Abstract: In certain aspects, a clamp includes first and second transistors coupled in series between a power bus and a ground. The clamp also includes a resistive voltage divider configured to bias a gate of the first transistor and a gate of the second transistor based on a supply voltage on the power bus. The clamp further includes a capacitive voltage divider configured to turn on the first and second transistors in response to a voltage transient on the power bus exceeding a trigger threshold voltage.

Abstract: In certain aspects, a clamp includes first and second transistors coupled in series between a power bus and a ground. The clamp also includes a resistive voltage divider configured to bias a gate of the first transistor and a gate of the second transistor based on a supply voltage on the power bus. The clamp further includes a capacitive voltage divider configured to turn on the first and second transistors in response to a voltage transient on the power bus exceeding a trigger threshold voltage.

Abstract: An electrostatic discharge (ESD) protection device is provided. The ESD protection device includes a source region and a drain region. The source region is to be coupled to a low-level voltage. The drain region is disposed apart from the source region and includes a first P-type heavily doped region and at least one first N-type heavily doped region. The first P-type heavily doped region is configured to couple to a pad, and the first N-type heavily doped region is adjacent to the first P-type heavily doped region and floated. An electrostatic discharge protection apparatus is also disclosed herein.

Abstract: An ESD protection device is provided, which includes a P-type doped region, an N-type doped region, a first P+ doped region, a first N+ doped region, a second N+ doped region and a third N+ doped region. The N-type doped region is located in the P-type doped region. The first P+ doped region connected to a pad is located in the N-type doped region. A part of the first N+ doped region is located in the N-type doped region and the residue part thereof is located in the P-type doped region. The second and the third N+ doped regions are located in the P-type doped region and outside the N-type doped region, and are respectively electrically connected to a first power rail and a second power rail. In addition, the second N+ doped region is located between the first and the third N+ doped regions.

Abstract: An electrostatic discharge (ESD) protection circuit is provided. The ESD protection circuit includes a first rail, a second rail, a first transistor and a resistance unit. The drain of the first transistor is electrically coupled to the first rail, and the source and gate of the first transistor are electrically coupled to the second rail. The resistance unit is electrically coupled between a body of the first transistor and the second rail. When ESD occurs, the resistance unit provides a resistance between the body of the first transistor and the second rail. An ESD protection device is also provided.

Abstract: An electrostatic discharge (ESD) protection device is provided. The ESD protection device includes a source region and a drain region. The source region is to be coupled to a low-level voltage. The drain region is disposed apart from the source region and includes a first P-type heavily doped region and at least one first N-type heavily doped region. The first P-type heavily doped region is configured to couple to a pad, and the first N-type heavily doped region is adjacent to the first P-type heavily doped region and floated. An electrostatic discharge protection apparatus is also disclosed herein.

Abstract: An ESD protection device is provided, which includes a P-type doped region, an N-type doped region, a first P+ doped region, a first N+ doped region, a second N+ doped region and a third N+ doped region. The N-type doped region is located in the P-type doped region. The first P+ doped region connected to a pad is located in the N-type doped region. A part of the first N+ doped region is located in the N-type doped region and the residue part thereof is located in the P-type doped region. The second and the third N+ doped regions are located in the P-type doped region and outside the N-type doped region, and are respectively electrically connected to a first power rail and a second power rail. In addition, the second N+ doped region is located between the first and the third N+ doped regions.

Abstract: An electrostatic discharge (ESD) protection circuit is provided. The ESD protection circuit includes a first rail, a second rail, a first transistor and a resistance unit. The drain of the first transistor is electrically coupled to the first rail, and the source and gate of the first transistor are electrically coupled to the second rail. The resistance unit is electrically coupled between a body of the first transistor and the second rail. When ESD occurs, the resistance unit provides a resistance between the body of the first transistor and the second rail. An ESD protection device is also provided.

Abstract: An electrostatic discharge protection circuit comprises a pad, a first transistor, a second transistor, and a diode. Wherein, the first transistor comprises the gate, a first source-drain, and a second source-drain. The first source-drain of the first transistor is electrically coupled to the pad, and the second source-drain of the first transistor is electrically coupled to a first power line. The first source-drain of the second transistor is electrically coupled to the gate of the first transistor, the second source-drain of the second transistor is electrically coupled to the first power line, and the gate of the second transistor is electrically coupled to a second power line. The diode includes a first terminal coupled to the gate of the first transistor, and a second terminal coupled to the pad. In addition, the diode and the first transistor together form a silicon controlled rectifier (SCR).

Abstract: An electrostatic discharge protection circuit comprises a pad, a first transistor, a second transistor, and a diode. Wherein, the first transistor comprises the gate, a first source-drain, and a second source-drain. The first source-drain of the first transistor is electrically coupled to the pad, and the second source-drain of the first transistor is electrically coupled to a first power line. The first source-drain of the second transistor is electrically coupled to the gate of the first transistor, the second source-drain of the second transistor is electrically coupled to the first power line, and the gate of the second transistor is electrically coupled to a second power line. The diode includes a first terminal coupled to the gate of the first transistor, and a second terminal coupled to the pad. In addition, the diode and the first transistor together form a silicon controlled rectifier (SCR).