Patents by Inventor Chung-Sic Choi

Chung-Sic Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240136208
    Abstract: A light-emitting element transfer system includes raw film cutting device for forming a transfer member by cutting a raw film, a stretching device for stretching a transfer film with a plurality of light-emitting elements disposed thereon, a circuit board support member for supporting a circuit board and transport head for adsorbing the transfer member and transferring the light-emitting elements on the transfer film onto the circuit board by using the adsorbed transfer member.
    Type: Application
    Filed: July 20, 2023
    Publication date: April 25, 2024
    Inventors: Jeong Won HAN, Chung Sic CHOI, Won Hee OH, Han Chun RYU, Jae Woo LEE
  • Publication number: 20230386878
    Abstract: An apparatus for aligning dipoles is provided. The apparatus includes: an electric field forming unit including a stage and a probe unit, the probe unit being configured to form an electric field on the stage; an inkjet printing device including an inkjet head, the inkjet head being configured to spray ink including a solvent and dipoles dispersed in the solvent onto the stage; a light irradiation device configured to irradiate light onto the stage; and a temperature control device including a temperature control unit, the temperature control unit being configured to control a temperature of the solvent sprayed on the stage.
    Type: Application
    Filed: August 11, 2023
    Publication date: November 30, 2023
    Inventors: Won Ho LEE, Buem Joon KIM, Jong Hyuk KANG, Hyun Deok IM, Chung Sic CHOI
  • Patent number: 11728196
    Abstract: An apparatus for aligning dipoles is provided. The apparatus includes: an electric field forming unit including a stage and a probe unit, the probe unit being configured to form an electric field on the stage; an inkjet printing device including an inkjet head, the inkjet head being configured to spray ink including a solvent and dipoles dispersed in the solvent onto the stage; a light irradiation device configured to irradiate light onto the stage; and a temperature control device including a temperature control unit, the temperature control unit being configured to control a temperature of the solvent sprayed on the stage.
    Type: Grant
    Filed: March 3, 2021
    Date of Patent: August 15, 2023
    Assignee: Samsung Display Co., Ltd.
    Inventors: Won Ho Lee, Buem Joon Kim, Jong Hyuk Kang, Hyun Deok Im, Chung Sic Choi
  • Publication number: 20220165928
    Abstract: An apparatus for manufacturing a display device includes a stage, a first electric field applying module including first probe pins and disposed on a first side of the stage, a light irradiation module including light-emitting elements and disposed on the stage, and a first voltage output module that outputs an emission driving signal that drives the light-emitting elements, outputs a first alignment signal to one of the first probe pins, and outputs a second alignment signal to another one of the first probe pins.
    Type: Application
    Filed: November 17, 2021
    Publication date: May 26, 2022
    Applicant: Samsung Display Co., LTD.
    Inventors: Jin Won BAEK, Lae Ho KIM, Sang Woong BAEK, Young Geun CHO, Chung Sic CHOI
  • Publication number: 20220005719
    Abstract: An apparatus for aligning dipoles is provided. The apparatus includes: an electric field forming unit including a stage and a probe unit, the probe unit being configured to form an electric field on the stage; an inkjet printing device including an inkjet head, the inkjet head being configured to spray ink including a solvent and dipoles dispersed in the solvent onto the stage; a light irradiation device configured to irradiate light onto the stage; and a temperature control device including a temperature control unit, the temperature control unit being configured to control a temperature of the solvent sprayed on the stage.
    Type: Application
    Filed: March 3, 2021
    Publication date: January 6, 2022
    Inventors: Won Ho LEE, Buem Joon KIM, Jong Hyuk KANG, Hyun Deok IM, Chung Sic CHOI
  • Patent number: 7775222
    Abstract: Provided are a single substrate cleaning apparatus, and a method for cleaning the backside of a substrate, where a substrate reversing device for cleaning the backside of a substrate is installed inside a processing chamber.
    Type: Grant
    Filed: October 10, 2008
    Date of Patent: August 17, 2010
    Assignee: Semes Co., Ltd.
    Inventor: Chung-Sic Choi
  • Publication number: 20090095328
    Abstract: Provided are a single substrate cleaning apparatus, and a method for cleaning the backside of a substrate, where a substrate reversing device for cleaning the backside of a substrate is installed inside a processing chamber. According to the above the apparatus and the method, costs may be reduced through simplifying equipment for cleaning the backside of a substrate, processing steps may be simplified, and contamination of a substrate from particles may be minimized.
    Type: Application
    Filed: October 10, 2008
    Publication date: April 16, 2009
    Inventor: Chung-Sic Choi
  • Publication number: 20090095325
    Abstract: Provided are a substrate processing apparatus and a method for cleaning the same. In the substrate processing apparatus, a substrate supporting member includes a spin head on which a substrate is mounted, a rotary joint, and a supply pipe for supplying solution. The rotary joint receives a supply of solution from the supply pipe and supplies the solution to the spin head. The spin head has at least one spray hole formed for spraying the solution, and sprays the solution axially while spinning. Accordingly, the substrate supporting member can provide solution to the inner walls of the processing container, to raise cleaning efficiency of the processing container and increase manufacturing yield.
    Type: Application
    Filed: October 10, 2008
    Publication date: April 16, 2009
    Inventors: Chung-Sic Choi, Rae-Taek Oh
  • Publication number: 20090056765
    Abstract: Provided is a single type substrate treating apparatus and a cleaning method the substrate treating apparatus. A cleaning process is periodically performed on a substrate support member after a series of repeated substrate treating processes is performed to remove contaminants remaining on the substrate support member and minimize thermal deformation of the substrate support member due to a high temperature chemical solution.
    Type: Application
    Filed: August 28, 2008
    Publication date: March 5, 2009
    Applicant: SEMES CO., LTD.
    Inventors: Chung-Sic CHOI, Yong-Ju JANG