among the plurality of terminals, the multiple wave filtration modules, the control unit, the AC-DC power processing circuit, the microprocessor, the ADC sampling circuit, and the potential generation circuit.Type: ApplicationFiled: May 25, 2016Publication date: November 30, 2017Inventor: Chung Liang LIN
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Patent number: 9140032Abstract: A door lock (3) includes a latch device (30) and an inner operational device (20) mounted to a first side (1A) of a door (1) and an outer operational device (16) mounted to a second side (1B) of the door (1). The inner and outer operational devices (20, 16) can be operated to retract a latch (38) of a latch device (30) from an extended, latching position to a retracted, unlatching position. A tooth (223) on an actuator (219) of the outer operational device (16) breaks if a large force is applied to a handle (197). A spindle (191) pivots freely without moving the latch (38), preventing damage to components of the outer operational device (16) and the latch device (30). A base (811) of the latch device (30) can be comprised of first, second, and third plates (813, 847, 883) to allow sheet metal processing without sacrificing structural strength.Type: GrantFiled: October 17, 2012Date of Patent: September 22, 2015Assignee: I-Tek Metal Mfg. Co., Ltd.Inventor: Chung-Liang Lin
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Publication number: 20140102155Abstract: A door lock (3) includes a latch device (30) and an inner operational device (20) mounted to a first side (1A) of a door (1) and an outer operational device (16) mounted to a second side (1B) of the door (1). The inner and outer operational devices (20, 16) can be operated to retract a latch (38) of a latch device (30) from an extended, latching position to a retracted, unlatching position. A tooth (223) on an actuator (219) of the outer operational device (16) breaks if a large force is applied to a handle (197). A spindle (191) pivots freely without moving the latch (38), preventing damage to components of the outer operational device (16) and the latch device (30). A base (811) of the latch device (30) can be comprised of first, second, and third plates (813, 847, 883) to allow sheet metal processing without sacrificing structural strength.Type: ApplicationFiled: October 17, 2012Publication date: April 17, 2014Inventor: Chung-Liang Lin
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Patent number: 8355010Abstract: A load cell touch control device includes a touch panel, a plurality of load cells and a control unit. The touch panel receives a stress applied thereon. The load cells are implemented in the touch panel to detect respective components of the stress received by the touch panel. The control unit is connected to the load cells in order to receive magnitudes of the respective components to thereby calculate a magnitude, position and motion trace of the stress on the touch panel based on the respective components detected by the load cells in the touch panel.Type: GrantFiled: December 15, 2009Date of Patent: January 15, 2013Assignee: Geee Creations, Inc.Inventors: Chung-Liang Lin, Chang-Chun Lung, Pi-Lieh Chang, Tsung-Hsin Liu, Ta-Jen Lin, Ko-Po Lin, Cheng-Hao Yu
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Patent number: 8266934Abstract: A keyed cylinder assembly (10) includes a keyed cylinder (3) mounted in a door lock (1) and including a hollow body (31) and a cylinder plug (32) rotatably received in the hollow body (31). The cylinder plug (32) includes an annular groove (327) formed in an outer periphery (320) thereof. The keyed cylinder (3) further includes an arresting member (37) received in the hollow body (31) and having an inner end (371) received in the annular groove (327). The keyed cylinder assembly further includes a first key (4) insertable into a keyway (323) of the cylinder plug (32) to operate both a latch bolt (12) and a deadbolt (13) of the door lock (1). The keyed cylinder assembly (10) further includes a second key (5) insertable into the keyway (323) of the cylinder plug (32) to operate the latch bolt (12) only.Type: GrantFiled: June 2, 2009Date of Patent: September 18, 2012Assignee: I-Tek Metal Mfg. Co., Ltd.Inventor: Chung-Liang Lin