Abstract: The present invention relates to a method for measuring particle contamination of a transport carrier for conveying and storing semiconductor substrates at atmospheric pressure, implemented in a measuring station. The measuring method comprises: a step in which the measuring module (5) couples to the rigid casing (2), thereby defining a first measuring volume (V1) between the casing-measuring interface (16) and the coupled rigid casing (2) in order to measure contamination of the internal walls of the rigid casing (2); and a step in which the door (3) couples to the measuring module (5), thereby defining a second measuring volume (V2) between said measuring face (22) and the opposite door (3) in order to measure contamination of the door (3). The invention also relates to an associated measuring station.

Abstract: The present invention relates to a station for measuring particle contamination of a transport carrier for conveying and storing semiconductor substrates at atmospheric pressure, said transport carrier comprising a rigid casing (2) containing an aperture and a removable door (3) allowing the aperture to be closed, the measuring station comprising: a controlled environment chamber (4) comprising at least one load port (8) capable of coupling, on the one hand, to the rigid casing (2), and on the other hand, to the door (3) of the transport carrier, in order to move the door (3) into the controlled environment chamber (4) and bring the interior of the rigid casing (2) into communication with the interior of the controlled environment chamber (4); and a measuring module (5) comprising a particle measuring unit (14) and a casing-measuring interface (16) configured to couple to the rigid transport carrier casing (2) coupled to the controlled environment chamber (4) in the place of the door (3), characterized in

Abstract: The present invention relates to a method for measuring particle contamination of a transport carrier for conveying and storing semiconductor substrates at atmospheric pressure, implemented in a measuring station. The measuring method comprises: a step in which the measuring module (5) couples to the rigid casing (2), thereby defining a first measuring volume (V1) between the casing-measuring interface (16) and the coupled rigid casing (2) in order to measure contamination of the internal walls of the rigid casing (2); and a step in which the door (3) couples to the measuring module (5), thereby defining a second measuring volume (V2) between said measuring face (22) and the opposite door (3) in order to measure contamination of the door (3). The invention also relates to an associated measuring station.

Abstract: The present invention relates to a station for measuring particle contamination of a transport carrier for conveying and storing semiconductor substrates at atmospheric pressure, said transport carrier comprising a rigid casing (2) containing an aperture and a removable door (3) allowing the aperture to be closed, the measuring station comprising: a controlled environment chamber (4) comprising at least one load port (8) capable of coupling, on the one hand, to the rigid casing (2), and on the other hand, to the door (3) of the transport carrier, in order to move the door (3) into the controlled environment chamber (4) and bring the interior of the rigid casing (2) into communication with the interior of the controlled environment chamber (4); and a measuring module (5) comprising a particle measuring unit (14) and a casing-measuring interface (16) configured to couple to the rigid transport carrier casing (2) coupled to the controlled environment chamber (4) in the place of the door (3), characterized in

Abstract: An object of the present invention is a photomask drying device which includes: a sealed chamber containing at least one photomask, a pumping unit to set up and maintain vacuum within said chamber, a support for the photomask placed within said chamber, infrared radiation means placed within said chamber, a system for injecting gas into said chamber characterized in that the infrared radiation means comprise a plurality of infrared radiation sources distributed in a plane parallel to the plane of the photomask in such a way that the distance from the photomask to the infrared radiation means is given by the relationship: D=1.

Abstract: An object of the present invention is a photomask drying device which includes: a sealed chamber containing at least one photomask, a pumping unit to set up and maintain vacuum within said chamber, a support for the photomask placed within said chamber, infrared radiation means placed within said chamber, a system for injecting gas into said chamber characterized in that the infrared radiation means comprise a plurality of infrared radiation sources distributed in a plane parallel to the plane of the photomask in such a way that the distance from the photomask to the infrared radiation means is given by the relationship: D=1.