Patents by Inventor Cindy Thovex

Cindy Thovex has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9816974
    Abstract: The present invention relates to a method for measuring particle contamination of a transport carrier for conveying and storing semiconductor substrates at atmospheric pressure, implemented in a measuring station. The measuring method comprises: a step in which the measuring module (5) couples to the rigid casing (2), thereby defining a first measuring volume (V1) between the casing-measuring interface (16) and the coupled rigid casing (2) in order to measure contamination of the internal walls of the rigid casing (2); and a step in which the door (3) couples to the measuring module (5), thereby defining a second measuring volume (V2) between said measuring face (22) and the opposite door (3) in order to measure contamination of the door (3). The invention also relates to an associated measuring station.
    Type: Grant
    Filed: November 29, 2013
    Date of Patent: November 14, 2017
    Assignee: ADIXEN VACUUM PRODUCTS
    Inventors: Cindy Thovex, Nicolas Chapel, Bertrand Bellet
  • Patent number: 9810617
    Abstract: The present invention relates to a station for measuring particle contamination of a transport carrier for conveying and storing semiconductor substrates at atmospheric pressure, said transport carrier comprising a rigid casing (2) containing an aperture and a removable door (3) allowing the aperture to be closed, the measuring station comprising: a controlled environment chamber (4) comprising at least one load port (8) capable of coupling, on the one hand, to the rigid casing (2), and on the other hand, to the door (3) of the transport carrier, in order to move the door (3) into the controlled environment chamber (4) and bring the interior of the rigid casing (2) into communication with the interior of the controlled environment chamber (4); and a measuring module (5) comprising a particle measuring unit (14) and a casing-measuring interface (16) configured to couple to the rigid transport carrier casing (2) coupled to the controlled environment chamber (4) in the place of the door (3), characterized in
    Type: Grant
    Filed: November 29, 2013
    Date of Patent: November 7, 2017
    Assignee: ADIXEN VACUUM PRODUCTS
    Inventors: Cindy Thovex, Julien Bounouar, Arnaud Favre
  • Publication number: 20150301007
    Abstract: The present invention relates to a method for measuring particle contamination of a transport carrier for conveying and storing semiconductor substrates at atmospheric pressure, implemented in a measuring station. The measuring method comprises: a step in which the measuring module (5) couples to the rigid casing (2), thereby defining a first measuring volume (V1) between the casing-measuring interface (16) and the coupled rigid casing (2) in order to measure contamination of the internal walls of the rigid casing (2); and a step in which the door (3) couples to the measuring module (5), thereby defining a second measuring volume (V2) between said measuring face (22) and the opposite door (3) in order to measure contamination of the door (3). The invention also relates to an associated measuring station.
    Type: Application
    Filed: November 29, 2013
    Publication date: October 22, 2015
    Applicant: ADIXEN VACUUM PRODUCTS
    Inventors: Cindy THOVEX, Nicolas CHAPEL, Bertrand BELLET
  • Publication number: 20150276572
    Abstract: The present invention relates to a station for measuring particle contamination of a transport carrier for conveying and storing semiconductor substrates at atmospheric pressure, said transport carrier comprising a rigid casing (2) containing an aperture and a removable door (3) allowing the aperture to be closed, the measuring station comprising: a controlled environment chamber (4) comprising at least one load port (8) capable of coupling, on the one hand, to the rigid casing (2), and on the other hand, to the door (3) of the transport carrier, in order to move the door (3) into the controlled environment chamber (4) and bring the interior of the rigid casing (2) into communication with the interior of the controlled environment chamber (4); and a measuring module (5) comprising a particle measuring unit (14) and a casing-measuring interface (16) configured to couple to the rigid transport carrier casing (2) coupled to the controlled environment chamber (4) in the place of the door (3), characterized in
    Type: Application
    Filed: November 29, 2013
    Publication date: October 1, 2015
    Applicant: ADIXEN VACUUM PRODUCTS
    Inventors: Cindy Thovex, Julien Bounouar, Arnaud Favre
  • Patent number: 8724078
    Abstract: An object of the present invention is a photomask drying device which includes: a sealed chamber containing at least one photomask, a pumping unit to set up and maintain vacuum within said chamber, a support for the photomask placed within said chamber, infrared radiation means placed within said chamber, a system for injecting gas into said chamber characterized in that the infrared radiation means comprise a plurality of infrared radiation sources distributed in a plane parallel to the plane of the photomask in such a way that the distance from the photomask to the infrared radiation means is given by the relationship: D=1.
    Type: Grant
    Filed: June 27, 2011
    Date of Patent: May 13, 2014
    Assignee: Adixen Vacuum Products
    Inventors: Cindy Thovex, Bertrand Bellet
  • Publication number: 20130094007
    Abstract: An object of the present invention is a photomask drying device which includes: a sealed chamber containing at least one photomask, a pumping unit to set up and maintain vacuum within said chamber, a support for the photomask placed within said chamber, infrared radiation means placed within said chamber, a system for injecting gas into said chamber characterized in that the infrared radiation means comprise a plurality of infrared radiation sources distributed in a plane parallel to the plane of the photomask in such a way that the distance from the photomask to the infrared radiation means is given by the relationship: D=1.
    Type: Application
    Filed: June 27, 2011
    Publication date: April 18, 2013
    Applicant: ADIXEN VACUUM PRODUCTS
    Inventors: Cindy Thovex, Bertrand Bellet