Patents by Inventor Clark Kuang Kian Ong

Clark Kuang Kian Ong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for fabricating semiconductor devices with shallow diffusion regions
    Patent number: 8101487
    Abstract: A method for fabricating a semiconductor device is presented. The method includes providing a substrate and forming a gate stack over the substrate. A first laser processing to form vacancy rich regions within the substrate on opposing sides of the gate stack is performed. The vacancy rich regions have a first depth from a surface of the substrate. A first implant causing end of range defect regions to be formed on opposing sides of the gate stack at a second depth from the surface of the substrate is also carried out, wherein the first depth is proximate to the second depth.
    Type: Grant
    Filed: May 15, 2009
    Date of Patent: January 24, 2012
    Assignees: Nanyang Technological University, National University of Singapore, GLOBALFOUNDRIES Singapore Pte. Ltd.
    Inventors: Dexter Xueming Tan, Benjamin Colombeau, Clark Kuang Kian Ong, Sai Hooi Yeong, Chee Mang Ng, Kin Leong Pey
  • METHOD FOR FABRICATING SEMICONDUCTOR DEVICES WITH SHALLOW DIFFUSION REGIONS
    Publication number: 20090286373
    Abstract: A method for fabricating a semiconductor device is presented. The method includes providing a substrate and forming a gate stack over the substrate. A first laser processing to form vacancy rich regions within the substrate on opposing sides of the gate stack is performed. The vacancy rich regions have a first depth from a surface of the substrate. A first implant causing end of range defect regions to be formed on opposing sides of the gate stack at a second depth from the surface of the substrate is also carried out, wherein the first depth is proximate to the second depth.
    Type: Application
    Filed: May 15, 2009
    Publication date: November 19, 2009
    Applicants: CHARTERED SEMICONDUCTOR MANUFACTURING, LTD., NANYANG TECHNOLOGICAL UNIVERSITY, NATIONAL UNIVERSITY OF SINGAPORE
    Inventors: Dexter Xueming TAN, Benjamin COLOMBEAU, Clark Kuang Kian ONG, Sai Hooi YEONG, Chee Mang NG, Kin Leong PEY