Patents by Inventor Chunlong YAN

Chunlong YAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask, device and method for exposure
    Patent number: 11086228
    Abstract: A mask, a device and method for exposure are provided. The mask of the present disclosure includes: a first transparent region configured to allow light of a first wavelength to pass therethrough and filter out light of a second wavelength; and a second transparent region configured to allow the light of the second wavelength to pass therethrough, wherein the light of the second wavelength is light for exposure.
    Type: Grant
    Filed: August 13, 2018
    Date of Patent: August 10, 2021
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
    Inventors: Chunlong Yan, Long Zhen, Qiang Li, Delong Wang, Zecheng Li
  • Display substrate, manufacturing method thereof, display device and mask
    Patent number: 10921635
    Abstract: The present disclosure provides a display substrate, including a base substrate, and a black matrix pattern and a color filter pattern on the base substrate. The black matrix pattern defines one or more display regions of the display substrate and a non-display region surrounding the one or more display regions. The color filter pattern includes a plurality of color filter sub-patterns, each color filter sub-pattern includes a plurality of color filter units, and each color filter unit includes a body portion. At least one of the color filter units further includes an anchoring portion extending from the body portion, and in a direction perpendicular to an extension direction of the body portion, the anchoring portion has a size greater than the body portion. The present disclosure further provides a method for manufacturing the display substrate, a display device and a mask.
    Type: Grant
    Filed: January 10, 2019
    Date of Patent: February 16, 2021
    Assignees: ORDOS YUANSHENG OPTOELECTRONICS CO., LTD., BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Long Zhen, Heewoong Kim, Mingqian Hao, Jianjun Li, Chunlong Yan, Zecheng Li, Qiang Li
  • Carrying platform and exposure method
    Patent number: 10503081
    Abstract: A carrying platform and an exposure method are provided. The carrying platform includes: a plurality of sub-stands, configured to co-carry an object. Each sub-stand includes: a platform having a first carrying surface; and a position adjusting unit disposed on a side of the platform away from the first carrying surface and configured to adjust at least one of height or inclined angle of the platform.
    Type: Grant
    Filed: October 23, 2017
    Date of Patent: December 10, 2019
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Chunlong Yan, Jianjun Li, Xin Bai, Guiqi Liu
  • DISPLAY SUBSTRATE, MANUFACTURING METHOD THEREOF, DISPLAY DEVICE AND MASK
    Publication number: 20190302550
    Abstract: The present disclosure provides a display substrate, including a base substrate, and a black matrix pattern and a color filter pattern on the base substrate. The black matrix pattern defines one or more display regions of the display substrate and a non-display region surrounding the one or more display regions. The color filter pattern includes a plurality of color filter sub-patterns, each color filter sub-pattern includes a plurality of color filter units, and each color filter unit includes a body portion. At least one of the color filter units further includes an anchoring portion extending from the body portion, and in a direction perpendicular to an extension direction of the body portion, the anchoring portion has a size greater than the body portion. The present disclosure further provides a method for manufacturing the display substrate, a display device and a mask.
    Type: Application
    Filed: January 10, 2019
    Publication date: October 3, 2019
    Applicants: ORDOS YUANSHENG OPTOELECTRONICS CO., LTD., BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Long ZHEN, Heewoong KIM, Mingqian HAO, Jianjun LI, Chunlong YAN, Zecheng LI, Qiang LI
  • MASK, DEVICE AND METHOD FOR EXPOSURE
    Publication number: 20190179229
    Abstract: A mask, a device and method for exposure are provided. The mask of the present disclosure includes: a first transparent region configured to allow light of a first wavelength to pass therethrough and filter out light of a second wavelength; and a second transparent region configured to allow the light of the second wavelength to pass therethrough, wherein the light of the second wavelength is light for exposure.
    Type: Application
    Filed: August 13, 2018
    Publication date: June 13, 2019
    Inventors: Chunlong YAN, Long ZHEN, Qiang LI, Delong WANG, Zecheng LI
  • CARRYING PLATFORM AND EXPOSURE METHOD
    Publication number: 20180275531
    Abstract: A carrying platform and an exposure method are provided. The carrying platform includes: a plurality of sub-stands, configured to co-carry an object. Each sub-stand includes: a platform having a first carrying surface; and a position adjusting unit disposed on a side of the platform away from the first carrying surface and configured to adjust at least one of height or inclined angle of the platform.
    Type: Application
    Filed: October 23, 2017
    Publication date: September 27, 2018
    Inventors: Chunlong YAN, Jianjun LI, Xin BAI, Guiqi LIU