Abstract: A method of optimising the sensitivity of surface plasmon ellipsometry (SPE) apparatus used to analyse a surface comprising a conducting film is disclosed. The method includes calculating a sensitivity map of plasmon ellipsometry for the film. The sensitivity map comprises data defining variations in sensitivity of the plasmon ellipsometry apparatus with angle of incidence and polarization angle of polarized light incident on the conducting film for analysis by the apparatus. The method further comprises using the sensitivity map to configure the plasmon ellipsometry apparatus with a combination of the angle of incidence and polarization angle located in a region of substantially maximum sensitivity in the sensitivity map.

Abstract: A method of optimising the sensitivity of surface plasmon ellipsometry (SPE) apparatus used to analyse a surface comprising a conducting film, the method comprising calculating a sensitivity map of SPE for the film, the sensitivity map comprising data defining variations in sensitivity of said SPE apparatus with angle of incidence and polarisation angle of polarised light incident on said film for analysis by said SPE apparatus, and using said sensitivity map to configure said SPE apparatus with a combination of said angle of incidence and polarisation angle located in a region of substantially maximum sensitivity in said sensitivity map.