Patents by Inventor Chuoluopeng

Chuoluopeng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask plate
    Patent number: 10209616
    Abstract: The present invention provides a mask plate, relating to a field of exposure technology, which can solve the problem of an existing mask plate that a resolution is limited by an effect of diffraction. The mask plate of the invention includes: a pattern structure, including a light blocking region and a light transmitting region; and a total reflection structure provided at an light-exiting side of the pattern structure, the total reflection structure including a high refraction layer and a first low refraction layer sequentially provided in a direction away from the pattern structure and contacting each other, wherein a refractive index of the high refraction layer is greater than a refractive index of the first low refraction layer.
    Type: Grant
    Filed: June 27, 2016
    Date of Patent: February 19, 2019
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
    Inventors: Chaobo Zhang, Liangliang Liu, Hongwei Tian, Nini Bai, Shuai Han, Feng Kang, Liang Tang, Chuoluopeng, Tiangui Min
  • MASK PLATE
    Publication number: 20170227842
    Abstract: The present invention provides a mask plate, relating to a field of exposure technology, which can solve the problem of an existing mask plate that a resolution is limited by an effect of diffraction. The mask plate of the invention includes: a pattern structure, including a light blocking region and a light transmitting region; and a total reflection structure provided at an light-exiting side of the pattern structure, the total reflection structure including a high refraction layer and a first low refraction layer sequentially provided in a direction away from the pattern structure and contacting each other, wherein a refractive index of the high refraction layer is greater than a refractive index of the first low refraction layer.
    Type: Application
    Filed: June 27, 2016
    Publication date: August 10, 2017
    Inventors: Chaobo ZHANG, Liangliang LIU, Hongwei TIAN, Nini BAI, Shuai HAN, Feng KANG, Liang TANG, Chuoluopeng, Tiangui MIN