Abstract: A bumping process comprises forming a passivation layer having a planarized surface covering a pad on a substrate, forming a hole penetrating through the passivation layer to expose a contact surface of the pad, and forming a bump on the contact surface and planarized surface. The planarized surface will provide a larger effective area for pressing, thereby minimizing the pad, enhancing the mechanical strength at the peripheral of the pad, providing more selection flexibility for anisotropic conductive film, reducing the possibilities of short circuit and current leakage within the bump gap, and increasing the yield of the pressing process and the conductive quality of the bump.

Abstract: A bumping process comprises forming a passivation layer having a planarized surface covering a pad on a substrate, forming a hole penetrating through the passivation layer to expose a contact surface of the pad, and forming a bump on the contact surface and planarized surface. The planarized surface will provide a larger effective area for pressing, thereby minimizing the pad, enhancing the mechanical strength at the peripheral of the pad, providing more selection flexibility for anisotropic conductive film, reducing the possibilities of short circuit and current leakage within the bump gap, and increasing the yield of the pressing process and the conductive quality of the bump.

Abstract: A bumping process comprises forming a passivation layer having a planarized surface covering a pad on a substrate, forming a hole penetrating through the passivation layer to expose a contact surface of the pad, and forming a bump on the contact surface and planarized surface. The planarized surface will provide a larger effective area for pressing, thereby minimizing the pad, enhancing the mechanical strength at the peripheral of the pad, providing more selection flexibility for anisotropic conductive film, reducing the possibilities of short circuit and current leakage within the bump gap, and increasing the yield of the pressing process and the conductive quality of the bump.

Abstract: A chip with a bump structure comprises a chip, a plurality of pads and a plurality of bumps. The chip includes a microcircuit fabricated by integrated circuit technique. The pads are metallized portions of the chip for electrical connection. The bumps are metal bulges on the pads of the chip for electrically connecting the pads with the terminals of other components. The bumps are arranged in a horizontal direction, and each of the bumps include a first section and a second section, wherein the first section and the second section are electrically connected to each other along a vertical direction. The first section electrically contacts the corresponding pad. The size of the second section in the horizontal direction is larger than that of the first section. The second section is used for electrically connecting the chip to other components. The first section and the second section of adjacent bumps are interlaced.

Abstract: A patterned gold bump structure for a semiconductor chip comprises at least a patterned gold bump disposed on an insulating layer of a semiconductor chip, wherein the gold bump is used as a circuit component or a passing line. In some embodiments, the circuit component is a capacitor, a resistor, or an inductor.

Abstract: A bumping process comprises forming a passivation layer having a planarized surface covering a pad on a substrate, forming a hole penetrating through the passivation layer to expose a contact surface of the pad, and forming a bump on the contact surface and planarized surface. The planarized surface will provide a larger effective area for pressing, thereby minimizing the pad, enhancing the mechanical strength at the peripheral of the pad, providing more selection flexibility for anisotropic conductive film, reducing the possibilities of short circuit and current leakage within the bump gap, and increasing the yield of the pressing process and the conductive quality of the bump.