Patents by Inventor Chung-Tang Lin

Chung-Tang Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9548219
    Abstract: A carrier structure is provided, which includes: a metal oxide plate having opposite first and second surfaces and a plurality of through holes penetrating the first and second surfaces; a plurality of conductive portions formed in the through holes, respectively; and a plurality of conductive pads formed on the first surface of the metal oxide plate, wherein each of the conductive pads is correspondingly positioned on and in contact with a plurality of the conductive portions so as to be electrically connected to the plurality of the conductive portions. By replacing a conventional silicon interposer with the metal oxide plate, the present invention eliminates the need to form through silicon vias as required in the prior art and therefore simplifies the fabrication process.
    Type: Grant
    Filed: December 29, 2014
    Date of Patent: January 17, 2017
    Assignee: Siliconware Precision Industries Co., Ltd.
    Inventors: Yan-Heng Chen, Chung-Tang Lin, Chieh-Yuan Chi
  • Publication number: 20150325508
    Abstract: A carrier structure is provided, which includes: a metal oxide plate having opposite first and second surfaces and a plurality of through holes penetrating the first and second surfaces; a plurality of conductive portions formed in the through holes, respectively; and a plurality of conductive pads formed on the first surface of the metal oxide plate, wherein each of the conductive pads is correspondingly positioned on and in contact with a plurality of the conductive portions so as to be electrically connected to the plurality of the conductive portions. By replacing a conventional silicon interposer with the metal oxide plate, the present invention eliminates the need to form through silicon vias as required in the prior art and therefore simplifies the fabrication process.
    Type: Application
    Filed: December 29, 2014
    Publication date: November 12, 2015
    Inventors: Yan-Heng Chen, Chung-Tang Lin, Chieh-Yuan Chi
  • Publication number: 20120129315
    Abstract: A method for fabricating a semiconductor package includes the steps of: providing an alignment board having a plurality of openings and a plurality of alignment marks corresponding to the openings, respectively; disposing a plurality of chips on the alignment board at positions corresponding to the openings according to the alignment marks; pressing the alignment board with a carrier board having a soft layer disposed on one surface thereof so as to embed the chips in the soft layer of the carrier board; and removing the alignment board. As such, the positions of the chips are accurately positioned according to the alignment marks on the alignment board.
    Type: Application
    Filed: January 12, 2011
    Publication date: May 24, 2012
    Applicant: SILICONWARE PRECISION INDUSTRIES CO., LTD.
    Inventors: Yeh-Chang Hu, Chung-Tang Lin, Hui-Min Huang, Yih-Jenn Jiang, Shih-Kuang Chiu