Patents by Inventor Chungsheng Yang

Chungsheng Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Magnetic thin film inductors
    Publication number: 20050120543
    Abstract: The present invention relates to inductors with improved inductance and quality factor. In one embodiment, a magnetic thin film inductor is disclosed. In this embodiment, magnetic thin film inductor includes a plurality of elongated conducting regions and magnetic material. The plurality of elongated conducting regions are positioned parallel with each other and at a predetermined spaced distance apart from each other. The magnetic material encases the plurality of conducting regions, wherein when currents are applied to the conductors, current paths in each of the conductors cause the currents to generally flow in the same direction thereby enhancing mutual inductance.
    Type: Application
    Filed: November 9, 2004
    Publication date: June 9, 2005
    Inventors: Xingwu Wang, Chungsheng Yang
  • MAGNETIC THIN FILM INDUCTORS
    Publication number: 20040239468
    Abstract: The present invention relates to inductors with improved inductance and quality factor. In one embodiment, a magnetic thin film inductor is disclosed. In this embodiment, magnetic thin film inductor includes a plurality of elongated conducting regions and magnetic material. The plurality of elongated conducting regions are positioned parallel with each other and at a predetermined spaced distance apart from each other. The magnetic material encases the plurality of conducting regions, wherein when currents are applied to the conductors, current paths in each of the conductors cause the currents to generally flow in the same direction thereby enhancing mutual inductance.
    Type: Application
    Filed: February 25, 2004
    Publication date: December 2, 2004
    Applicant: Intersil Americas Inc.
    Inventors: Xingwu Wang, Chungsheng Yang
  • Magnetic thin film inductors
    Patent number: 6822548
    Abstract: The present invention relates to inductors with improved inductance and quality factor. In one embodiment, a magnetic thin film inductor is disclosed. In this embodiment, magnetic thin film inductor includes a plurality of elongated conducting regions and magnetic material. The plurality of elongated conducting regions are positioned parallel with each other and at a predetermined spaced distance apart from each other. The magnetic material encases the plurality of conducting regions, wherein when currents are applied to the conductors, current paths in each of the conductors cause the currents to generally flow in the same direction thereby enhancing mutual inductance.
    Type: Grant
    Filed: February 25, 2004
    Date of Patent: November 23, 2004
    Assignee: Intersil Americas Inc.
    Inventors: Xingwu Wang, Chungsheng Yang
  • Magnetic thin film inductors
    Publication number: 20040164836
    Abstract: The present invention relates to inductors with improved inductance and quality factor. In one embodiment, a magnetic thin film inductor is disclosed. In this embodiment, magnetic thin film inductor includes a plurality of elongated conducting regions and magnetic material. The plurality of elongated conducting regions are positioned parallel with each other and at a predetermined spaced distance apart from each other. The magnetic material encases the plurality of conducting regions, wherein when currents are applied to the conductors, current paths in each of the conductors cause the currents to generally flow in the same direction thereby enhancing mutual inductance.
    Type: Application
    Filed: February 26, 2004
    Publication date: August 26, 2004
    Applicant: Intersil Americas Inc.
    Inventors: Xingwu Wang, Chungsheng Yang
  • Magnetic thin film inductors
    Patent number: 6700472
    Abstract: The present invention relates to inductors with improved inductance and quality factor. In one embodiment, a magnetic thin film inductor is disclosed. In this embodiment, magnetic thin film inductor includes a plurality of elongated conducting regions and magnetic material. The plurality of elongated conducting regions are positioned parallel with each other and at a predetermined spaced distance apart from each other. The magnetic material encases the plurality of conducting regions, wherein when currents are applied to the conductors, current paths in each of the conductors cause the currents to generally flow in the same direction thereby enhancing mutual inductance.
    Type: Grant
    Filed: December 11, 2001
    Date of Patent: March 2, 2004
    Assignee: Intersil Americas Inc.
    Inventors: Xingwu Wang, Chungsheng Yang
  • Magnetic thin film inductors
    Publication number: 20030107463
    Abstract: The present invention relates to inductors with improved inductance and quality factor. In one embodiment, a magnetic thin film inductor is disclosed. In this embodiment, magnetic thin film inductor includes a plurality of elongated conducting regions and magnetic material. The plurality of elongated conducting regions are positioned parallel with each other and at a predetermined spaced distance apart from each other. The magnetic material encases the plurality of conducting regions, wherein when currents are applied to the conductors, current paths in each of the conductors cause the currents to generally flow in the same direction thereby enhancing mutual inductance.
    Type: Application
    Filed: December 11, 2001
    Publication date: June 12, 2003
    Applicant: INTERSIL AMERICAS INC.
    Inventors: Xingwu Wang, Chungsheng Yang