Patents by Inventor Chung-Wei LI

Chung-Wei LI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11951638
    Abstract: A method for determining a standard depth value of a marker includes obtaining a maximum depth value of the marker. A reference depth value of the marker is obtained based on a depth image of the marker, and a Z-axis coordinate value of the marker is obtained based on a color image of the marker. When the reference depth value and the Z-axis coordinate value are both less than the maximum depth value, and a difference between the reference depth value and the Z-axis coordinate value is not greater than 0, the depth reference value is set as the standard depth value of the marker; and when the difference is greater than 0, the Z-axis coordinate value is set as the standard depth value of the marker.
    Type: Grant
    Filed: December 29, 2020
    Date of Patent: April 9, 2024
    Assignee: Chiun Mai Communication Systems, Inc.
    Inventors: Tung-Chun Hsieh, Chung-Wei Wu, Chih-Wei Li, Chia-Yi Lin
  • Publication number: 20240084455
    Abstract: Some implementations described herein include systems and techniques for fabricating a wafer-on-wafer product using a filled lateral gap between beveled regions of wafers included in a stacked-wafer assembly and along a perimeter region of the stacked-wafer assembly. The systems and techniques include a deposition tool having an electrode with a protrusion that enhances an electromagnetic field along the perimeter region of the stacked-wafer assembly during a deposition operation performed by the deposition tool. Relative to an electromagnetic field generated by a deposition tool not including the electrode with the protrusion, the enhanced electromagnetic field improves the deposition operation so that a supporting fill material may be sufficiently deposited.
    Type: Application
    Filed: February 8, 2023
    Publication date: March 14, 2024
    Inventors: Che Wei YANG, Chih Cheng SHIH, Kuo Liang LU, Yu JIANG, Sheng-Chan LI, Kuo-Ming WU, Sheng-Chau CHEN, Chung-Yi YU, Cheng-Yuan TSAI
  • Patent number: 9885595
    Abstract: The present invention relates to a non-contact continuous type sensing device for a flowmeter and a sensing method thereof. The flowmeter includes a movable member that is connected to an operating member and that is driven by a fluid to move, thereby moving the operating member. A projector is mounted above the operating member and projects signals onto the operating member. At least two regions are defined in a side of the operating member facing the projector. At least one of the at least two regions includes metal material to reflect the signals projected thereon. A signal density in a space between the projector and the operating member is changed when the operating member is passing through the space, such that the projection power of the projector is affected to thereby sense a movement condition of the operating member and to thereby continuously know a flowing condition of the fluid.
    Type: Grant
    Filed: December 20, 2016
    Date of Patent: February 6, 2018
    Assignee: Energy Management System Co., Ltd.
    Inventors: Chung-Ming Yang, Wen-Tzu Wu, Cheng-Hsien Su, Chung-Wei Li, Mei-Ling Tseng, Chih-Hsun Lin
  • Publication number: 20170176227
    Abstract: The present invention relates to a non-contact continuous type sensing device for a flowmeter and a sensing method thereof. The flowmeter includes a movable member that is connected to an operating member and that is driven by a fluid to move, thereby moving the operating member. A projector is mounted above the operating member and projects signals onto the operating member. At least two regions are defined in a side of the operating member facing the projector. At least one of the at least two regions includes metal material to reflect the signals projected thereon. A signal density in a space between the projector and the operating member is changed when the operating member is passing through the space, such that the projection power of the projector is affected to thereby sense a movement condition of the operating member and to thereby continuously know a flowing condition of the fluid.
    Type: Application
    Filed: December 20, 2016
    Publication date: June 22, 2017
    Inventors: CHUNG-MING YANG, WEN-TZU WU, CHENG-HSIEN SU, CHUNG-WEI LI, MEI-LING TSENG, CHIH-HSUN LIN
  • Publication number: 20150171279
    Abstract: An epitaxial substrate includes a main body having a surface and a plurality of protrusions formed on the surface of the main body and spaced apart from one another. Each of the protrusions has a dimension different from at least adjacent one of the protrusions. A method for producing the epitaxial substrate and a light emitting diode including the epitaxial substrate are also disclosed.
    Type: Application
    Filed: August 25, 2014
    Publication date: June 18, 2015
    Inventors: Chih-Yuan LEE, Kuo-Hsiung CHANG, Chung-Wei LI, Sin-Chun LI
  • Patent number: D997225
    Type: Grant
    Filed: March 9, 2021
    Date of Patent: August 29, 2023
    Assignee: HTC Corporation
    Inventors: Chang-Hua Wei, Chung-Wei Li
  • Patent number: D1011426
    Type: Grant
    Filed: January 4, 2021
    Date of Patent: January 16, 2024
    Assignee: HTC Corporation
    Inventors: Pei-Pin Huang, Chang-Hua Wei, Chung-Wei Li, Yu-Lin Huang