Abstract: A method is provided for producing different patterns on a single substrate. The method includes executing at least twice a sequence of the following steps: depositing a hardmask on the layer of interest and patterning the hardmask with a predefined pattern to create an accessible portion on the layer of interest; spinning a glass/carbon layer on the hardmask and on the accessible portion of the layer of interest; spin coating a block copolymer on the glass/carbon layer; transferring a predefined block copolymer pattern onto the layer of interest thereby obtaining a transferred pattern, removing the hard mask; filling the transferred pattern followed by chemical mechanical polishing or etching back, wherein different block copolymer patterns are used.