Abstract: Embodiments of the present disclosure relate to a system, a software application, and methods of digital lithography for semiconductor packaging. The method includes comparing positions of vias and via locations, generating position data based on the comparing the positions of vias and the via locations, providing the position data of the vias to a digital lithography device, updating a redistributed metal layer (RDL) mask pattern according to the position data such that RDL locations correspond to the positions of the vias, and projecting the RDL mask pattern with the digital lithography device.

Abstract: A multilayer capacitor includes a capacitor body including dielectric layers and first and second internal electrodes, the capacitor body having first to sixth surfaces, the first internal electrode being exposed through the third, fifth, and sixth surfaces, and the second internal electrode being exposed through the fourth, fifth, and sixth surfaces, a first side portion and a second side portion, respectively disposed on the fifth surface and the sixth surface of the capacitor body, and a first external electrode and a second external electrode, respectively connected to the third surface and the fourth surface of the capacitor body to be respectively connected to the first internal electrode and the second internal electrode. The first and second side portions include an acicular second phase including a glass including aluminum (Al) and silicon (Si), manganese (Mn), and phosphorus (P).

Abstract: A method for recovering ashing rate in a plasma processing chamber includes positioning a substrate in a processing volume of a processing chamber, wherein the substrate has a silicon chloride residue formed thereon. The method further includes evaporating the silicon chloride residue from the substrate. The method further includes depositing the evaporated silicon chloride on one or more interior surfaces in the processing volume. The method further includes exposing the deposited silicon chloride to an oxidizing environment to convert the deposited silicon chloride to a silicon oxide passivation layer. The oxidizing environment can comprise an oxygen-containing plasma, oxygen radicals, or a combination thereof.

Abstract: Systems and methods disclosed are generally related to masklessly developing connections between a chip-group and a design connection point on a substrate. In placement of the chip-group on the substrate, according to certain embodiments the chip-group may be dispositioned relative to an expected position per a substrate layout design, causing a connection misalignment with the design connection point. According to certain embodiments, a machine learning (ML) model is trained on historical and simulated pixel models of chip-group connections and design connection points. Upon determining the chip-group misalignment by a metrology measurement, the trained ML model determines a pixel model to connect the misaligned chip-group, and causes the pixel model to be exposed to a substrate with a digital lithography tool, thereby connecting the dispositioned chip-group to the design connection point.

Abstract: In embodiments of a digital lithography system, physical design data prepared at a data prep server in a hierarchical data structure. A leaf node comprises a repeater nod, comprising a bitmap image and a plurality of locations at which the bitmap appears in a physical design. At an EYE server, a repeater node bitmap is adjusted based upon, for example, spatial light modulator rotational adjustment and substrate distortion. The adjusted repeater node and the plurality of locations in which the adjusted repeater appears is compared to the repeater of the data prep server and its plurality of locations. In further embodiments, a rasterizer generates a checksum of bitmap to be printed to a substrate, from the EYE server bitmap. The checksum is compared to a checksum of the EYE server bitmap.

Abstract: A verification device for verifying a design file for digital lithography comprises a memory and a controller. The memory comprises the design file. The controller is configured to access the design file and apply one or more compliance rules to the design file to determine compliance of the design file. The compliance rules comprises at least one of detecting non-orthogonal edges within the design file, detecting non-compliant overlapping structures within the design file, and detecting a non-compliant interaction between a reference layer of the design file and a target layer of the design file. The controller is further configured to verify the design file in response to a comparison of a number of non-orthogonal edges, non-compliant overlapping structures and non-compliant interactions to a threshold.

Abstract: A swappable device includes a first side cover, a lever, a sliding plate, a functional module interface card and a second side cover. When the lever is rotated to move a guide pillar of the lever to a lower end point of an arc-shaped guide groove of the first side cover, a guide pillar of the sliding plate moves toward a rear end point of a linear guide groove of the lever and a lower end point of a linear guide groove of the first side cover. The sliding plate is actuated to drive the functional module interface card to move toward a lower edge of the first side cover relative to the first side cover until a plurality of connectors of the functional module interface card are at the farthest position relative to an upper edge of the first side cover.

Abstract: Systems and methods disclosed are generally related to masklessly developing connections between a chip-group and a design connection point on a substrate. In placement of the chip-group on the substrate, according to certain embodiments the chip-group may be dispositioned relative to an expected position per a substrate layout design, causing a connection misalignment with the design connection point. According to certain embodiments, a machine learning (ML) model is trained on historical and simulated pixel models of chip-group connections and design connection points. Upon determining the chip-group misalignment by a metrology measurement, the trained ML model determines a pixel model to connect the misaligned chip-group, and causes the pixel model to be exposed to a substrate with a digital lithography tool, thereby connecting the dispositioned chip-group to the design connection point.

Abstract: In embodiments of a digital lithography system, physical design data prepared at a data prep server in a hierarchical data structure. A leaf node comprises a repeater nod, comprising a bitmap image and a plurality of locations at which the bitmap appears in a physical design. At an EYE server, a repeater node bitmap is adjusted based upon, for example, spatial light modulator rotational adjustment and substrate distortion. The adjusted repeater node and the plurality of locations in which the adjusted repeater appears is compared to the repeater of the data prep server and its plurality of locations. In further embodiments, a rasterizer generates a checksum of bitmap to be printed to a substrate, from the EYE server bitmap. The checksum is compared to a checksum of the EYE server bitmap.

Abstract: A verification device for verifying a design file for digital lithography comprises a memory and a controller. The memory comprises the design file. The controller is configured to access the design file and apply one or more compliance rules to the design file to determine compliance of the design file. The compliance rules comprises at least one of detecting non-orthogonal edges within the design file, detecting non-compliant overlapping structures within the design file, and detecting a non-compliant interaction between a reference layer of the design file and a target layer of the design file. The controller is further configured to verify the design file in response to a comparison of a number of non-orthogonal edges, non-compliant overlapping structures and non-compliant interactions to a threshold.

Abstract: A digital pattern generation system comprises a memory and a controller. The controller is coupled the memory and is configured to remove redundant cells from a digital pattern file, generate a first updated digital pattern file and compare the first updated digital pattern file with the digital pattern file. Further a number of vertexes of a first arc of the first updated digital pattern file is reduced to generate a second updated digital pattern file. Additionally, a first cell of the second updated digital pattern file is replaced with an alternative version of the first cell to generate a third updated digital pattern file. Further, one or more polygons within the third updated digital pattern file is converted to one or more quad polygons to generate an optimized digital pattern file.

Abstract: Provided is a heartbeat detection signal processing method of an ultrasonic Doppler fetus monitoring device that transmits an ultrasonic wave to the abdomen of a pregnant woman and detects a fetal heartbeat rate by receiving a Doppler variation signal generated according to the fetal heartbeat.

Abstract: An electric power steering system includes: a housing defining a receiving space therein; a worm shaft disposed in the receiving space to be engaged with a worm wheel; a tilt plug coupled to an inner surface of the housing to be fastened to a predetermined position, and coupled to the worm shaft which is inserted into the receiving space to support the worm shaft; and an elastic supporter which is installed to the housing to elastically support the tilt plug toward the worm wheel. The tilt plug is provided with a coupling protrusion which is protruded from an end portion of the tilt plug in a center axis of the tilt plug and slides into an inner surface of the housing, and the inner surface of the housing is provided with a coupling indentation into which the coupling protrusion slides to restrict rotation of the tilt plug.

Abstract: A rack bar support device supports a rack bar of a steering device of a vehicle toward a pinion shaft, and includes a rack bearing which is disposed opposite the pinion to contact the rack bar and a biasing assembly providing a force of pushing the rack bearing along a biasing axis toward the rack bar to urge the rack bearing to push the rack bar is engaged with the pinion shaft. The biasing assembly includes an adjustment plug, an adjustment assembly and a support plate assembly. The support plate assembly includes a support plate which is movably disposed between the adjustment member and the rack bearing in a state of being supported by the adjustment member, and a gap is formed between the support plate and the rack bearing.

Abstract: A method for preparing composite sulfur-modified powdered activated carbon includes the following steps: providing a powdered activated carbon; proceeding a drying step on the powdered activated carbon; proceeding a liquid-phase sulfur modification step on the dried powdered activated carbon; proceeding a granulation step, so as to obtain a granular powdered activated carbon from the sulfur-modified powdered activated carbon; and proceeding a vapor-phase elemental sulfur heating step on the granular powdered activated carbon, so as to form the composite sulfur-modified powdered activated carbon.

Abstract: A respiratory waveform recognition method comprises: (a) detecting a respiratory airflow in a respiratory cycle; (b) measuring an amplitude of the respiratory airflow and a duration of the respiratory cycle; (c) using a plurality of sampling points to determine an inspiration waveform and an expiration waveform according to the amplitude and the duration; (d) normalizing the amplitude and the duration of one of the inspiration waveform and the expiration waveform, so as to establish a normalized waveform; and (e) accumulating the differences between the normalized waveform and a reference waveform to calculate a flow index useful for the identification of a normal respiration state and an abnormal respiration state. A curve, such as a weighted curve or a standard waveform, is used for fitting of the inspiration waveform or the expiration waveform to calculate the differences, and the differences are accumulated to identify the normal respiration state and the abnormal respiration state.

Abstract: Chemical bath deposition (CBD) apparatuses and fabrication methods for compound thin films are presented. A chemical bath deposition apparatus includes a chemical bath reaction container, a substrate chuck for fixing a substrate arranged face-down toward the bottom of the chemical bath reaction container, multiple solution containers connecting to a reaction solution mixer and further connection to the chemical bath reaction container, and a temperature control system including a first heater controlling the temperature of the chemical bath reaction container, a second heater controlling the temperature of the substrate chuck, and a third heater controlling the temperature of the multiple solution containers.

Abstract: Disclosed herein is a method for obtaining a value of at least one vasodilation parameter representing the cutaneous local thermal hyperemia response of a subject. The temperature of a sampling site is raised from a first temperature to a second temperature and maintained for an initial heating period, and an initial maximum red blood cell flux (RBCF) of the sampling site and a mean arterial pressure of the subject is obtained. An initial maximum cutaneous vascular conductance (CVC1,max) is calculated by dividing the initial maximum RBCF by the mean arterial pressure. The CVC1, max or at least one other parameter derived therefrom is used as the vasodilation parameter.

Abstract: A method for preparing composite sulfur-modified powdered activated carbon includes the following steps: providing a powdered activated carbon; proceeding a drying step on the powdered activated carbon; proceeding a liquid-phase sulfur modification step on the dried powdered activated carbon; proceeding a granulation step, so as to obtain a granular powdered activated carbon from the sulfur-modified powdered activated carbon; and proceeding a vapor-phase elemental sulfur heating step on the granular powdered activated carbon, so as to form the composite sulfur-modified powdered activated carbon.

Abstract: A rack bar support device supports a rack bar of a steering device of a vehicle toward a pinion shaft, and includes a rack bearing which is disposed opposite the pinion to contact the rack bar and a biasing assembly providing a force of pushing the rack bearing along a biasing axis toward the rack bar to urge the rack bearing to push the rack bar is engaged with the pinion shaft. The biasing assembly includes an adjustment plug, an adjustment assembly and a support plate assembly. The support plate assembly includes a support plate which is movably disposed between the adjustment member and the rack bearing in a state of being supported by the adjustment member, and a gap is formed between the support plate and the rack bearing.