Patents by Inventor Chung-Ming Tan

Chung-Ming Tan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8647552
    Abstract: The present invention discloses a method for enhancing hardness of a nanoimprint mold comprising following steps of: providing a male mold, composed of a first material, for imprinting a female mold and producing a nano structural pattern on the female mold, and the female mold composed of a second material, wherein the hardness of the first material is higher than the hardness of the second material; applying a nano-indentation technique to the female mold onto the female mold by a nano-indentation apparatus having a diamond array probe so as to enhance the surface hardness of the female mold; and impressing a substrate by the female mold with the nano structural pattern having the enhanced surface.
    Type: Grant
    Filed: October 24, 2011
    Date of Patent: February 11, 2014
    Assignee: National Chung Cheng University
    Inventors: Yeau-Ren Jeng, Chung-Ming Tan
  • Patent number: 8434221
    Abstract: The present invention discloses a method for generating nano patterns upon material surfaces. The method for generating nano patterns upon material surfaces comprises the following steps: providing a thin film capable of controlling lattice directions, applying a nanoindentation action to the thin film to generate an indentation at a specific position on the thin film. At least one hillock is then generated in a specific direction to generate a pattern and to be applied to a data storage system.
    Type: Grant
    Filed: April 28, 2009
    Date of Patent: May 7, 2013
    Assignee: National Chung Cheng University
    Inventors: Yeau-Ren Jeng, Chung-Ming Tan
  • Publication number: 20120040090
    Abstract: The present invention discloses a method for enhancing hardness of a nanoimprint mold comprising following steps of: providing a male mold, composed of a first material, for imprinting a female mold and producing a nano structural pattern on the female mold, and the female mold composed of a second material, wherein the hardness of the first material is higher than the hardness of the second material; applying a nano-indentation technique to the female mold onto the female mold by a nano-indentation apparatus having a diamond array probe so as to enhance the surface hardness of the female mold; and impressing a substrate by the female mold with the nano structural pattern having the enhanced surface.
    Type: Application
    Filed: October 24, 2011
    Publication date: February 16, 2012
    Applicant: NATIONAL CHUNG CHENG UNIVERSITY
    Inventors: YEAU-REN JENG, CHUNG-MING TAN
  • Publication number: 20090285926
    Abstract: The present invention discloses a hardness enhancing apparatus for use in a nanoimprint mold, comprising a female mold, a male mold and a hardness enhancing portion. The male mold composed of a first material is used to imprint a female mold so as to produce a nano structural pattern on the female mold. The female mold is composed of a second material, and the hardness of the first material is higher than the hardness of the second material. The hardness enhancing portion that utilizes a nano-indentation apparatus above the female mold applies the nano-indentation technique to the female mold in order to enhance the surface hardness of the second material.
    Type: Application
    Filed: April 28, 2009
    Publication date: November 19, 2009
    Applicant: NATIONAL CHUNG CHENG UNIVERSITY
    Inventors: Yeau-Ren Jeng, Chung-Ming Tan
  • Publication number: 20090272172
    Abstract: The present invention discloses a method for generating nano patterns upon material surfaces. The method for generating nano patterns upon material surfaces comprises the following steps: providing a thin film capable of controlling lattice directions, applying a nanoindentation action to the thin film to generate an indentation at a specific position on the thin film. At least one hillock is then generated in a specific direction to generate a pattern and to be applied to a data storage system.
    Type: Application
    Filed: April 28, 2009
    Publication date: November 5, 2009
    Applicant: National Chung Cheng University
    Inventors: Yeau-Ren Jeng, Chung-Ming Tan