Abstract: A backlight module includes a light source, a first prism sheet disposed on the light source, and a light type adjustment sheet disposed on a side of the first prism sheet away from the light source and including a base and multiple light type adjustment structures. The multiple light type adjustment structures are disposed on the first surface of the base. Each light type adjustment structure has a first structure surface and a second structure surface connected to each other. The first structure surface of each light type adjustment structure and the first surface of the base form a first base angle therebetween, and the second structure surface of each light type adjustment structure and the first surface of the base form a second base angle therebetween. The angle of the first base angle is different from the angle of the second base angle.

Abstract: An integrated circuit package including electrically floating metal lines and a method of forming are provided. The integrated circuit package may include integrated circuit dies, an encapsulant around the integrated circuit dies, a redistribution structure on the encapsulant, a first electrically floating metal line disposed on the redistribution structure, a first electrical component connected to the redistribution structure, and an underfill between the first electrical component and the redistribution structure. A first opening in the underfill may expose a top surface of the first electrically floating metal line.

Abstract: An optical proximity correction (OPC) device and method is provided. The OPC device includes an analysis unit, a reverse pattern addition unit, a first OPC unit, a second OPC unit and an output unit. The analysis unit is configured to analyze a defect pattern from a photomask layout. The reverse pattern addition unit is configured to provide a reverse pattern within the defect pattern. The first OPC unit is configured to perform a first OPC procedure on whole of the photomask layout. The second OPC unit is configured to perform a second OPC procedure on the defect pattern of the photomask layout to enhance an exposure tolerance window. The output unit is configured to output the photomask layout which is corrected.

Abstract: The present disclosure provides a decoding device. The decoding device includes an iteration number computing unit and a recursive decoder. The iteration number computing unit receives multiple packet parameters corresponding to a packet and computes a codeword-number-per-symbol according to packet parameters, in which the packet includes multiple symbols. The iteration number computing unit computes an iteration number according to the codeword-number-per-symbol. The recursive decoder is coupled to the iteration number computing unit, and performs a decoding operation on a codeword within a data field of the packet according to the iteration number.

Abstract: The present disclosure provides a decoding device. The decoding device includes an iteration number computing unit and a recursive decoder. The iteration number computing unit receives multiple packet parameters corresponding to a packet and computes a codeword-number-per-symbol according to packet parameters, in which the packet includes multiple symbols. The iteration number computing unit computes an iteration number according to the codeword-number-per-symbol. The recursive decoder is coupled to the iteration number computing unit, and performs a decoding operation on a codeword within a data field of the packet according to the iteration number.