Abstract: A system for dispensing beverages into a receptacle controls both the dispense flow rate of a carbonated beverage and also uses bottom filling of the receptacle to limit entrainment and bubble formation during the dispense process. More particularly, the present application provides for using two separate flow paths for dispensing beverage with a first path employed initially for a low flow rate and a second path employed thereafter to fill the receptacle.

Abstract: A system for dispensing beverages into a receptacle controls both the dispense flow rate of a carbonated beverage and also uses bottom filling of the receptacle to limit entrainment and bubble formation during the dispense process. More particularly, the present application provides for using two separate flow paths for dispensing beverage with a first path employed initially for a low flow rate and a second path employed thereafter to fill the receptacle.

Abstract: The present application relates generally to a system which provides for cleaning of beverage supply lines and fittings. More particularly, the system provides for equalizing of flows and pressures between parallel beverage lines being cleaned.

Abstract: The present application relates generally to a system which provides for cleaning of beverage supply lines and fittings. More particularly, the system provides for equalising of flows and pressures between parallel beverage lines being cleaned.

Abstract: A method of fault detection is described for use in a plasma process chamber powered by an RF source and subject to periodic standard preventive maintenance. Prior to a production run, the changes in magnitude of a plurality of Fourier components of the RF source resulting from known changes in a plurality of process conditions are determined and a single parameter which is a linear combination of a selected subset of said components is constructed. The construction is such that the combination is relatively sensitive to pre-selected process changes and relatively insensitive to said standard preventive maintenance. Then, during the production run, the single parameter is monitored to determine if there is a fault in the plasma process.

Abstract: A method of fault detection is described for use in a plasma process chamber powered by an RF source and subject to periodic standard preventive maintenance. Prior to a production run, the changes in magnitude of a plurality of Fourier components of the RF source resulting from known changes in a plurality of process conditions are determined and a single parameter which is a linear combination of a selected subset of said components is constructed. The construction is such that the combination is relatively sensitive to pre-selected process changes and relatively insensitive to said standard preventive maintenance. Then, during the production run, the single parameter is monitored to determine if there is a fault in the plasma process.

Abstract: A sensor for detecting RF current flowing in a conductor includes a layer 10 of insulating material with a hole 16 for the passage of the RF conductor 18 in a direction normal to the layer. A plurality of conductive tracks 20, 22 (FIG. 3) on the opposite major surfaces of the layer are selectively joined by a plurality of through-holes each containing conductive material. The conductive material selectively connects the conductive elements 20, 22 to form a plurality of loops (FIG. 4) disposed non-parallel to the layer 10 for inductive coupling to the RF conductor 18.