Abstract: Using surface activated bonding (SAB) allows direct bonding of a silicon growth seed layer over an aluminum nitride substrate without an intervening oxide layer. The growth seed layer may include p? Si(111) in order to allow for epitaxy of gallium nitride without exacerbating CTE mismatch between silicon and the gallium nitride. As a result, defects in the gallium nitride are reduced, and bowing and cracking of the substrate is reduced, which improves performance of an electronic device including the gallium nitride. Additionally, using SAB is faster than other techniques for forming a growth seed layer as well as conserving power, processing resources, and raw materials that otherwise would have been expended in forming the growth seed layer.

Abstract: Some implementations described herein provide a temporary carrier structure and techniques to form a semiconductor device on the temporary carrier structure. The temporary carrier structure includes a core layer formed from a material having a first bandgap lattice constant. The temporary carrier structure further includes a debonding layer formed from another material having a second bandgap energy constant that is lesser relative to the first bandgap lattice constant. Techniques to form the semiconductor device including a forming substrate layer of the semiconductor device on the temporary carrier structure, where a material of the substrate layer and the material of the core layer have a same approximate coefficient of thermal expansion. The techniques further include providing energy (e.g., electromagnetic waves from a laser source) to the debonding layer to remove the core layer from the temporary carrier structure.

Abstract: A semiconductor structure is provided. The semiconductor structure includes a first substrate and a second substrate. The first substrate includes a first semiconductor layer, including a first trench isolation that extends through a portion of the first substrate layer; and a first interconnect structure, disposed over the first semiconductor layer. The second substrate includes a second semiconductor layer, including a plurality of semiconductor islands and surrounded by at least a second isolation penetrating the second semiconductor layer; a second interconnect structure, disposed over the second substrate layer and bonded to the first interconnect structure; and a dielectric layer, disposed over the second semiconductor layer opposite to the second interconnect structure. A method of manufacturing the semiconductor structure is also provided.

Abstract: A semiconductor light-emitting device is disclosed. The semiconductor light-emitting device comprises a multilayer epitaxial structure disposed on a substrate. The substrate has a predetermined lattice direction perpendicular to an upper surface thereof, wherein the predetermined lattice direction is angled toward [0 11] or [01 1] from [100], or toward [011] or [0 11] from [ 100] so that the upper surface of the substrate comprises at least two lattice planes with different lattice plane directions. The multilayer epitaxial structure has a roughened upper surface perpendicular to the predetermined lattice direction. The invention also discloses a method for fabricating a semiconductor light-emitting device.

Abstract: A semiconductor light-emitting device is disclosed. The semiconductor light-emitting device comprises a multilayer epitaxial structure disposed on a semiconductor substrate. The semiconductor substrate has a predetermined lattice direction perpendicular to an upper surface thereof, wherein the predetermined lattice direction is angled toward [0 11] or [01 1] from [100], or toward [011] or [0 11] from [ 100] so that the upper surface of the semiconductor substrate comprises at least two lattice planes with different lattice plane directions. The multilayer epitaxial structure has a roughened upper surface perpendicular to the predetermined lattice direction. The invention also discloses a method for fabricating a semiconductor light-emitting device.