Patents by Inventor Chung Seon CHOI

Chung Seon CHOI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Blank substrates for extreme ultra violet photo masks and methods of fabricating an extreme ultra violet photo mask using the same
    Patent number: 8673521
    Abstract: Blank substrates for an extreme ultraviolet (EUV) photo mask are provided. The blank substrate includes a substrate, a reflection layer on the substrate, an absorption layer on the reflection layer opposite to the substrate, and a critical dimension (CD) compensation layer on the absorption layer opposite to the reflection layer. Methods of forming an extreme ultraviolet (EUV) photo mask using the blank substrate are also provided.
    Type: Grant
    Filed: April 26, 2012
    Date of Patent: March 18, 2014
    Assignee: SK Hynix Inc.
    Inventor: Chung Seon Choi
  • BLANK SUBSTRATES FOR EXTREME ULTRA VIOLET PHOTO MASKS AND METHODS OF FABRICATING AN EXTREME ULTRA VIOLET PHOTO MASK USING THE SAME
    Publication number: 20120276475
    Abstract: Blank substrates for an extreme ultraviolet (EUV) photo mask are provided. The blank substrate includes a substrate, a reflection layer on the substrate, an absorption layer on the reflection layer opposite to the substrate, and a critical dimension (CD) compensation layer on the absorption layer opposite to the reflection layer. Methods of forming an extreme ultraviolet (EUV) photo mask using the blank substrate are also provided.
    Type: Application
    Filed: April 26, 2012
    Publication date: November 1, 2012
    Applicant: SK HYNIX INC.
    Inventor: Chung Seon CHOI