Patents by Inventor CHUNRONG DONG

CHUNRONG DONG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ion source device and method for providing ion source
    Patent number: 9177750
    Abstract: Various embodiments provide an ion source device and a method for providing the ion source. An exemplary ion source device can include an arc chamber, a filament, a reflector, a slit outlet, a source gas inlet, and/or a cleaning gas inlet. The filament can be configured to generate thermo-electrons in the arc chamber. The reflector can be configured to reflect the thermo-electrons back to the arc chamber. The slit outlet can be configured to exit a gaseous material out of the arc chamber. The source gas inlet and the cleaning gas inlet can be located on a same sidewall of the arc chamber configured to respectively introduce an ion source gas and an inert cleaning gas into the arc chamber.
    Type: Grant
    Filed: December 3, 2013
    Date of Patent: November 3, 2015
    Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
    Inventors: Lulei Wu, Leon Shan, Chunrong Dong
  • ION SOURCE DEVICE AND METHOD FOR PROVIDING ION SOURCE
    Publication number: 20140110598
    Abstract: Various embodiments provide an ion source device and a method for providing the ion source. An exemplary ion source device can include an arc chamber, a filament, a reflector, a slit outlet, a source gas inlet, and/or a cleaning gas inlet. The filament can be configured to generate thermo-electrons in the arc chamber. The reflector can be configured to reflect the thermo-electrons back to the arc chamber. The slit outlet can be configured to exit a gaseous material out of the arc chamber. The source gas inlet and the cleaning gas inlet can be located on a same sidewall of the arc chamber configured to respectively introduce an ion source gas and an inert cleaning gas into the arc chamber.
    Type: Application
    Filed: December 3, 2013
    Publication date: April 24, 2014
    Applicant: Semiconductor Manufacturing International (Shanghai) Corporation
    Inventors: LULEI WU, LEON SHAN, CHUNRONG DONG