Patents by Inventor Chwei-Ching Chiu

Chwei-Ching Chiu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10475742
    Abstract: A method of forming a semiconductor device structure includes: forming a first conductive structure over a substrate, the first conductive structure including twin boundaries; and wherein the forming the first conductive structure includes manipulating process conditions so as to promote formation of the twin boundaries resulting in a promoted density of twin boundaries such that the first conductive structure has an increased failure current density (FCD) relative to a baseline FCD of an otherwise substantially corresponding second conductive structure which has an unpromoted density of twin boundaries, the unpromoted density being less than the promoted density and such that the first conductive structure has a resistance which is substantially the same as the second conductive structure.
    Type: Grant
    Filed: November 30, 2018
    Date of Patent: November 12, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Jian-Hong Lin, Chwei-Ching Chiu, Yung-Huei Lee, Chien-Neng Liao, Yu-Lun Chueh, Tsung-Cheng Chan, Chun-Lung Huang
  • Patent number: 10283450
    Abstract: A method, for forming a semiconductor device structure, includes: forming a conductive structure over a substrate, wherein the conductive structure includes twin boundaries. The forming the conductive structure includes: manipulating process conditions so as to promote formation of the twin boundaries and yet control a density of the twin boundaries to be outside a range for which a portion of a curve is an asymptote of a constant value, the curve representing values of an atomic migration ratio corresponding to values of the density of the twin boundaries.
    Type: Grant
    Filed: August 9, 2017
    Date of Patent: May 7, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Jian-Hong Lin, Chwei-Ching Chiu, Yung-Huei Lee, Chien-Neng Liao, Yu-Lun Chueh, Tsung-Cheng Chan, Chun-Lung Huang
  • Publication number: 20190103351
    Abstract: A method of forming a semiconductor device structure includes: forming a first conductive structure over a substrate, the first conductive structure including twin boundaries; and wherein the forming the first conductive structure includes manipulating process conditions so as to promote formation of the twin boundaries resulting in a promoted density of twin boundaries such that the first conductive structure has an increased failure current density (FCD) relative to a baseline FCD of an otherwise substantially corresponding second conductive structure which has an unpromoted density of twin boundaries, the unpromoted density being less than the promoted density and such that the first conductive structure has a resistance which is substantially the same as the second conductive structure.
    Type: Application
    Filed: November 30, 2018
    Publication date: April 4, 2019
    Inventors: Jian-Hong LIN, Chwei-Ching CHIU, Yung-Huei LEE, Chien-Neng LIAO, Yu-Lun CHUEH, Tsung-Cheng CHAN, Chun-Lung HUANG
  • Patent number: 9941159
    Abstract: A method of making a semiconductor device includes forming a first opening in an insulating layer, forming a second opening in the insulating layer, forming a third opening in the insulating layer and filling the first opening, the second opening and the third opening with a conductive material. The first opening has a width and a length. The second opening has a width less than the length of the first opening, and is electrically connected to the first opening. The third opening has a width less than the width of the second opening, and is electrically connected to the second opening.
    Type: Grant
    Filed: September 2, 2016
    Date of Patent: April 10, 2018
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Jian-Hong Lin, Hsin-Chun Chang, Shiou-Fan Chen, Chwei-Ching Chiu, Yung-Huei Lee
  • Patent number: 9875964
    Abstract: Semiconductor device components and methods are disclosed. In one embodiment, a semiconductor device component includes a conductive segment having a first surface, a second surface opposite the first surface, a first end, and a second end opposite the first end. A first via is coupled to the second surface of the conductive segment at the first end. A second via is coupled to the first surface of the conductive segment at the second end, and a third via is coupled to the second surface of the conductive segment at the second end.
    Type: Grant
    Filed: January 28, 2014
    Date of Patent: January 23, 2018
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Bi-Ling Lin, Jian-Hong Lin, Ming-Hong Hsieh, Lee-Der Chen, Jiaw-Ren Shih, Chwei-Ching Chiu
  • Publication number: 20170338178
    Abstract: A method, for forming a semiconductor device structure, includes: forming a conductive structure over a substrate, wherein the conductive structure includes twin boundaries. The forming the conductive structure includes: manipulating process conditions so as to promote formation of the twin boundaries and yet control a density of the twin boundaries to be outside a range for which a portion of a curve is an asymptote of a constant value, the curve representing values of an atomic migration ratio corresponding to values of the density of the twin boundaries.
    Type: Application
    Filed: August 9, 2017
    Publication date: November 23, 2017
    Inventors: Jian-Hong LIN, Chwei-Ching CHIU, Yung-Huei LEE, Chien-Neng LIAO, Yu-Lun CHUEH, Tsung-Cheng CHAN, Chun-Lung HUANG
  • Patent number: 9761523
    Abstract: A semiconductor device structure with twin-boundaries and method for forming the same are provided. The semiconductor device structure includes a substrate and a conductive structure formed over the substrate. The conductive structure includes twin boundaries, and a density of the twin boundaries is in a range from about 25 ?m?1 to about 250 ?m?1.
    Type: Grant
    Filed: August 21, 2015
    Date of Patent: September 12, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Jian-Hong Lin, Chwei-Ching Chiu, Yung-Huei Lee, Chien-Neng Liao, Yu-Lun Chueh, Tsung-Cheng Chan, Chun-Lung Huang
  • Publication number: 20170053865
    Abstract: A semiconductor device structure with twin-boundaries and method for forming the same are provided. The semiconductor device structure includes a substrate and a conductive structure formed over the substrate. The conductive structure includes twin boundaries, and a density of the twin boundaries is in a range from about 25 ?m?1 to about 250 ?m?1.
    Type: Application
    Filed: August 21, 2015
    Publication date: February 23, 2017
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Jian-Hong LIN, Chwei-Ching CHIU, Yung-Huei LEE, Chien-Neng LIAO, Yu-Lun CHUEH, Tsung-Cheng CHAN, Chun-Lung HUANG
  • Publication number: 20160372368
    Abstract: A method of making a semiconductor device includes forming a first opening in an insulating layer, forming a second opening in the insulating layer, forming a third opening in the insulating layer and filling the first opening, the second opening and the third opening with a conductive material. The first opening has a width and a length. The second opening has a width less than the length of the first opening, and is electrically connected to the first opening. The third opening has a width less than the width of the second opening, and is electrically connected to the second opening.
    Type: Application
    Filed: September 2, 2016
    Publication date: December 22, 2016
    Inventors: Jian-Hong LIN, Hsin-Chun CHANG, Shiou-Fan CHEN, Chwei-Ching CHIU, Yung-Huei LEE
  • Patent number: 9502886
    Abstract: One or more systems and techniques for managing one or more electronic devices are provided. A determination is made that a first capacitor in a set of one or more capacitors has a defect. Responsive to the determination, the first capacitor is disabled, and a second capacitor is enabled.
    Type: Grant
    Filed: October 5, 2013
    Date of Patent: November 22, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company Limited
    Inventors: Chien-Jung Wang, Huan-Neng Chen, Chewn-Pu Jou, Chwei-Ching Chiu
  • Patent number: 9449919
    Abstract: A semiconductor device includes a first interconnect structure. The first interconnect structure includes a first interconnect portion, a second interconnect portion and a third interconnect portion. The first interconnect portion has a width and a length. The second interconnect portion has a width less than the length of the first interconnect portion. The second interconnect portion is connected to the first interconnect portion. The third interconnect portion has a width less than the width of the second interconnect portion. The third interconnect portion is connected to the second interconnect portion.
    Type: Grant
    Filed: February 12, 2015
    Date of Patent: September 20, 2016
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Jian-Hong Lin, Hsin-Chun Chang, Shiou-Fan Chen, Chwei-Ching Chiu, Yung-Huei Lee
  • Publication number: 20160240472
    Abstract: A semiconductor device includes a first interconnect structure. The first interconnect structure includes a first interconnect portion, a second interconnect portion and a third interconnect portion. The first interconnect portion has a width and a length. The second interconnect portion has a width less than the length of the first interconnect portion. The second interconnect portion is connected to the first interconnect portion. The third interconnect portion has a width less than the width of the second interconnect portion. The third interconnect portion is connected to the second interconnect portion.
    Type: Application
    Filed: February 12, 2015
    Publication date: August 18, 2016
    Inventors: Jian-Hong LIN, Hsin-Chun CHANG, Shiou-Fan CHEN, Chwei-Ching CHIU, Yung-Huei LEE
  • Publication number: 20140145194
    Abstract: Semiconductor device components and methods are disclosed. In one embodiment, a semiconductor device component includes a conductive segment having a first surface, a second surface opposite the first surface, a first end, and a second end opposite the first end. A first via is coupled to the second surface of the conductive segment at the first end. A second via is coupled to the first surface of the conductive segment at the second end, and a third via is coupled to the second surface of the conductive segment at the second end.
    Type: Application
    Filed: January 28, 2014
    Publication date: May 29, 2014
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Bi-Ling Lin, Jian-Hong Lin, Ming-Hong Hsieh, Lee-Der Chen, Jiaw-Ren Shih, Chwei-Ching Chiu
  • Patent number: 8648592
    Abstract: Semiconductor device components and methods are disclosed. In one embodiment, a semiconductor device component includes a conductive segment having a first surface, a second surface opposite the first surface, a first end, and a second end opposite the first end. A first via is coupled to the second surface of the conductive segment at the first end. A second via is coupled to the first surface of the conductive segment at the second end, and a third via is coupled to the second surface of the conductive segment at the second end.
    Type: Grant
    Filed: September 13, 2011
    Date of Patent: February 11, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Bi-Ling Lin, Jian-Hong Lin, Ming-Hong Hsieh, Lee-Der Chen, Jiaw-Ren Shih, Chwei-Ching Chiu
  • Publication number: 20130063175
    Abstract: Semiconductor device components and methods are disclosed. In one embodiment, a semiconductor device component includes a conductive segment having a first surface, a second surface opposite the first surface, a first end, and a second end opposite the first end. A first via is coupled to the second surface of the conductive segment at the first end. A second via is coupled to the first surface of the conductive segment at the second end, and a third via is coupled to the second surface of the conductive segment at the second end.
    Type: Application
    Filed: September 13, 2011
    Publication date: March 14, 2013
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Bi-Ling Lin, Jian-Hong Lin, Ming-Hong Hsieh, Lee-Der Chen, Jiaw-Ren Shih, Chwei-Ching Chiu
  • Patent number: 6127833
    Abstract: A method for forming a semiconductor test carrier including an insulating substrate having a top surface, a bottom surface, periphery; with a rectangular cavity centrally located on the top surface and extending through to the bottom surface. A conductive ground trace formed on the top surface at the periphery of the cavity with conductive corner power traces formed adjacent each corner of the ground trace, with a ruled pattern of conductive wire bond pads encircling the corner power traces. Wire bond pads are formed in a linear array on each of the four sides encircling the power traces. A first interstitial ball pad array encircles the conductive wire bond pads and connects with the bottom surface by way of conductive vias communicating with a second interstitial ball pad array at the bottom surface. A glass plate is attached to the underside of the insulated substrate to form a bottom supporting surface in the rectangular cavity.
    Type: Grant
    Filed: January 4, 1999
    Date of Patent: October 3, 2000
    Assignee: Taiwan Semiconductor Manufacturing Co.
    Inventors: Wen-Teng Wu, Chwei-Ching Chiu, Chi-Min Hsieh