Patents by Inventor Chun Xiao Yang

Chun Xiao Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and structure for aluminum chemical mechanical polishing and protective layer
    Patent number: 7241692
    Abstract: A method for chemical mechanical polishing of mirror structures. The method includes providing a semiconductor substrate, e.g., silicon wafer. The method includes forming a first dielectric layer overlying the semiconductor substrate and forming an aluminum layer overlying the first dielectric layer, the aluminum layer having an upper surface with a predetermined roughness of greater than 20 Angstroms RMS. The method also includes processing regions overlying the upper surface of the aluminum layer using a touch polishing process to reduce a surface roughness of the upper surface of aluminum layer to less than 5 Angstroms to form a mirror surface on the aluminum layer. Preferably, a protective layer is formed overlying the mirror surface on the aluminum layer.
    Type: Grant
    Filed: July 26, 2005
    Date of Patent: July 10, 2007
    Assignee: Semiconductor Manufacturing International (Shanghai) Corporation
    Inventors: Chris C. Yu, Chun Xiao Yang