Patents by Inventor Clark S. Stone

Clark S. Stone has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Materials and methods for etching tungsten polycides using silicide as a mask
    Patent number: 4778563
    Abstract: A polycide etch process using a SiCl.sub.4 :HCl reactive gas flow rate ratio of at least about 1:1 for etching the polysilicon without etching, notching or degrading the overlying silicide. Thus, after patterning the silicide using a photoresist mask, the silicide can be used as the mask for etching the polysilicon, thereby providing precise pattern transfer to the polysilicon, independent of photoresist degradation. Also, a thinner, more precisely patterned photoresist mask can be used.
    Type: Grant
    Filed: March 26, 1987
    Date of Patent: October 18, 1988
    Assignee: Applied Materials, Inc.
    Inventor: Clark S. Stone